Patents by Inventor Setsuo Tokuhiro
Setsuo Tokuhiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8601681Abstract: Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta?60° C.), and a material having a glass transition temperature of not less than 290° C. or a glass transition temperature of not less than (Tb?50° C.) is used as the resin material.Type: GrantFiled: June 25, 2009Date of Patent: December 10, 2013Assignee: Konica Minolta Opto, Inc.Inventors: Akiko Hara, Setsuo Tokuhiro
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Patent number: 8477413Abstract: An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L1) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L2) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.Type: GrantFiled: October 27, 2008Date of Patent: July 2, 2013Assignee: Konica Minolta Opto, Inc.Inventors: Nobuyoshi Mori, Kazuo Ishida, Takuji Hatano, Setsuo Tokuhiro
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Patent number: 8379310Abstract: Provided is a highly reliable solar collecting system. Since a concave minor has a reflection film on a base material on the side opposite to the side of a solar light incoming surface, peeling, breaking and the like are suppressed by protecting the reflection film by the base material, even when a dropping material is brought into contact with the side of the reflection film with impact or accumulated dropped materials are periodically cleaned. As an elliptical mirror has a reflection film on the base material on the side of the solar light incoming surface, even when solar light having large energy enters, the solar light is reflected by the reflection surface before reaching the base material and there is a small possibility of having the base material heated.Type: GrantFiled: October 27, 2008Date of Patent: February 19, 2013Assignee: Konica Minolta Opto, Inc.Inventors: Nobuyoshi Mori, Takuji Hatano, Setsuo Tokuhiro
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Publication number: 20110111256Abstract: Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta?60° C.), and a material having no glass transition temperature or a glass transition temperature of not less than (Tb?50° C.) is used as the resin material.Type: ApplicationFiled: June 25, 2009Publication date: May 12, 2011Inventors: Akiko Hara, Setsuo Tokuhiro
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Publication number: 20100258187Abstract: An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L1) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L2) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.Type: ApplicationFiled: October 27, 2008Publication date: October 14, 2010Inventors: Nobuyoshi Mori, Kazuo Ishida, Takuji Hatano, Setsuo Tokuhiro
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Publication number: 20100243032Abstract: Provided is a highly reliable solar collecting system. Since a concave minor has a reflection film on a base material on the side opposite to the side of a solar light incoming surface, peeling, breaking and the like are suppressed by protecting the reflection film by the base material, even when a dropping material is brought into contact with the side of the reflection film with impact or accumulated dropped materials are periodically cleaned. As an elliptical mirror has a reflection film on the base material on the side of the solar light incoming surface, even when solar light having large energy enters, the solar light is reflected by the reflection surface before reaching the base material and there is a small possibility of having the base material heated.Type: ApplicationFiled: October 27, 2008Publication date: September 30, 2010Inventors: Nobuyoshi Mori, Takuji Hatano, Setsuo Tokuhiro
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Patent number: 7682676Abstract: An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.Type: GrantFiled: February 4, 2005Date of Patent: March 23, 2010Assignee: Konica Minolta Opto, Inc.Inventors: Setsuo Tokuhiro, Tatsuo Ohta
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Patent number: 7599119Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.Type: GrantFiled: January 13, 2006Date of Patent: October 6, 2009Assignee: Konica Minolta Opto, Inc.Inventors: Katsuya Nakamura, Tatsuo Ohta, Setsuo Tokuhiro, Kunihiko Taka, Shingo Nakamura
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Publication number: 20090244729Abstract: A method for manufacturing an optical element Being resistant to reflow treatment, to realize board mounting of electronic parts by melting of a conductive paste by heat, comprising the step of: (i) forming an antireflective film on an optical element body composed of a thermosetting resin, wherein a film making temperature in a process of forming the antireflective film is maintained in a range of ?40 to +40 ° C. with respect to a melting temperature of the conductive paste.Type: ApplicationFiled: March 26, 2009Publication date: October 1, 2009Inventors: Setsuo Tokuhiro, Takuji Hatano, Masaaki Nose
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Publication number: 20080158702Abstract: In a reflecting mirror, an adhesive layer formed of a mixture of silicon dioxide and aluminum oxide is formed between a substrate and an aluminum reflective layer, and, on the aluminum reflective layer, a dielectric layer is formed that has, laid one after another on the aluminum reflective layer, a low-refraction layer containing silicon dioxide and a high-refraction layer formed of a compound of titanium oxide and lanthanum oxide.Type: ApplicationFiled: December 20, 2007Publication date: July 3, 2008Inventors: Masaaki Nose, Akira Tsukamoto, Miyuki Teramoto, Setsuo Tokuhiro
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Publication number: 20080123507Abstract: The present invention provides an optical element for use in an optical pickup apparatus which records and/or reproduces information, and for converging a laser light flux with a wavelength ?1 on an information recording medium. The optical element includes; a main body; and an antireflection film arranged on at least one surface of the main body and including an optical functional surface. In the optical element, a maximum angle ?1 formed by a normal of the optical functional surface and the laser light flux satisfies 40°??1?70°, and a phase difference between a phase of a P-polarized light and a phase of a S-polarized light of the laser light flux when the laser light flux enters into the optical element, is the substantially same to the phase difference when the laser light flux is emitted from the optical element.Type: ApplicationFiled: November 26, 2007Publication date: May 29, 2008Inventors: Kunihiko TAKA, Setsuo Tokuhiro
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Publication number: 20070040966Abstract: On the surface of a plastic base, there are formed, from the base side, an adhesion layer, a reflective layer formed mainly of Ag, and a protective layer formed of a light-transmitting dielectric layer. The adhesion layer is formed of a layer of a mixture of aluminum oxide and lanthanum oxide, and is given a thickness in the range from 10 nm to 120 nm. To further enhance the adhesion between the base and the Ag layer, and to surely prevent entry of moisture or the like from the base into the Ag layer, the mix proportion of lanthanum oxide in the adhesion layer is preferably kept in the range from 60% to 80% by weight.Type: ApplicationFiled: August 15, 2006Publication date: February 22, 2007Inventors: Miyuki Teramoto, Setsuo Tokuhiro, Takuji Hatano
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Publication number: 20060158738Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.Type: ApplicationFiled: January 13, 2006Publication date: July 20, 2006Inventors: Katsuya Nakamura, Tatsuo Ohta, Setsuo Tokuhiro, Kunihiko Taka, Shingo Nakamura
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Publication number: 20050248864Abstract: An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.Type: ApplicationFiled: February 4, 2005Publication date: November 10, 2005Inventors: Setsuo Tokuhiro, Tatsuo Ohta
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Publication number: 20050109616Abstract: A sputtering apparatus for applying a thin film coating to a substrate containing, in a vacuum chamber, at least two cylindrical targets and at least two magnets each juxtaposed to one of the targets so as to generate a magnetic field in a vicinity of an outer surface of the target, wherein, the following relationship is satisfied d1?3d2, provided that d1 is a distance between the outer surfaces of the two targets and d2 is any one of distances between the outer surfaces of the targets and the substrate.Type: ApplicationFiled: October 25, 2004Publication date: May 26, 2005Inventors: Tatsuo Ohta, Satoshi Nakano, Setsuo Tokuhiro
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Patent number: 6319598Abstract: An electromagnetic wave attenuating transparent member includes; a transparent base material, and a plurality of structural layers including at least one transparent conductive layer. Sheet resistivity of the electromagnetic wave attenuating transparent member is 100 &OHgr;/cm2 or less, and the plurality of structural layers include a first layer and a second layer which is provided to be farther than the first layer from the transparent base material, and has density which is higher than that of the first layer.Type: GrantFiled: July 22, 1999Date of Patent: November 20, 2001Assignee: Konica CorporationInventors: Satoshi Nakano, Setsuo Tokuhiro, Shingo Nakamura, Tatsuo Ohta
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Patent number: 5920431Abstract: An optical member includes a synthetic resin substrate: and an antireflection film including at least a mixture film composed of tantalum oxide (Ta.sub.2 O.sub.5) and titanium oxide (TiO.sub.2), and a film having a refractive index lower than that of the mixture film. The antireflection film is coated on the synthetic resin substrate.Type: GrantFiled: June 20, 1997Date of Patent: July 6, 1999Assignee: Konica CorporationInventors: Setsuo Tokuhiro, Satoshi Nakano, Tatsuo Ohta