Patents by Inventor Seouk-Hoon Woo

Seouk-Hoon Woo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8625110
    Abstract: A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum.
    Type: Grant
    Filed: March 30, 2010
    Date of Patent: January 7, 2014
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Seouk-Hoon Woo, Jeong-Ho Yeo, Byeong-Ok Cho, Joo-On Park, Chang-Min Park, Won-Sun Kim
  • Publication number: 20110007329
    Abstract: A method of inspecting a structure. The method includes preparing preliminary spectrums of reference diffraction intensities according to critical dimensions of reference structures, obtaining a linear spectrum from the preliminary spectrums in a set critical dimension range, radiating light to respective measurement structures formed on a substrate, measuring measurement diffraction intensities of the light diffracted by the measurement structures, and obtaining respective critical dimensions of the measurement structures from the measurement diffraction intensities using the linear spectrum.
    Type: Application
    Filed: March 30, 2010
    Publication date: January 13, 2011
    Inventors: Seouk-Hoon Woo, Jeong-Ho Yeo, Byeong-Ok Cho, Joo-On Park, Chang-Min Park, Won-Sun Kim