Patents by Inventor Seung Hoon Seo
Seung Hoon Seo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11996579Abstract: A secondary battery cell includes: a case in which an electrode assembly is accommodated; a cap plate assembly coupled to at least one side of the case; and a venting unit including a base coupled to one surface of the case and a notch portion formed on the base, and the notch portion includes: a first notch portion extending in a first direction; a second notch portion extending in a second direction intersecting the first direction; and a third notch portion extending in a third direction, parallel to a longitudinal direction of the base from both ends of the first notch portion and the second notch portion.Type: GrantFiled: June 9, 2023Date of Patent: May 28, 2024Assignee: SK ON CO., LTD.Inventors: Jae Sik Shin, Seung Hoon Ju, Ji Yong Park, Jae Gyu Byun, Gi Jeong Seo
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Patent number: 11990637Abstract: A secondary battery cell includes: a case in which an electrode assembly is accommodated; a cap plate assembly coupled to at least one side of the case; and a venting unit including a base coupled to one surface of the case and a notch portion formed on the base, and the notch portion includes: a first notch portion extending in a first direction, parallel to a longitudinal direction of the base; a second notch portion extending in a second direction, perpendicular to the first direction, from both ends of the first notch portion, respectively; and a third notch portion extending in the first direction from both ends of the second notch portion, respectively.Type: GrantFiled: June 12, 2023Date of Patent: May 21, 2024Assignee: SK ON CO., LTD.Inventors: Jae Sik Shin, Seung Hoon Ju, Ji Yong Park, Jae Gyu Byun, Gi Jeong Seo
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Patent number: 11966768Abstract: Disclosed herein are an apparatus and method for a multi-cloud service platform. The apparatus includes one or more processors and executable memory for storing at least one program executed by the one or more processors. The at least one program may receive a service request from a user client device, generate a multi-cloud infrastructure service using multiple clouds in response to the service request, make the multiple clouds interoperate with mufti-cloud infrastructure in order to provide the multi-cloud infrastructure service, and generate a multi-cloud application runtime environment corresponding to the multi-cloud infrastructure service.Type: GrantFiled: February 3, 2021Date of Patent: April 23, 2024Assignee: ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTEInventors: Seok-Ho Son, Dong-Jae Kang, Byoung-Seob Kim, Seung-Jo Bae, Ji-Hoon Seo, Byeong-Thaek Oh, Kure-Chel Lee, Young-Woo Jung
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Publication number: 20240079691Abstract: A battery cell includes an electrode assembly in which a plurality of electrode plates are stacked; a protective assembly disposed on at least one side of the electrode assembly and including an insulating material; and a case having an internal space in which the electrode assembly is accommodated, wherein the protective assembly includes a through-hole configured to allow electrolyte to pass therethrough.Type: ApplicationFiled: August 10, 2023Publication date: March 7, 2024Inventors: Jae Sik SHIN, Seung Hoon JU, Jae Gyu BYUN, Gi Jeong SEO
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Publication number: 20240079748Abstract: In some implementations, is provided a battery cell, and battery module and battery pack including the same including: an electrode assembly in which a plurality of polar plates are stacked; a case having an internal space in which the electrode assembly is accommodated; a cap assembly coupled to the case and having a terminal disposed therein; and a connection pin configured to electrically connect the electrode assembly and the terminal, wherein the terminal includes: a rivet having an insertion hole into which the connection pin is inserted; and a terminal portion coupled to the rivet.Type: ApplicationFiled: August 22, 2023Publication date: March 7, 2024Inventors: Jae Sik SHIN, Seung Hoon JU, Jae Gyu BYUN, Gi Jeong SEO, Dong Ha HWANG
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Publication number: 20240079692Abstract: Electrode assemblies and battery cells including the electrode assemblies are disclosed. In some implementations, a battery cell includes: an electrode assembly; one or more protective assemblies disposed on at least one side of the electrode assembly; and a case having an internal space in which the electrode assembly is accommodated, wherein the one or more protective assemblies includes: a protective frame including an insulating material; and a connection unit coupled to the protective frame and electrically connected to the electrode assembly.Type: ApplicationFiled: September 6, 2023Publication date: March 7, 2024Inventors: Jae Sik SHIN, Seung Hoon JU, Jae Gyu BYUN, Gi Jeong SEO
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Publication number: 20240075853Abstract: An apparatus of tilting a seat cushion of a vehicle, includes a tilting motor, a pinion gear, a sector gear, and a tilting link which perform the tilting operation of the seat cushion and exert a binding force in a tilted state of the seat cushion and are provided to be connected to both of one side and the other side of a seat cushion frame, and has two sector gears positioned on left and right sides and connected to each other by a connection bar so that, by strengthening a binding force of the front portion of the seat cushion, it is possible to secure the safety of passengers in the event of a collision.Type: ApplicationFiled: April 13, 2023Publication date: March 7, 2024Applicants: Hyundai Motor Company, Kia Corporation, DAS CO., LTD, Faurecia Korea, Ltd., Hyundai Transys Inc.Inventors: Sang Soo LEE, Mu Young KIM, Sang Hark LEE, Ho Suk JUNG, Sang Do PARK, Chan Ho JUNG, Dong Hoon LEE, Hea Yoon KANG, Deok Soo LIM, Seung Pil JANG, Seon Ho KIM, Jong Seok YUN, Hyo Jin KIM, Dong Gyu SHIN, Jin Ho SEO, Young Jun KIM, Taek Jun NAM
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Patent number: 11028481Abstract: Disclosed is an apparatus and method of processing substrate, which facilitates to improve deposition uniformity of a thin film deposited on a substrate, and to control quality of a thin film, wherein the apparatus includes a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the bottom of the process chamber; a chamber lid confronting the substrate supporter, the chamber lid for covering an upper side of the process chamber; and a gas distributor for locally distributing activated source gas on the substrate, wherein the gas distributor locally confronting the substrate supporter is provided in the chamber lid, wherein the gas distributor forms plasma by the use of plasma formation gas, and activates the source gas by distributing the source gas to some of plasma area for formation of the plasma.Type: GrantFiled: December 26, 2018Date of Patent: June 8, 2021Inventors: Chui Joo Hwang, Jeung Hoon Han, Young Hoon Kim, Seung Hoon Seo
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Patent number: 10504701Abstract: Disclosed is an apparatus and method of processing substrate, wherein the apparatus comprises a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the process chamber, and is rotated at a predetermined direction; a chamber lid confronting with the substrate supporter, the chamber lid for covering the process chamber; and a gas distributor having a plurality of gas distribution modules for distributing gas to the substrate, wherein the plurality of gas distribution modules are connected to the chamber lid, wherein each of the gas distribution modules includes a power source electrode and a ground electrode confronting each other, a plasma discharge space is formed between the power source electrode and the ground electrode, and the plasma discharge space is not overlapped with a thin film formation region of the substrate supported by the substrate supporter.Type: GrantFiled: July 31, 2017Date of Patent: December 10, 2019Assignee: JUSUNG ENGINEERING CO., LTD.Inventors: Jeung Hoon Han, Chul Joo Hwang, Seung Hoon Seo, Sang Don Lee
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Publication number: 20190136379Abstract: Disclosed is an apparatus and method of processing substrate, which facilitates to improve deposition uniformity of a thin film deposited on a substrate, and to control quality of a thin film, wherein the apparatus includes a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the bottom of the process chamber; a chamber lid confronting the substrate supporter, the chamber lid for covering an upper side of the process chamber; and a gas distributor for locally distributing activated source gas on the substrate, wherein the gas distributor locally confronting the substrate supporter is provided in the chamber lid, wherein the gas distributor forms plasma by the use of plasma formation gas, and activates the source gas by distributing the source gas to some of plasma area for formation of the plasma.Type: ApplicationFiled: December 26, 2018Publication date: May 9, 2019Inventors: Chul Joo Hwang, Jeung Hoon Han, Young Hoon Kim, Seung Hoon Seo
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Patent number: 10202690Abstract: Disclosed is an apparatus and method of processing substrate, which facilitates to improve deposition uniformity of a thin film deposited on a substrate, and to control quality of a thin film, wherein the apparatus includes a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the bottom of the process chamber; a chamber lid confronting the substrate supporter, the chamber lid for covering an upper side of the process chamber; and a gas distributor for locally distributing activated source gas on the substrate, wherein the gas distributor locally confronting the substrate supporter is provided in the chamber lid, wherein the gas distributor forms plasma by the use of plasma formation gas, and activates the source gas by distributing the source gas to some of plasma area for formation of the plasma.Type: GrantFiled: May 28, 2013Date of Patent: February 12, 2019Assignee: JUSUNG ENGINEERING CO., LTD.Inventors: Chul Joo Hwang, Jeung Hoon Han, Young Hoon Kim, Seung Hoon Seo
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Publication number: 20170330733Abstract: Disclosed is an apparatus and method of processing substrate, wherein the apparatus comprises a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the process chamber, and is rotated at a predetermined direction; a chamber lid confronting with the substrate supporter, the chamber lid for covering the process chamber; and a gas distributor having a plurality of gas distribution modules for distributing gas to the substrate, wherein the plurality of gas distribution modules are connected to the chamber lid, wherein each of the gas distribution modules includes a power source electrode and a ground electrode confronting each other, a plasma discharge space is formed between the power source electrode and the ground electrode, and the plasma discharge space is not overlapped with a thin film formation region of the substrate supported by the substrate supporter.Type: ApplicationFiled: July 31, 2017Publication date: November 16, 2017Inventors: Jeung Hoon HAN, Chul Joo HWANG, Seung Hoon SEO, Sang Don LEE
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Patent number: 9748077Abstract: Disclosed is an apparatus and method of processing substrate, wherein the apparatus comprises a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the process chamber, and is rotated at a predetermined direction; a chamber lid confronting with the substrate supporter, the chamber lid for covering the process chamber; and a gas distributor having a plurality of gas distribution modules for distributing gas to the substrate, wherein the plurality of gas distribution modules are connected to the chamber lid, wherein each of the gas distribution modules includes a power source electrode and a ground electrode confronting each other, a plasma discharge space is formed between the power source electrode and the ground electrode, and the plasma discharge space is not overlapped with a thin film formation region of the substrate supported by the substrate supporter.Type: GrantFiled: May 28, 2013Date of Patent: August 29, 2017Assignee: JUSUNG ENGINEERING CO., LTD.Inventors: Jeung Hoon Han, Chul Joo Hwang, Seung Hoon Seo, Sang Don Lee
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Publication number: 20150235812Abstract: Disclosed is an apparatus and method of processing substrate, wherein the apparatus comprises a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the process chamber, and is rotated at a predetermined direction; a chamber lid confronting with the substrate supporter, the chamber lid for covering the process chamber; and a gas distributor having a plurality of gas distribution modules for distributing gas to the substrate, wherein the plurality of gas distribution modules are connected to the chamber lid, wherein each of the gas distribution modules includes a power source electrode and a ground electrode confronting each other, a plasma discharge space is formed between the power source electrode and the ground electrode, and the plasma discharge space is not overlapped with a thin film formation region of the substrate supported by the substrate supporter.Type: ApplicationFiled: May 28, 2013Publication date: August 20, 2015Applicant: JUSUNG ENGINEERING CO., LTD.Inventors: Jeung Hoon Han, Chul Joo Hwang, Seung Hoon Seo, Sang Don Lee
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Publication number: 20150111391Abstract: Disclosed is an apparatus and method of processing substrate, which facilitates to improve deposition uniformity of a thin film deposited on a substrate, and to control quality of a thin film, wherein the apparatus includes a process chamber; a substrate supporter for supporting at least one of substrates, wherein the substrate supporter is provided in the bottom of the process chamber; a chamber lid confronting the substrate supporter, the chamber lid for covering an upper side of the process chamber; and a gas distributor for locally distributing activated source gas on the substrate, wherein the gas distributor locally confronting the substrate supporter is provided in the chamber lid, wherein the gas distributor forms plasma by the use of plasma formation gas, and activates the source gas by distributing the source gas to some of plasma area for formation of the plasma.Type: ApplicationFiled: May 28, 2013Publication date: April 23, 2015Inventors: Chul Joo Hwang, Jeung Hoon Han, Young Hoon Kim, Seung Hoon Seo