Patents by Inventor Seong-yoon Kim
Seong-yoon Kim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240180043Abstract: Disclosed is a heterojunction semiconductor flexible substrate in which an epitaxial oxide thin film layer is hetero-bonded to a thinned silicon substrate using a metal layer, a manufacturing method thereof, and the heterojunction semiconductor flexible substrate can be applied to sensor, actuator, transducer, or micro electro mechanical systems (MEMS) device using high functionality of the epitaxial oxide thin film layer of high quality as well as an electronic and/or optical device.Type: ApplicationFiled: November 16, 2023Publication date: May 30, 2024Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Seung Hyub BAEK, Min Seok KIM, Ji-Soo JANG, Sunghoon HUR, Jungho YOON, Hyun-Cheol SONG, Seong Keun KIM, Ji-Won CHOI, Jin Sang KIM, Chong Yun KANG
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Publication number: 20240180041Abstract: The present invention relates to a heterojunction semiconductor substrate having excellent dielectric properties, a method of manufacturing the same, and an electronic device using the same. The present invention provides a heterojunction semiconductor substrate with improved interlayer adhesion, low leakage current, and excellent dielectric properties that maintain strength in a ferroelectric fatigue experiment by interposing a metal layer and a conductive metal oxide layer on a semiconductor substrate to form an epitaxial oxide thin film layer composed of perovskite piezoelectric oxide. The heterojunction semiconductor substrate can be applied to sensors, actuators, transducers, or MEMS devices that use the high functionality of the high-quality epitaxial oxide thin film layer, including applications in electronic and optical devices.Type: ApplicationFiled: November 29, 2023Publication date: May 30, 2024Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Seung Hyub BAEK, Soo Young JUNG, Sunghoon HUR, Ji-Soo JANG, Jungho YOON, Hyun-Cheol SONG, Seong Keun KIM, Chong Yun KANG, Ji-Won CHOI, Jin Sang KIM
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Patent number: 11994752Abstract: The present invention relates to self-customized glasses. The self-customized glasses allow a wearer to assemble essential parts of the glasses in a self-customized type, can allow the wearer to make glasses with various forms according to the wearer's taste since allowing the wearer to select colors, patterns or designs of essential parts of the glasses by applying various custom-assembly forms or micro LED display skins to the essential parts, and provide rimless glasses with feelings of rimless glasses, half-rim glasses and full-rim glasses.Type: GrantFiled: June 15, 2018Date of Patent: May 28, 2024Inventors: Seong Kyu Lim, Jong Ho Lim, Jong Yoon Lim, Myeong Hee Kim
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Patent number: 11913787Abstract: The present disclosure provides a target for aerial survey transformable to hand-fan shape. In this instance, the target includes a central axis, a first identification marker with one end connected to the central axis and having a first length outwards, and a second identification marker with one end connected to the central axis and having a second length outwards, the second identification marker disposed on the first identification marker, wherein the second length is shorter than the first length, the first identification marker includes a plurality of first unit areas having a predetermined angle therebetween with respect to the central axis, and the plurality of first unit areas has an overlap between adjacent first unit areas.Type: GrantFiled: November 24, 2020Date of Patent: February 27, 2024Assignee: NATIONAL DISASTER MANAGEMENT RESEARCH INSTITUTEInventors: Seong Sam Kim, Dong Yoon Shin, Hyun Ju Nho, Je Sung Park, Hyun Ju Kim
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Publication number: 20240061324Abstract: A blank mask includes a light transmissive substrate and a multilayer comprising a light shielding layer and a phase shift layer disposed between the light transmissive substrate and the light shielding layer. The phase shift layer includes an upper surface facing the light shielding layer and a side surface connected to the upper surface, such that the light shielding layer is disposed on the upper surface and the side surface of the phase shift layer. When viewed from a top surface of the multilayer, the multilayer includes a central portion and an outer portion surrounding the central portion. The outer portion has a curved upper surface, which greatly suppresses damage to the phase shift layer by a cleaning solution and effectively reduces a frequency of particle generation at edges of the phase shift layer and the light shielding layer.Type: ApplicationFiled: August 17, 2023Publication date: February 22, 2024Applicant: SK enpulse Co., Ltd.Inventors: GeonGon LEE, Seong Yoon KIM, Min Gyo JEONG, Hyung Joo LEE, Sung Hoon SON, Tae Young KIM
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Publication number: 20230418150Abstract: A blank mask includes a light transmissive substrate, and a light-blocking layer, disposed on the light transmissive substrate, comprising a transition metal and either one or both of oxygen and nitrogen. An average value of grain sizes of a surface of the light-blocking layer ranges from 14 nm to 24 nm.Type: ApplicationFiled: June 23, 2023Publication date: December 28, 2023Applicant: SK enpulse Co., Ltd.Inventors: GeonGon LEE, Hyung-joo LEE, Suhyeon KIM, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, Taewan KIM, Inkyun SHIN, Tae Young KIM
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Publication number: 20230408903Abstract: A shadow mask includes a mask including one surface, another surface, and an opening that passes from one surface to the other, and a shutter provided on the one surface of the mask and configured to adjust a size of the opening, wherein the shutter is configured to move from an edge to a center of the opening to adjust the size of the opening, and the shadow mask is applied in manufacturing a blank mask for a semiconductor lithography process.Type: ApplicationFiled: April 28, 2023Publication date: December 21, 2023Applicant: SK enpulse Co., Ltd.Inventors: Seong Yoon KIM, GeonGon LEE, Min Gyo JEONG, Sung Hoon SON, Inkyun SHIN
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Publication number: 20230367200Abstract: A blank mask includes a light-transmitting substrate; and a light-shielding film on the light-transmitting substrate. The light-shielding film includes a transition metal and oxygen, and a scum formation time required to generate scum is 120 minutes or more when light with a wavelength of 172 nm and an intensity of 10 kJ/cm2 is applied on the light-shielding film.Type: ApplicationFiled: May 5, 2023Publication date: November 16, 2023Applicant: SK enpulse Co., Ltd.Inventors: Seong Yoon KIM, Sung Hoon SON, Min Gyo JEONG, Inkyun SHIN, Suk Young CHOI, Hyung-ju LEE, Suhyeon KIM
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Publication number: 20230305382Abstract: An extreme ultraviolet photomask includes a conductive layer; a substrate disposed on the conductive layer; a multilayer, comprising different metals alternately stacked on the substrate; a protective layer disposed on the multilayer; a low-reflectance part disposed on a portion of the protective layer, wherein the low-reflectance part comprises a first absorbent layer disposed on the portion of the protective layer, a low-reflectance layer formed on the first absorbent layer, and a first intagliated part formed at the portion where the protective layer is exposed; and a high-reflectance part disposed on another portion of the protective layer, wherein the high-reflectance part comprises a second absorbent layer disposed on the other portion of the protective layer, a high-reflectance layer disposed on the second absorbent layer, and a second intagliated part formed at the other where the protective layer is exposed.Type: ApplicationFiled: March 22, 2023Publication date: September 28, 2023Applicant: SK enpulse Co., Ltd.Inventors: Seong Yoon KIM, Tae Young KIM, GeonGon LEE, Min Gyo JEONG, Sung Hoon SON, Inkyun SHIN
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Publication number: 20230213849Abstract: A blank mask includes a transparent substrate and a light shielding film disposed on the transparent substrate. A surface of the light shielding film has a controlled power spectrum density value at a spatial frequency of 1 ?m?1 to 10 ?m?1. The surface of the light shielding film has a controlled minimum power spectrum density value at the spatial frequency of 1 ?m?1 to 10 ?m?1. An Rq value of the surface of the light shielding film is 0.25 nm to 0.55 nm.Type: ApplicationFiled: December 30, 2022Publication date: July 6, 2023Applicant: SKC solmics Co., Ltd.Inventors: GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, SUNG HOON SON, Seong Yoon KIM, Min Gyo JEONG, Taewan KIM, INKYUN SHIN
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Publication number: 20230193043Abstract: The method of preparing a laminate includes: preparing a process target, which is a laminate before being processed, where a light-shielding film has been disposed; and preparing a cleaned laminate through a first cleaning including applying UV rays and carbonated water to the process target, wherein the light-shielding film includes a transition metal and an element selected from the group consisting of oxygen, nitrogen, and carbon.Type: ApplicationFiled: December 13, 2022Publication date: June 22, 2023Applicant: SKC solmics Co., Ltd.Inventors: Taewan KIM, GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Suhyeon KIM, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, HaHyeon CHO, Inkyun SHIN
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Publication number: 20230185185Abstract: A method and apparatus for forming a layer including a light transmitting substrate, and a light shielding film disposed on the light transmitting substrate, and a phase shift film disposed between the light transmitting substrate and the light shielding film. A center measuring area based on the center of the light shielding film and an edge measuring area being distant by 20 mm from the edge of the light shielding film. The center measuring area and the edge measuring area are respectively squares having a side of 20 ?m.Type: ApplicationFiled: December 14, 2022Publication date: June 15, 2023Applicant: SKC solmics Co., Ltd.Inventors: GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Suhyeon KIM, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, Hahyeon CHO, Taewan KIM, INKYUN SHIN
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Publication number: 20230136378Abstract: Proposed is a federated learning system. The federated learning system comprises: a central server configured to transmit at least one global parameter of a global model to each client device, receive at least one local parameter of a local model trained from each of client devices, and update the global model using the at least one local parameter; and a plurality of client devices configured to train the local model by applying a loss between a predicted value of the global model and a predicted value of the local model possessed by itself to a loss function, and transmit at least one local parameter of the trained local model to the central server.Type: ApplicationFiled: October 27, 2022Publication date: May 4, 2023Applicant: Korea Advanced Institute of Science and TechnologyInventors: Gi Hun LEE, Min Chan JEONG, Se Young YUN, Sang Min BAE, Jae Yeon AHN, Seong Yoon KIM, Woo Jin CHUNG
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Publication number: 20230135037Abstract: The blank mask according to one embodiment of the present disclosure comprises a transparent substrate and a multilayer light shielding film disposed on the transparent substrate. The multilayer light shielding film comprises a transition metal and at least any one between oxygen and nitrogen. The multilayer light shielding film comprises a first light shielding film and a second light shielding film disposed on the first light shielding film. The multilayer light shielding film comprises total nine parts that are formed by trisection in a width direction and a length direction of an upper surface of the multilayer light shielding film. Each part of the multilayer light shielding film comprises a measuring range disposed in a side thereof.Type: ApplicationFiled: November 4, 2022Publication date: May 4, 2023Applicant: SKC solmics Co., Ltd.Inventors: Min Gyo JEONG, SUNG HOON SON, Seong Yoon KIM, GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Hahyeon CHO, Taewan KIM, Suhyeon KIM, Inkyun SHIN
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Publication number: 20230135120Abstract: A blank mask includes a transparent substrate and a multilayer light shielding film disposed on the transparent substrate, the multilayer light shielding film including a transition metal and at least any one between oxygen and nitrogen, the multilayer light shielding film including a first light shielding film and a second light shielding film disposed on the first light shielding film, and the multilayer light shielding film having an EA (Edge side Area damaged) value of 2 nm2 or lessType: ApplicationFiled: November 3, 2022Publication date: May 4, 2023Applicant: SKC solmics Co., Ltd.Inventors: Sung Hoon SON, GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Suhyeon KIM, Seong Yoon KIM, Min Gyo JEONG, Inkyun SHIN
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Publication number: 20230133793Abstract: Proposed is a federated learning system. The federated learning system may comprise: a central server configured to transmit a first parameter of an extractor in a federated learning model including the extractor and a classifier to each of a plurality of client devices, and receive a plurality of first parameters learned from the plurality of client devices to update the federated learning model; and the plurality of client devices configured to train each of the plurality of the first parameters of the federated learning model using a training data set stored in each of the plurality of client devices while maintaining a value of a second parameter value of the classifier in the federated learning model, and to transmit each of the plurality of the trained first parameters to the central server.Type: ApplicationFiled: October 28, 2022Publication date: May 4, 2023Applicant: Korea Advanced Institute of Science and TechnologyInventors: Jae Hoon OH, Sang Mook KIM, Se Young YUN, Sang Min BAE, Jae Woo SHIN, Seong Yoon KIM, Woo Jin CHUNG
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Publication number: 20230110529Abstract: A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film comprises a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein when an optical density of the light shielding film is measured ten times by a light with a wavelength of 193 nm, a standard deviation of measured optical density is 0.009 or less, is disclosed.Type: ApplicationFiled: October 5, 2022Publication date: April 13, 2023Applicant: SKC solmics Co., Ltd.Inventors: GeonGon LEE, Hahyeon CHO, INKYUN SHIN, Seong Yoon KIM, Suk Young CHOI, Hyung-joo LEE, Suhyeon KIM, SUNG HOON SON, Min Gyo JEONG, Taewan KIM
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Publication number: 20230083755Abstract: A blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, and wherein a surface of the light shielding film has a first contact angle of 40° to 45° measured by using diiodo-methane as a first liquid contacting the surface of the light shielding film, is disclosed.Type: ApplicationFiled: August 30, 2022Publication date: March 16, 2023Applicant: SKC solmics Co., Ltd.Inventors: GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, Taewan KIM, Inkyun SHIN
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Publication number: 20230064333Abstract: A method of cleaning a substrate for a blank mask including: a first cleaning including irradiating a cleaning target substrate with a pre-treatment light to prepare a substrate cleaned with light, and a second cleaning including applying a first cleaning solution and a post-treatment light to the substrate cleaned with light to prepare the substrate for the blank mask, is disclosed.Type: ApplicationFiled: August 16, 2022Publication date: March 2, 2023Applicant: SKC solmics Co., Ltd.Inventors: Taewan KIM, GeonGon LEE, Suk Young CHOI, Suhyeon KIM, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, Hahyeon CHO, Inkyun SHIN, Hyung-joo LEE
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Publication number: 20230030141Abstract: Disclosed is a blank mask including a transparent substrate and a light shielding film disposed on the transparent substrate, wherein the light shielding film includes a transition metal and at least one selected from the group consisting of oxygen and nitrogen, wherein when a surface of the light shielding film includes nine sectors formed by trisecting the surface of the light shielding film vertically and horizontally, each of the nine sectors has a Rsk value, respectively, and an average value of the Rsk values of the nine sectors is equal to ?0.64 or more and less than or equal to 0, where Rsk value is a height symmetry of the surface of the light shielding film measured in accordance with ISO_4287, and wherein an average value of Rku values, which are kurtosis of the surface of the light shielding film measured in accordance with ISO_4287, of the nine sectors is 3 or less.Type: ApplicationFiled: July 12, 2022Publication date: February 2, 2023Applicant: SKC solmics Co., Ltd.Inventors: GeonGon LEE, Suk Young CHOI, Hyung-joo LEE, Suhyeon KIM, Sung Hoon SON, Seong Yoon KIM, Min Gyo JEONG, Hahyeon CHO, Taewan KIM, Inkyun SHIN