Patents by Inventor Seiya Koyanagi

Seiya Koyanagi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6451910
    Abstract: An acrylic premix comprising 10 to 90% by weight of (A) an acrylic resin composition consisting of an acrylic mono-functional monomer (a1), an acrylic poly-functional monomer (a2) containing at least one compound represented by any of the following general formulae (I) to (IV), and an acrylic polymer (b); 10 to 90% by weight of an inorganic filler (B); and 0.01 to 10 parts by weight of a curing agent (C) based on 100 parts by weight of the total amount of the components (A) and (B); acrylic artificial marble using the same; and a method for producing the same. The premix is useful for providing an acrylic SMC or BMC having excellent molding property at high temperature, molding processability, thickening property and storage stability.
    Type: Grant
    Filed: October 30, 2000
    Date of Patent: September 17, 2002
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Seiya Koyanagi, Shinji Saiki, Yuichiro Kishimoto
  • Patent number: 6323259
    Abstract: The present invention is directed to an acrylic resin composition obtained by adding a non-crosslinked polymer powder having a bulk density within the range from 0.1 to 0.7 g/ml, an oil absorption based on linseed oil within the range from 60 to 200 ml/100 g and a degree of swelling by methyl methacrylate of 16-fold or more as a thickening agent to acrylic syrup; and acrylic premix obtained by mixing an inorganic filler with this composition; and acrylic premix obtained by extruding constituent components by a kneading extruder to continuously form the mixture; and a method for producing an acrylic artificial marble in which these acrylic premixes are cured.
    Type: Grant
    Filed: October 19, 1998
    Date of Patent: November 27, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Yukihiro Ikegami, Seiya Koyanagi, Yuichiro Kishimoto, Yoshihito Nakahara
  • Patent number: 6316548
    Abstract: A (meth)acrylic premix comprising a (meth)acrylic resin composition (A) containing a (meth)acrylic monomer (a) and a (meth)acrylic polymer (b), an inorganic filler (B), and a curing agent (C), wherein, the component (a) is a (meth)acrylate having a bicyclo ring, fluorine atom, cyclic ether, cyclohexane ring or tricyclo ring, and the component (C) is a radical polymerization initiator having a 10 hours half-life temperature of 75° C. or more; an acrylic SMC or BMC comprising this (meth)acrylic premix and a thickening agent; and a method for producing (meth)acrylic artificial marble, wherein this (meth)acrylic SMC or BMC is cured with being pressurized and heated at a temperature in the range from 105 to 150° C., are provided. These are useful for producing (meth)acrylic artificial marble having various excellent physical properties such as appearance, dimension stability, hot water resistance, weatherability.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: November 13, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Seiya Koyanagi, Katsumi Yonekura, Shinji Saiki, Kentaro Hayashi, Yuichiro Kishimoto
  • Patent number: 6265467
    Abstract: An acrylic SMC or BMC, in which when a polymer powder (C) having a bulk density in the range from 0.1 to 0.7 g/ml, an oil absorption of lin-seed oil in the range from 60 to 200 mi/100 g, a degree of swelling by methyl methacrylate is 16-fold or more and a specific surface area in the range from 1 to 100 m2/g is added as a thickening agent, hot water resistance is improved by using a polymer powder (C1) containing no surfactant, a polymer powder (C2) containing as a constituent component a reactive surfactant, or thickening speed is controlled by using a non-cross linked polymer powder (C3) having a Mw from 100,000 to 2,500,000, a non-crosslinked polymer powder (C4) having a Ma from 2,500,000 to 5,000,000, a crosslinked polymer powder (C5) and a polymer powder (D) having a specific surface area from 0.01 m2/g to 1 m2/g; a production method thereof; a method for producing acrylic artificial marble in which components are extruded by a kneading extruder (9) into given shape; and a thickening agent.
    Type: Grant
    Filed: March 29, 2000
    Date of Patent: July 24, 2001
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Seiya Koyanagi, Katsumi Yonekura, Shinji Saiki, Kentaro Hayashi, Yoshihito Nakahara, Yuichiro Kishimoto
  • Patent number: 5746916
    Abstract: A microporous membrane made of a non-crystalline polymer having, within its wall, microfibrils and slit-like micropores which are oriented in the lengthwise direction of the membrane, said slit-like micropores communicating from one surface to the other surface of the membrane, and forming a stacked construction. This membrane has a high flux value of AFR and WFR, excellent heat-, solvent-, and pressure-resistance, and a high mechanical strength, and does not contain any undesirable materials which eluate during use. This membrane is thus useful as a multi-purpose separation membrane, such as for medical uses, food industries, purification of water or air, and the separation of hot liquids.
    Type: Grant
    Filed: January 25, 1995
    Date of Patent: May 5, 1998
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Jun Kamo, Seiya Koyanagi, Miho Kawai
  • Patent number: 5356754
    Abstract: A photopolymerizable or radiation polymerizable alkaline developing crosslinking curable resin composition possessing superior antiplating properties and a short stripping period, in which the stripped plate is not easily dissolved in the stripping fluid, and which is comprising:(a) 5-30 parts by weight of at least one compound possessing in one molecule on the average 1.
    Type: Grant
    Filed: September 25, 1992
    Date of Patent: October 18, 1994
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kenji Kushi, Ken-ichi Inukai, Takayuki Iseki, Seiya Koyanagi
  • Patent number: 5149776
    Abstract: A photopolymerizing cross-linking hardenable resin composition is disclosed which is comprised of a binder resin, cross-linking monomer and photopolymerization initiator. The composition of each of the above mentioned components is such that dry film resist incorporating the resin composition of the present invention and used in processes for selective etching and plating of printed circuit boards can be developed in weak aqueous alkaline solution after selective exposure to light. In this way, the efficient and economical manufacture of high definition printed circuit boards is made possible. Additionally, dry film resist incorporating the photopolymerizing cross-linking hardenable resin composition of the present invention lends to easy handling and storage characteristics.
    Type: Grant
    Filed: November 16, 1990
    Date of Patent: September 22, 1992
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Kenji Kushi, Ken-ichi Inukai, Takayuki Iseki, Seiya Koyanagi, Yasuyuki Fujimoto