Patents by Inventor Serguei Anikitichev

Serguei Anikitichev has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for reducing beam instability in laser annealing
    Patent number: 9559023
    Abstract: Systems and methods for reducing beam instability in laser annealing are disclosed. The method includes: directing a conditioned laser beam through an opening in an aperture using a beam-redirecting element; forming a line image on the surface of the semiconductor wafer by imaging the aperture onto the surface, thereby locally heating the surface to form an annealing temperature distribution; detecting a thermal emission from the locally heated wafer surface; determining the annealing temperature distribution from the detected thermal emission; determining from the annealing temperature distribution a line-image intensity profile that includes a time-varying amount of slope; and adjusting the beam-redirecting element to redirect the laser beam to reduce or eliminate the time-varying amount of slope in the line-image intensity profile.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: January 31, 2017
    Assignee: Ultratech, Inc.
    Inventors: James T. McWhirter, Andrew Hawryluk, Serguei Anikitichev, Masoud Safa
  • Systems and methods for reducing beam instability in laser annealing
    Publication number: 20150371911
    Abstract: Systems and methods for reducing beam instability in laser annealing are disclosed. The method includes: directing a conditioned laser beam through an opening in an aperture using a beam-redirecting element; forming a line image on the surface of the semiconductor wafer by imaging the aperture onto the surface, thereby locally heating the surface to form an annealing temperature distribution; detecting a thermal emission from the locally heated wafer surface; determining the annealing temperature distribution from the detected thermal emission; determining from the annealing temperature distribution a line-image intensity profile that includes a time-varying amount of slope; and adjusting the beam-redirecting element to redirect the laser beam to reduce or eliminate the time-varying amount of slope in the line-image intensity profile.
    Type: Application
    Filed: June 23, 2014
    Publication date: December 24, 2015
    Applicant: Ultratech, Inc.
    Inventors: James T. McWhirter, Andrew Hawryluk, Serguei Anikitichev, Masoud Safa