Patents by Inventor Seong Ju Kim

Seong Ju Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positive photoresist composition containing naphthoquinone diazide phosphazene esterification product
    Patent number: 5523191
    Abstract: There are disclosed novel photoresist compositions employing phosphazene compounds as ballast, unabsorbent of light at a band of i-line and g-line and superior in thermal resistance and sensitivity as well as resolution, characterized by introducing photosensitive groups into phosphazene type ballast represented by the following formula I: ##STR1##
    Type: Grant
    Filed: January 27, 1995
    Date of Patent: June 4, 1996
    Assignee: Korea Kumho Chemical Co., Ltd.
    Inventors: Seong-Ju Kim, Ki-Dae Kim, Hosull Lee, Dae Y. Lee
  • Copolymer of sulfur dioxide and nuclear-substituted trialkylgermylstyrene
    Patent number: 5314978
    Abstract: Copolymers comprising 1-50 mole % of sulfur dioxide and 50-99 mole % of trialkylgermylstyrene, having a weight average molecular weight of 500-10,000,000 and exhibiting a high sensitivity to light, electron beam, and X-ray, as well as having an excellent anti-dry etching resistance, and their application as a positive resisting material.
    Type: Grant
    Filed: March 12, 1992
    Date of Patent: May 24, 1994
    Assignee: Kumho Petrochemical Company, Limited
    Inventors: Seong-Ju Kim, Ji-Hong Kim, Seong-Geun Jang, Dae-Youp Lee