Patents by Inventor Seo Jong Oh

Seo Jong Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Display device having polycrystalline silicon layer
    Patent number: 11903247
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Grant
    Filed: October 18, 2021
    Date of Patent: February 13, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Sung Lee, Seo Jong Oh, Byung Soo So, Dong-min Lee
  • METHOD OF MANUFACTURING POLYCRYSTALLINE SILICON LAYER, DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY DEVICE
    Publication number: 20220102447
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Application
    Filed: October 18, 2021
    Publication date: March 31, 2022
    Inventors: Dong-Sung LEE, Seo Jong OH, Byung Soo SO, Dong-min LEE
  • Method of manufacturing polycrystalline silicon layer, display device, and method of manufacturing display device
    Patent number: 11164919
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Grant
    Filed: November 11, 2019
    Date of Patent: November 2, 2021
    Assignee: Samsung Display Co., Ltd.
    Inventors: Dong-Sung Lee, Seo Jong Oh, Byung Soo So, Dong-min Lee
  • METHOD OF MANUFACTURING POLYCRYSTALLINE SILICON LAYER, DISPLAY DEVICE, AND METHOD OF MANUFACTURING DISPLAY DEVICE
    Publication number: 20200161389
    Abstract: A method of manufacturing a polycrystalline silicon layer for a display device includes the steps of forming an amorphous silicon layer on a substrate, cleaning the amorphous silicon layer with hydrofluoric acid, rinsing the amorphous silicon layer with hydrogenated deionized water, and irradiating the amorphous silicon layer with a laser beam to form a polycrystalline silicon layer.
    Type: Application
    Filed: November 11, 2019
    Publication date: May 21, 2020
    Inventors: Dong-Sung Lee, Seo Jong Oh, Byung Soo So, Dong-min Lee