Patents by Inventor Seung Jib Choi

Seung Jib Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20150192699
    Abstract: Disclosed are a photosensitive resin composition including (A) an acrylic-based binder resin; (B) a photopolymerizable monomer; (C) a photopolymerization initiator; (D) a colorant including a dye represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; and (E) a solvent, and a color filter using the same.
    Type: Application
    Filed: August 27, 2014
    Publication date: July 9, 2015
    Inventors: Se-Young CHOI, Ju-Ho JUNG, Myoung-Youp SHIN, Nam-Gwang KIM, Hwan-Sung CHEON, Seung-Jib CHOI, Kyung-Hee HYUNG
  • Publication number: 20150147700
    Abstract: Disclosed are a black photosensitive resin composition including (A) a binder resin; (B) a colorant including a pigment and a silica nanoparticle; (C) a photopolymerizable compound; (D) a photopolymerization initiator; and (E) a solvent, wherein the silica nanoparticle is included in an amount of about 1 part by weight to about 11 parts by weight based on about 100 parts by weight of the pigment, and a light blocking layer and a color filter using the same.
    Type: Application
    Filed: May 16, 2014
    Publication date: May 28, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Hyun-Moo CHOI, Arum YU, Ho-Jeong PAEK, Chang-Min LEE, Seung-Jib CHOI
  • Publication number: 20150111156
    Abstract: A photosensitive resin composition includes (A) a cardo-based resin including a repeating unit represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) a pigment; (D) an initiator; and (E) a solvent. A light blocking layer can be made using the same. In the above Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: April 3, 2014
    Publication date: April 23, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Youn-Gi LEE, Chang-Min LEE, Min-Sung KIM, Seung-Hyun KIM, Dong-Hoon WON, Seung-Jib CHOI
  • Publication number: 20150079332
    Abstract: The present invention relates to a photocurable composition, to a barrier layer including same, and to an encapsulated device including same, wherein the composition comprises a photocurable monomer(A) and a silicon containing monomer(B), wherein the silicon containing monomers(B) has a structure according to Formula 1.
    Type: Application
    Filed: February 22, 2013
    Publication date: March 19, 2015
    Inventors: Chang Min Lee, Seung Jib Choi, Ji Hye Kwon, Yeon Soo Lee, Kyoung Jin Ha
  • Publication number: 20150069310
    Abstract: Disclosed are a photosensitive resin composition for a color filter including (A) a colorant including a dye; (B) a photocurable dispersing agent; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent, and a color filter using the same.
    Type: Application
    Filed: August 21, 2014
    Publication date: March 12, 2015
    Inventors: Ju-Ho JUNG, Ji-Hye KWON, Jee-Hyun RYU, In-Jae LEE, Min-Kyeol CHUNG, Sang-Won CHO, Mi-Jin CHOI, Seung-Jib CHOI, Soo-Young HEO
  • Publication number: 20150065598
    Abstract: A black photosensitive resin composition includes (A) pigment dispersion including at least two kinds of carbon black having different oil absorption from each other; (B) a binder resin; (C) a photopolymerizable monomer; (D) a photopolymerization initiator; and (E) a solvent. A light-blocking layer can be formed using the same.
    Type: Application
    Filed: March 19, 2014
    Publication date: March 5, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Ho-Jeong PAEK, Do-Uk KIM, Min-Sung KIM, Lee-June KIM, Jin-Woo PARK, Young-Tai LEE, Young-Woong JANG, Seung-Jib CHOI
  • Publication number: 20150050595
    Abstract: Disclosed are a photosensitive resin composition including (A) a binder resin represented by the following Chemical Formula 1; (B) a reactive unsaturated compound; (C) an initiator; (D) a pigment; and (E) a solvent, and a light blocking layer using the same, wherein, in the following Chemical Formula 1, each substituent is the same as defined in the detailed description.
    Type: Application
    Filed: April 3, 2014
    Publication date: February 19, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Seung-Hyun KIM, Dong-Hoon WON, Youn-Gi LEE, Chang-Min LEE, Hwan-Sung CHEON, Seung-Jib CHOI, Min-Sung KIM, Tae-Ho KIM
  • Publication number: 20150048334
    Abstract: A photocurable composition, a composition for encapsulation of an organic light emitting diode, and an encapsulated apparatus, wherein, in the photocurable composition, when A represents a glass-metal alloy die shear strength in kgf between a glass substrate and a Ni/Fe alloy after curing, and B represents curing shrinkage in % as determined by Equation 1, below, and the photocurable composition has a value for A/B of about 0.7 kgf/% or more and the glass-metal alloy die shear strength of about 2.5 kgf or more, Curing shrinkage=|(Specific gravity of solid photocurable composition after curing)?(Specific gravity of liquid photocurable composition before curing)|/(Specific gravity of liquid photocurable composition before curing)×100.
    Type: Application
    Filed: July 21, 2014
    Publication date: February 19, 2015
    Inventors: Ji Yeon LEE, Sung Min KO, Seong Ryong NAM, Se Il OH, Seung Jib CHOI, Kyoung Jin HA
  • Publication number: 20150034886
    Abstract: A photosensitive resin composition for a color filter includes (A) a dye including a cation moiety represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as defined in the detailed description; (B) an acrylic-based photopolymerizable monomer; (C) a photopolymerization initiator; (D) an acrylic-based binder resin; and (E) a solvent, and a color filter using the same.
    Type: Application
    Filed: December 5, 2013
    Publication date: February 5, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Chang-Min LEE, Kwang-Won SEO, Yeon-Soo LEE, Sang-Won CHO, Seung-Jib CHOI, Soo-Young HEO
  • Publication number: 20140343187
    Abstract: A photosensitive resin composition for a color filter includes (A) a yellow or orange dye; (B) a dye combination of a cyanine dye represented by the following Chemical Formula 1, wherein in Chemical Formula 1, each substituent is the same as described in the detailed description, and a metal complex dye; (C) an acrylic-based binder resin; (D) a photopolymerizable monomer; (E) a photopolymerization initiator; and (F) a solvent, and a color filter using the same.
    Type: Application
    Filed: December 10, 2013
    Publication date: November 20, 2014
    Applicant: Cheil Industries Inc.
    Inventors: In-Jae LEE, Dong-Wan KIM, Ji-Hong KIM, Jee-Hyun RYU, Ji-Young JEONG, Seung-Jib CHOI
  • Publication number: 20140329927
    Abstract: The present invention relates to a photocurable adhesive composition. The photocurable adhesive composition comprises a urethane(meth)acrylate resin, a functional-group-containing polybutadiene, a photocurable monomer and a photoinitiator; and the functional group is either an epoxy group or a hydroxyl group. The photocurable adhesive composition ensures good outdoor readability, has outstanding adhesive properties, and impact strength and optical transparency, and minimizes the phenomenon whereby substantial contraction occurs during photocuring, and thus can be suitably used for a display.
    Type: Application
    Filed: August 6, 2012
    Publication date: November 6, 2014
    Inventors: Kyoung Jin Ha, Ji Hye Kwon, Lee June Kim, Irina Nam, Se Il Oh, Seung Jib Choi
  • Publication number: 20140178675
    Abstract: A composition for encapsulation and an encapsulated apparatus, the composition including a (meth)acrylic alkoxysilane monomer including a moiety represented by Formula 1 or 2, below, or an oligomer thereof; a multifunctional (meth)acrylate monomer or an oligomer thereof; and an initiator, wherein * and ** represent a binding site between elements.
    Type: Application
    Filed: November 22, 2013
    Publication date: June 26, 2014
    Inventors: Kyoung Jin HA, Ji Hye KWON, Seong Ryong NAM, Yeon Soo LEE, Chang Min LEE, Seung Jib CHOI
  • Publication number: 20140106111
    Abstract: A photocurable composition, a composition for encapsulation of an organic light emitting device, an encapsulated device, and an encapsulated apparatus, the photocurable composition including a photocurable monomer; a silicon-containing monomer; and a photopolymerization initiator, wherein the silicon-containing monomer has a structure represented Formula 1:
    Type: Application
    Filed: September 25, 2013
    Publication date: April 17, 2014
    Inventors: Seong Ryong NAM, Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Chang Soo WOO, Yeon Soo LEE, Kyoung Jin HA
  • Publication number: 20130328028
    Abstract: Disclosed are a photocurable composition which includes (A) a photocurable monomer and (B) a monomer represented by Formula 1, and an apparatus including a protective layers formed of the composition;
    Type: Application
    Filed: June 12, 2013
    Publication date: December 12, 2013
    Inventors: Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Kyoung Jin HA, Yeon Soo LEE
  • Publication number: 20130236681
    Abstract: A photocurable composition includes (A) a photocurable monomer and (B) a silicon-containing monomer or oligomer thereof, the silicon-containing monomer being represented by Formula 1
    Type: Application
    Filed: March 5, 2013
    Publication date: September 12, 2013
    Inventors: Chang Min LEE, Seung Jib CHOI, Ji Hye KWON, Irina NAM, Jin Seong PARK, Yeon Soo LEE, Kyoung Jin HA
  • Patent number: 8193259
    Abstract: A photocurable pressure-sensitive adhesive (PSA) composition includes an acrylic PSA binder, the acrylic PSA binder including at least one fluoro group in an amount of about 6 mol % to about 30 mol % based on a total amount of the acrylic PSA binder, a thermal curing agent, and a photoinitiator.
    Type: Grant
    Filed: October 2, 2008
    Date of Patent: June 5, 2012
    Assignee: Cheil Industries, Inc.
    Inventors: Seung Jib Choi, Kyoung Jin Ha, Jun Suk Kim, Kyung Ju Lee, Chang Beom Chung
  • Publication number: 20110123933
    Abstract: A polymer, including a polymerized monomer, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: September 27, 2010
    Publication date: May 26, 2011
    Inventors: Sang-Geun YUN, Sang-Jun Choi, Seung-Jib Choi, Sung-Jae Lee, Jin-Young Lee
  • Publication number: 20110123925
    Abstract: A polymer includes a first repeating unit represented by the following Chemical Formula 1, and a second repeating unit including at least one repeating unit represented by the following Chemical Formulae 2 to 6.
    Type: Application
    Filed: November 19, 2010
    Publication date: May 26, 2011
    Inventors: Sang-Geun YUN, Sang-Jun Choi, Seung-Jib Choi, Sung-Jae Lee
  • Publication number: 20100167200
    Abstract: A (meth)acrylate compound having an acid-labile ester group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1 wherein, R1 is hydrogen or methyl, R2 and R3 are each independently a substituted or unsubstituted linear alkyl, a substituted or unsubstituted cyclic alkyl, or linked each other to form a monocyclic ring or a fused-ring, and R4 is a linear ester or cyclic ester group.
    Type: Application
    Filed: December 30, 2009
    Publication date: July 1, 2010
    Inventors: Sang-Jun Choi, Sung-Jae Lee, Seung-Jib Choi
  • Publication number: 20100151388
    Abstract: A (meth)acrylate compound having a nitrogen-containing cyclic group, a photosensitive polymer, and a resist composition including the same, the (meth)acrylate compound being represented by the following Chemical Formula 1:
    Type: Application
    Filed: December 11, 2009
    Publication date: June 17, 2010
    Inventors: Young-Soo Yang, Seung-Jib Choi, Jun-Sunk Kim, Sang-Jun Choi