Abstract: A fusion protein according to an embodiment of the present disclosure includes a growth differentiation factor 11 and an epidermal growth factor with an enhanced anti-oxidation activity and an enhanced skin cell proliferation effect, A cosmetic composition according to an embodiment of the present disclosure includes the fusion protein as an effective component. The cosmetic composition can be advantageously used in future as a material of a functional cosmetic product.

Abstract: A tubular structure for a rectangular battery can for an electric vehicle, which is thin and has very high dimensional accuracy in order to contain as much electrolyte as possible within a limited size, and a method of manufacturing the same are disclosed. In particular, extrusion of a material to a predetermined thickness is performed, and drawing of the extruded material to a thickness desired by a final product is performed. Accordingly, desired thickness uniformity of the final product is maintained.

Abstract: An aluminum plate coiling device capable of coiling an extruded and rolled aluminum plate without generating distortion or deformation of the aluminum plate is disclosed. The aluminum plate coiling device has a simple structure, thereby being capable of achieving a reduction in installation space and a reduction in installation cost.

Abstract: An aluminum plate manufacturing method capable of achieving an enhancement in productivity through a reduction in the number of processes and a reduction in processing time is disclosed. In the aluminum plate manufacturing method, a plate is rolled after being extruded to a desired thickness. Accordingly, it is possible to reduce the number of processes and a processing time and, as such, achieving an enhancement in productivity, as compared to a conventional manufacturing process using only rolling.

Abstract: Provided is a cyclonic plasma melting furnace. A melting furnace chamber body includes an inlet through which waste is input and an outlet through which air or gas is discharged. The outlet is provided in a direction opposite to the inlet. At least one plasma torch is provided on the melting furnace chamber body so as to be inclined at a predetermined angle with respect to a direction in which the air or the gas is discharged through the outlet.

Abstract: Provided is a cyclonic plasma melting furnace. A melting furnace chamber body includes an inlet through which waste is input and an outlet through which air or gas is discharged. The outlet is provided in a direction opposite to the inlet. At least one plasma torch is provided on the melting furnace chamber body so as to be inclined at a predetermined angle with respect to a direction in which the air or the gas is discharged through the outlet.

Abstract: The present invention provides a neutron generating device for generating a high neutron flux by forming plasma in the vicinity of a target and by accelerating electrons and charged particles in the plasma toward the target. Magnetic field is formed in the vicinity of the target and a microwave generator irradiates microwaves into the space where the magnetic field is generated to thereby generate plasma in the space. The accelerated electrons and charged particles collide with the target to generate neutron flux. Also, to prevent the target surface from being excessively heated, the plasma is generated in a pulsed mode and target voltage is applied in a pulsed mode. To secure a continuous process, the level of target bias voltage for the target is adjusted so that the target re-adsorbs elements when the elements adsorbed on the target are depleted.

Abstract: The present invention is a plasma generation source and a thing that is in its application and it is for getting high quality thin film by generating even high density plasma in high vacuum and like this plasma generation source applying like this plasma generation source to sputtering system, neutral particle beam source, thin film deposition system combining sputtering system and neutral particle beam source. According to the present invention, it generates plasma by using microwave through the microwave irradiating equipment and magnetic field by more than one pair of the belt type magnets and above goal can be accomplished maximizing plasma confinement effect by inducing electron returning trajectory in accordance with above continuous structure on belt type magnet.

Abstract: The present invention relates to an apparatus and method for manufacturing a semiconductor light-emitting device using a neutral particle beam. According to the present invention, since the kinetic energy of the neutral particle beam is provided as a portion of the reaction energy for causing a nitride semiconductor single crystal thin film to be formed on a substrate, and the reaction energy is not provided as heat energy by heating a substrate as in the prior art, the substrate may be treated at a relatively low temperature. Furthermore, elements such as Si, Mg, and the like, which are solid elements required for doping are sprayed onto the substrate from a source which generates solid elements for doping together with the neutral particle beam to achieve high doping efficiency at a lower temperature.

Abstract: The present invention provides a neutron generating device for generating a high neutron flux by forming plasma in a high density in the vicinity of a target and by preventing the target surface from being excessively heated. Magnetic field is formed in the vicinity of the target to generate plasma inside a space, in which the magnetic field is formed so as to produce plasma in a high density in the vicinity of the target, thereby allowing a high neutron flux to be emitted from a target. Also, the present invention prevents the target surface from being excessively heated by producing plasma in pulsed mode and by applying target voltage in pulsed mode and secures a continuous process by adjusting a target bias voltage for targets that have depleted the adsorbed elements during the process to allow re-adsorption.

Abstract: The present invention is a plasma generation source and a thing that is in its application and it is for getting high quality thin film by generating even high density plasma in high vacuum and like this plasma generation source applying like this plasma generation source to sputtering system, neutral particle beam source, thin film deposition system combining sputtering system and neutral particle beam source. According to the present invention, it generates plasma by using microwave through the microwave irradiating equipment and magnetic field by more than one pair of the belt type magnets and above goal can be accomplished maximizing plasma confinement effect by inducing electron returning trajectory in accordance with above continuous structure on belt type magnet.

Abstract: The present invention relates to an apparatus and method for manufacturing a semiconductor light-emitting device using a neutral particle beam. According to the present invention, since the kinetic energy of the neutral particle beam is provided as a portion of the reaction energy for causing a nitride semiconductor single crystal thin film to be formed on a substrate, and the reaction energy is not provided as heat energy by heating a substrate as in the prior art, the substrate may be treated at a relatively low temperature. Furthermore, elements such as Si, Mg, and the like, which are solid elements required for doping are sprayed onto the substrate from a source which generates solid elements for doping together with the neutral particle beam to achieve high doping efficiency at a lower temperature.

Abstract: Disclosed herein is a system for measuring the deflection of a rotating shaft in a wireless manner. The system includes a non-contact-type angle division device, a plurality of wireless contact-type displacement sensors, a plurality of wireless transmitters, a relay, and a data reader. The non-contact-type angle division device is placed on a vertical rotating shaft and measures and transmits the angle of rotation of the rotating shaft. The wireless contact-type displacement sensors are installed on the outer circumferential surface of the rotating shaft, and measure the strain of the rotating shaft. The wireless transmitters transmit data about the displacement of the rotating shaft measured by the wireless contact-type displacement sensor. The relay receives and relays transmission signals from the non-contact-type angle division device and the wireless transmitters. The data reader receives the transmission signals from the relay, and performs simulation reading.

Abstract: Disclosed herein is a system for measuring the deflection of a rotating shaft in a wireless manner. The system includes a non-contact-type angle division device, a plurality of wireless contact-type displacement sensors, a plurality of wireless transmitters, a relay, and a data reader. The non-contact-type angle division device is placed on a vertical rotating shaft and measures and transmits the angle of rotation of the rotating shaft. The wireless contact-type displacement sensors are installed on the outer circumferential surface of the rotating shaft, and measure the strain of the rotating shaft. The wireless transmitters transmit data about the displacement of the rotating shaft measured by the wireless contact-type displacement sensor. The relay receives and relays transmission signals from the non-contact-type angle division device and the wireless transmitters. The data reader receives the transmission signals from the relay, and performs simulation reading.

Abstract: A coating apparatus includes support for supporting a mother substrate including unit substrates, a coater for coating the unit substrate with photosensitive materials, a detector for detecting foreign matters, a remover for removing the foreign matters from the unit substrate, and a controller for controlling the coater, detector, and remover. The coater includes a body containing the photosensitive materials, and inlet and outlet portions for inputting and outputting the photosensitive materials to/from the body. A width of the outlet portion is the same as that of the unit substrate. The detector is positioned at front of the coater to detect the foreign matters before the coating process. The remover removes the foreign matters. The coater discharges the photosensitive material only onto the unit substrate. Discharging of the photosensitive material is interrupted when the foreign matters are found.

Abstract: An exposure mask and a method for divisional exposure are provided to advantageously reduce or eliminate stitch defects in displays. In one embodiment, an exposure mask comprises a masking panel and a slit for selectively transmitting light from a light source, the slit including a taper portion such that an area proximate the taper portion transmits less than full light intensity onto a substrate to be masked. In one example, the area proximate the taper portion is bounded between an inner corner and an outer corner of the taper portion. In a further example, the area proximate the taper portion transmits substantially one-half the light intensity onto the substrate to be masked. A method of divisional exposure utilizing the advantageous exposure mask is also disclosed.

Abstract: Sorting handler for a burn-in tester including two DC testing parts and two unloading buffers on opposite sides of a burn-in board at a working post in a line with a main working line respectively, one pair of a loader part for supplying new devices and an unloader part for receiving tested good devices on each of side parts of a body, so that two insert/remove pickers carry out a work continuously in which two insert/remove pickers move along the main working line in both directions with reference to the burn-in board, to remove the devices from the burn-in board, and insert devices to be tested in the space in turn, thereby improving a test productivity per a unit time period.

Abstract: A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.

Abstract: An improved MPEG coding method for a moving picture signal, and a system and method for transmitting coded moving picture data using the improved MPEG coding method, fixes an object, selected as a reference frame of inter-frames, to an intra-frame. The moving picture transmission system includes a video processing unit for processing and coding a received video signal receiving a video signal using the improved MPEG coding method, and a transmission unit for transmitting the coded moving picture data in real time, adapting the data to a variation in a network transmission rate. Accordingly, moving picture data, received from a remote fixed camera and coded, can be transmitted in real time, being adapted to a flexible transmission rate of a network.

Abstract: A lithography equipment is provided, which includes: a coater coating a substrate with resist; a first buffer storing the substrate supplied from the coater; a baker baking the substrate supplied from the first buffer; a first turn table rotating the substrate supplied from the baker; a first transferor communicating the substrate with the coater, the first buffer, the baker, and the first turntable; an exposer exposing light to the substrate supplied from the first turntable; a developer developing the resist on the substrate supplied from the exposer; and a second transferor communicating the substrate with the first turntable, the exposer, and the developer.