Patents by Inventor Sergei Oshemkov

Sergei Oshemkov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method and apparatus for the manufacturing of reticles
    Patent number: 6929886
    Abstract: A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.
    Type: Grant
    Filed: September 10, 2001
    Date of Patent: August 16, 2005
    Assignee: U-C-Laser Ltd.
    Inventors: Eitan Zait, Vladimir Dmitriev, Nikolay Guletsky, Sergei Oshemkov
  • Method and apparatus for the manufacturing of reticles
    Publication number: 20020086245
    Abstract: A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.
    Type: Application
    Filed: September 10, 2001
    Publication date: July 4, 2002
    Inventors: Eitan Zait, Vladimir Dmitriev, Nikolay Guletsky, Sergei Oshemkov