Patents by Inventor Senga Takehito

Senga Takehito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Discharge lamp with a discharge filling having a measured emission intensity of argon to OH radicals and method of manufacturing the same
    Patent number: 7468584
    Abstract: Process for producing a discharge lamp having a silica discharge vessel with an emission space in which there is a pair of electrodes at least 0.15 mg/mm3 of mercury, argon (Ar), and halogen by measuring the relation b/a1 between the emission intensity a1 of argon (Ar) at a wavelength of 668 nm and the emission intensity b of OH radicals at a wavelength of 309 nm in a state of glow discharge of the discharge lamp; supplying hydrogen into the discharge vessel of the discharge lamp; measuring the relation c/a2 between the emission intensity a2 of argon (Ar) at a wavelength of 668 nm and the emission intensity c of OH radicals at a wavelength of 309 nm in the state of glow discharge of the discharge lamp; and fixing the difference c/a2?b/a1 at a value in the range of 0.001 to 15.
    Type: Grant
    Filed: March 29, 2006
    Date of Patent: December 23, 2008
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Takuya Tsukamoto, Noriko Nishiaki, Yoshihiro Horikawa, Senga Takehito
  • Discharge lamp
    Publication number: 20060220562
    Abstract: Process for producing a discharge lamp having a silica discharge vessel with an emission space in which there is a pair of electrodes at least 0.15 mg/mm3 of mercury, argon (Ar), and halogen by measuring the relation b/a1 between the emission intensity a1 of argon (Ar) at a wavelength of 668 nm and the emission intensity b of OH radicals at a wavelength of 309 nm in a state of glow discharge of the discharge lamp; supplying hydrogen into the discharge vessel of the discharge lamp; measuring the relation c/a2 between the emission intensity a2 of argon (Ar) at a wavelength of 668 nm and the emission intensity c of OH radicals at a wavelength of 309 nm in the state of glow discharge of the discharge lamp; and fixing the difference c/a2?b/a1 at a value in the range of 0.001 to 15.
    Type: Application
    Filed: March 29, 2006
    Publication date: October 5, 2006
    Applicant: Ushiodenki Kabushiki Kaisha
    Inventors: Takuya Tsukamoto, Noriko Nishiaki, Yoshihiro Horikawa, Senga Takehito