Patents by Inventor Setsuo Tokuhiro

Setsuo Tokuhiro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8601681
    Abstract: Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta?60° C.), and a material having a glass transition temperature of not less than 290° C. or a glass transition temperature of not less than (Tb?50° C.) is used as the resin material.
    Type: Grant
    Filed: June 25, 2009
    Date of Patent: December 10, 2013
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Akiko Hara, Setsuo Tokuhiro
  • Patent number: 8477413
    Abstract: An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L1) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L2) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: July 2, 2013
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Nobuyoshi Mori, Kazuo Ishida, Takuji Hatano, Setsuo Tokuhiro
  • Patent number: 8379310
    Abstract: Provided is a highly reliable solar collecting system. Since a concave minor has a reflection film on a base material on the side opposite to the side of a solar light incoming surface, peeling, breaking and the like are suppressed by protecting the reflection film by the base material, even when a dropping material is brought into contact with the side of the reflection film with impact or accumulated dropped materials are periodically cleaned. As an elliptical mirror has a reflection film on the base material on the side of the solar light incoming surface, even when solar light having large energy enters, the solar light is reflected by the reflection surface before reaching the base material and there is a small possibility of having the base material heated.
    Type: Grant
    Filed: October 27, 2008
    Date of Patent: February 19, 2013
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Nobuyoshi Mori, Takuji Hatano, Setsuo Tokuhiro
  • Publication number: 20110111256
    Abstract: Disclosed is an optical element to be subjected to a reflow process at high temperatures, wherein cracks or wrinkles can be prevented from occurring in an antireflection film. A method for producing the optical element, and a method for manufacturing an electronic device using the optical element are also disclosed. Specifically disclosed is a method for producing an optical element comprising a base, wherein at least one optical surface is composed of a resin material, and a coating formed on the optical surface of the base and composed of an inorganic material, the optical element being mounted on a substrate together with an electronic component by a reflow process at a temperature Ta. The method is characterized in that the coating is formed at a film-forming temperature Tb of not less than (Ta?60° C.), and a material having no glass transition temperature or a glass transition temperature of not less than (Tb?50° C.) is used as the resin material.
    Type: Application
    Filed: June 25, 2009
    Publication date: May 12, 2011
    Inventors: Akiko Hara, Setsuo Tokuhiro
  • Publication number: 20100258187
    Abstract: An optical element for reflecting solar light has excellent weather resistance, and furthermore, a high reflectance in a wide band. When solar light enters an optical element (OE), light (L1) in a short wavelength band among the solar light is reflected by a dielectric multilayer film (DF). Other light (L2) in longer wavelength bands are passed through the dielectric multilayer film (DF), then a base material (SS), and reflected by a metal deposition film (MV) to pass through the base material (SS) and the dielectric multilayer film (DF). Thus, high reflectance in a wide band is ensured.
    Type: Application
    Filed: October 27, 2008
    Publication date: October 14, 2010
    Inventors: Nobuyoshi Mori, Kazuo Ishida, Takuji Hatano, Setsuo Tokuhiro
  • Publication number: 20100243032
    Abstract: Provided is a highly reliable solar collecting system. Since a concave minor has a reflection film on a base material on the side opposite to the side of a solar light incoming surface, peeling, breaking and the like are suppressed by protecting the reflection film by the base material, even when a dropping material is brought into contact with the side of the reflection film with impact or accumulated dropped materials are periodically cleaned. As an elliptical mirror has a reflection film on the base material on the side of the solar light incoming surface, even when solar light having large energy enters, the solar light is reflected by the reflection surface before reaching the base material and there is a small possibility of having the base material heated.
    Type: Application
    Filed: October 27, 2008
    Publication date: September 30, 2010
    Inventors: Nobuyoshi Mori, Takuji Hatano, Setsuo Tokuhiro
  • Patent number: 7682676
    Abstract: An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.
    Type: Grant
    Filed: February 4, 2005
    Date of Patent: March 23, 2010
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Setsuo Tokuhiro, Tatsuo Ohta
  • Patent number: 7599119
    Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.
    Type: Grant
    Filed: January 13, 2006
    Date of Patent: October 6, 2009
    Assignee: Konica Minolta Opto, Inc.
    Inventors: Katsuya Nakamura, Tatsuo Ohta, Setsuo Tokuhiro, Kunihiko Taka, Shingo Nakamura
  • Publication number: 20090244729
    Abstract: A method for manufacturing an optical element Being resistant to reflow treatment, to realize board mounting of electronic parts by melting of a conductive paste by heat, comprising the step of: (i) forming an antireflective film on an optical element body composed of a thermosetting resin, wherein a film making temperature in a process of forming the antireflective film is maintained in a range of ?40 to +40 ° C. with respect to a melting temperature of the conductive paste.
    Type: Application
    Filed: March 26, 2009
    Publication date: October 1, 2009
    Inventors: Setsuo Tokuhiro, Takuji Hatano, Masaaki Nose
  • Publication number: 20080158702
    Abstract: In a reflecting mirror, an adhesive layer formed of a mixture of silicon dioxide and aluminum oxide is formed between a substrate and an aluminum reflective layer, and, on the aluminum reflective layer, a dielectric layer is formed that has, laid one after another on the aluminum reflective layer, a low-refraction layer containing silicon dioxide and a high-refraction layer formed of a compound of titanium oxide and lanthanum oxide.
    Type: Application
    Filed: December 20, 2007
    Publication date: July 3, 2008
    Inventors: Masaaki Nose, Akira Tsukamoto, Miyuki Teramoto, Setsuo Tokuhiro
  • Publication number: 20080123507
    Abstract: The present invention provides an optical element for use in an optical pickup apparatus which records and/or reproduces information, and for converging a laser light flux with a wavelength ?1 on an information recording medium. The optical element includes; a main body; and an antireflection film arranged on at least one surface of the main body and including an optical functional surface. In the optical element, a maximum angle ?1 formed by a normal of the optical functional surface and the laser light flux satisfies 40°??1?70°, and a phase difference between a phase of a P-polarized light and a phase of a S-polarized light of the laser light flux when the laser light flux enters into the optical element, is the substantially same to the phase difference when the laser light flux is emitted from the optical element.
    Type: Application
    Filed: November 26, 2007
    Publication date: May 29, 2008
    Inventors: Kunihiko TAKA, Setsuo Tokuhiro
  • Publication number: 20070040966
    Abstract: On the surface of a plastic base, there are formed, from the base side, an adhesion layer, a reflective layer formed mainly of Ag, and a protective layer formed of a light-transmitting dielectric layer. The adhesion layer is formed of a layer of a mixture of aluminum oxide and lanthanum oxide, and is given a thickness in the range from 10 nm to 120 nm. To further enhance the adhesion between the base and the Ag layer, and to surely prevent entry of moisture or the like from the base into the Ag layer, the mix proportion of lanthanum oxide in the adhesion layer is preferably kept in the range from 60% to 80% by weight.
    Type: Application
    Filed: August 15, 2006
    Publication date: February 22, 2007
    Inventors: Miyuki Teramoto, Setsuo Tokuhiro, Takuji Hatano
  • Publication number: 20060158738
    Abstract: An antireflection coating provided on an optical element which passes through at least two wavelengths of light in the wavelength range of 1300-1600 nm, wherein the antireflection coating comprises: a high refractive index layer; a low refractive index layer having a refractive index lower than a refractive index of the high refractive index layer; and a supplementary layer having a composition different from a composition of the high refractive index layer or from a composition of the low refractive index layer, and being provided adjacent to the high refractive index layer or to the low refractive index layer.
    Type: Application
    Filed: January 13, 2006
    Publication date: July 20, 2006
    Inventors: Katsuya Nakamura, Tatsuo Ohta, Setsuo Tokuhiro, Kunihiko Taka, Shingo Nakamura
  • Publication number: 20050248864
    Abstract: An optical element irradiated with a light flux having a wavelength of 350 nm to 450 nm, is provided with a synthetic resin base material; and an antireflection film provided on the synthetic resin base material and including a contact layer being in contact with the synthetic resin base material, wherein the contact layer is a film made of a material containing no oxygen atom or a film made of a mixed material or a material containing no oxygen atom and a material containing an oxygen atom in which the mixed material contains the material containing an oxygen atom less than 10%.
    Type: Application
    Filed: February 4, 2005
    Publication date: November 10, 2005
    Inventors: Setsuo Tokuhiro, Tatsuo Ohta
  • Publication number: 20050109616
    Abstract: A sputtering apparatus for applying a thin film coating to a substrate containing, in a vacuum chamber, at least two cylindrical targets and at least two magnets each juxtaposed to one of the targets so as to generate a magnetic field in a vicinity of an outer surface of the target, wherein, the following relationship is satisfied d1?3d2, provided that d1 is a distance between the outer surfaces of the two targets and d2 is any one of distances between the outer surfaces of the targets and the substrate.
    Type: Application
    Filed: October 25, 2004
    Publication date: May 26, 2005
    Inventors: Tatsuo Ohta, Satoshi Nakano, Setsuo Tokuhiro
  • Patent number: 6319598
    Abstract: An electromagnetic wave attenuating transparent member includes; a transparent base material, and a plurality of structural layers including at least one transparent conductive layer. Sheet resistivity of the electromagnetic wave attenuating transparent member is 100 &OHgr;/cm2 or less, and the plurality of structural layers include a first layer and a second layer which is provided to be farther than the first layer from the transparent base material, and has density which is higher than that of the first layer.
    Type: Grant
    Filed: July 22, 1999
    Date of Patent: November 20, 2001
    Assignee: Konica Corporation
    Inventors: Satoshi Nakano, Setsuo Tokuhiro, Shingo Nakamura, Tatsuo Ohta
  • Patent number: 5920431
    Abstract: An optical member includes a synthetic resin substrate: and an antireflection film including at least a mixture film composed of tantalum oxide (Ta.sub.2 O.sub.5) and titanium oxide (TiO.sub.2), and a film having a refractive index lower than that of the mixture film. The antireflection film is coated on the synthetic resin substrate.
    Type: Grant
    Filed: June 20, 1997
    Date of Patent: July 6, 1999
    Assignee: Konica Corporation
    Inventors: Setsuo Tokuhiro, Satoshi Nakano, Tatsuo Ohta