Patents by Inventor Serpil Gonen

Serpil Gonen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications
    Patent number: 7510818
    Abstract: Semiconductor nano-particles, due to their specific physical properties, can be used as reversible photo-bleachable materials for a wide spectrum, from far infrared to deep UV. Applications include, reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage technologies.
    Type: Grant
    Filed: December 9, 2003
    Date of Patent: March 31, 2009
    Assignee: Pixelligent Technologies LLC
    Inventors: Zhiyun Chen, Erin F. Fleet, Serpil Gönen, Gregory D. Cooper
  • RESISTS FOR LITHOGRAPHY
    Publication number: 20080176166
    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.
    Type: Application
    Filed: July 6, 2007
    Publication date: July 24, 2008
    Inventors: Gregory D. COOPER, Zhiyun Chen, Z. Serpil Gonen Williams, Larry F. Thompson
  • Programmable photolithographic mask based on semiconductor nano-particle optical modulators
    Publication number: 20040150865
    Abstract: Nano-particles are provided with control circuitry to form a programmable mask. The optical characteristics of the nano-particles change to provide patterned light. Such patterned light can be used for example to expose a photoresist on a semiconductor wafer for photolithography.
    Type: Application
    Filed: December 9, 2003
    Publication date: August 5, 2004
    Applicant: Pixelligent Technologies LLC,
    Inventors: Zhiyun Chen, Gregory D. Cooper, Serpil Gonen, Erin F. Fleet
  • Reversible photobleachable materials based on nano-sized semiconductor particles and their optical applications
    Publication number: 20040152011
    Abstract: Semiconductor nano-particles, due to their specific physical properties, can be used as reversible photo-bleachable materials for a wide spectrum, from far infrared to deep UV. Applications include, reversible contrast enhancement layer (R-CEL) in optical lithography, lithography mask inspection and writing and optical storage technologies.
    Type: Application
    Filed: December 9, 2003
    Publication date: August 5, 2004
    Applicant: Pixelligent Technologies LLC
    Inventors: Zhiyun Chen, Erin F. Fleet, Serpil Gonen, Gregory D. Cooper