Abstract: A dry type primary vacuum pump is provided, including at least two pumping stages mounted in series between a suction and a discharge of the pump; two rotors extending in the pumping stages and being configured to rotate synchronously in a reverse direction to drive a gas to be pumped between the suction and the discharge; an injection device configured to distribute a purge gas in at least one pumping stage, the injection device including at least one injector and at least one injection valve with an on or off control configured to be interposed between a purge gas supply source and the injector; and a control device configured to control opening and closing of the injection valve to inject a purge gas by successive pulses into the at least one pumping stage. A method for controlling the injection of a purge gas the vacuum pump is also provided.

Abstract: A pumping system is provided, including a rough-vacuum pump; a Roots vacuum pump including a pumping stage having a stator inside which two Roots rotors are configured to rotate synchronously in opposite directions to drive a gas to be pumped between an inlet orifice and an outlet orifice; and a pipeline connecting the outlet orifice to an intake of the rough-vacuum pump, a shortest distance between an edge of the outlet orifice and each of the Roots rotors in the pumping stage being less than 3 cm, and the outlet orifice being situated at the end of an upstream tube of the pipeline that passes into the pumping stage.

Abstract: A pumping system is provided, including a rough-vacuum pump; a Roots vacuum pump including a pumping stage having a stator inside which two Roots rotors are configured to rotate synchronously in opposite directions to drive a gas to be pumped between an inlet orifice and an outlet orifice; and a pipeline connecting the outlet orifice to an intake of the rough-vacuum pump, a shortest distance between an edge of the outlet orifice and each of the Roots rotors in the pumping stage being less than 3 cm, and the outlet orifice being situated at the end of an upstream tube of the pipeline that passes into the pumping stage.

Abstract: A method is for surveillance of an operating state of a pumping device connected to a process chamber in order to determine a failing operating state of the pumping device. The pumping device includes at least one rough-vacuum pump including a motor for driving the rough-vacuum pump and a variable speed drive to control the rotation speed of the motor, to receive a first input parameter corresponding to a set point frequency and a second input parameter corresponding to a motor current, and to deliver to the motor an output parameter corresponding to a control frequency. A failing operating state is determined when in steady-state operation the difference between the first input parameter and the output parameter is equal to or exceeds 10% of the first input parameter for a predetermined time greater than 3 seconds. The method can be implemented in a pumping device and an installation.

Abstract: A dry type primary vacuum pump is provided, including at least two pumping stages mounted in series between a suction and a discharge of the pump; two rotors extending in the pumping stages and being configured to rotate synchronously in a reverse direction to drive a gas to be pumped between the suction and the discharge; an injection device configured to distribute a purge gas in at least one pumping stage, the injection device including at least one injector and at least one injection valve with an on or off control configured to be interposed between a purge gas supply source and the injector; and a control device configured to control opening and closing of the injection valve to inject a purge gas by successive pulses into the at least one pumping stage. A method for controlling the injection of a purge gas the vacuum pump is also provided.

Abstract: A dry roughing vacuum pump includes a valve (10; 15) with a through-passage arranged in the discharge line (9), the valve (10) with a through-passage being able to move between a closed position in which the valve (10; 15) with a through-passage is in contact with a seat of a mouth (12) of the discharge line (9) and an open position in which the valve with a through-passage is moved away from the mouth (12) of the discharge line (9), the vacuum pump including a motor gas injection device (13) that is configured to inject a motor gas into the inlet (11a) of the Venturi-effect passage (11).

Abstract: A dry roughing vacuum pump includes a valve (10; 15) with a through-passage arranged in the discharge line (9), the valve (10) with a through-passage being able to move between a closed position in which the valve (10; 15) with a through-passage is in contact with a seat of a mouth (12) of the discharge line (9) and an open position in which the valve with a through-passage is moved away from the mouth (12) of the discharge line (9), the vacuum pump including a motor gas injection device (13) that is configured to inject a motor gas into the inlet (11a) of the Venturi-effect passage (11).

Abstract: The present invention relates to a sealed enclosure for transporting and storing semiconductor substrates, the enclosure comprising a sealed container and support means placed inside the container and including trays for supporting substrates. The container comprises two touching half-shells that can be spaced apart in order to open the container, and each end of said support means is secured mechanically to a respective one of said half-shells. The total height of said means varies depending on whether the container is opened or closed, the trays being separated from one another by equal distances. Said support means preferably comprise an alternation of segments and ball joints having end segments that are mechanically connected to respective ones of the half-shells. Under such circumstances, the total height of said support means varies by the alternation of segments and ball joints moving concertina-like.