Patents by Inventor Serge F. C. L. Wetzels

Serge F. C. L. Wetzels has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Positioning system for use in lithographic apparatus
    Patent number: 6852989
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: August 27, 2003
    Date of Patent: February 8, 2005
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis
  • Positioning system for use in lithographic apparatus
    Patent number: 6635887
    Abstract: A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
    Type: Grant
    Filed: November 29, 2000
    Date of Patent: October 21, 2003
    Assignee: ASML Netherlands B.V.
    Inventors: Yim Bun P. Kwan, Serge F. C. L. Wetzels, Gerjan P. Veldhuis
  • Positioning system for use in lithographic apparatus
    Publication number: 20010050341
    Abstract: An H-drive arrangement for the substrate or mask stages of a lithographic apparatus has an X-beam 11 rigidly mounted to Y-sliders 121a, 121b against X and Y translation and rotation about a Z axis (yaw) so as to form a rigid body in the XY plane. Rotation about X and Y axes is permitted in the joint between at least one Y-slider 121a, 121b and X-beam 11. Crash protection may be provided by a yaw rate sensor and/or resilient buffers which contact Y-beams 12a, 12b in the event of out-of-range yaw motions.
    Type: Application
    Filed: November 29, 2000
    Publication date: December 13, 2001
    Inventors: Yim Bun P. Kwan, Serge F.C.L. Wetzels, Gerjan P. Veldhuis