Patents by Inventor Seung-Mo Lee

Seung-Mo Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11984448
    Abstract: A semiconductor device is provided. The semiconductor device includes a substrate, a first base fin protruding from the substrate and extending in a first direction, and a first fin type pattern protruding from the first base fin and extending in the first direction. The first base fin includes a first sidewall and a second sidewall, the first and second sidewalls extending in the first direction, the first sidewall opposite to the second sidewall, the first sidewall of the first base fin at least partially defines a first deep trench, the second sidewall of the first base fin at least partially defines a second deep trench, and a depth of the first deep trench is greater than a depth of the second deep trench.
    Type: Grant
    Filed: October 25, 2021
    Date of Patent: May 14, 2024
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Bok Young Lee, Young Mook Oh, Hyung Goo Lee, Hae Geon Jung, Seung Mo Ha
  • Publication number: 20240153513
    Abstract: A complex number quantization-based audio signal encoding method may comprise: estimating a scale factor for each subband of an input audio signal; performing complex magnitude scaling for each subband based on the scale factor; and performing polar quantization on a complex frequency coefficient for each subband, wherein the performing the polar quantization for each subband comprises applying two or more different magnitude quantization techniques based on the magnitude of the complex frequency coefficient scaled for each subband.
    Type: Application
    Filed: November 6, 2023
    Publication date: May 9, 2024
    Applicant: Electronics and Telecommunications Research Institute
    Inventors: Byeong Ho CHO, Seung Kwon BEACK, Jong Mo SUNG, Tae Jin LEE, Woo Taek LIM, In Seon JANG
  • Publication number: 20240120177
    Abstract: A substrate processing method is provided. The substrate processing method comprises loading a substrate onto a substrate support inside a chamber, forming a plasma inside the chamber, providing a first DC pulse signal to an electromagnet that generates a magnetic field inside the chamber and processing the substrate with the plasma, wherein the first DC pulse signal is repeated at a first period including a first section and a second section subsequent to the first section, the first DC pulse signal has a first level during the first section, and the first DC pulse signal has a second level different from the first level during the second section.
    Type: Application
    Filed: September 19, 2023
    Publication date: April 11, 2024
    Inventors: Ji Mo LEE, Dong Hyeon NA, Myeong Soo SHIN, Woong Jin CHEON, Kyung-Sun KIM, Jae Bin KIM, Tae-Hwa KIM, Seung Bo SHIM
  • Patent number: 11942264
    Abstract: A coil component includes a body having a first surface, and a first end surface and a second end surface connected to the first surface and opposing each other in a length direction; a support substrate disposed inside the body; a coil portion comprising a first coil pattern and first and second lead-out patterns, each disposed on a first surface of the support substrate; first and second slit portions, respectively defined on edge portions of the first surface of the body to expose the first and second lead-out patterns; and first and second external electrodes disposed on the first and second slit portions to be connected to the first and second lead-out patterns. At least one of the first and second lead-out patterns has a thickness greater than a thickness of each of the first coil pattern and the first dummy lead-out pattern.
    Type: Grant
    Filed: December 8, 2020
    Date of Patent: March 26, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: No Il Park, Byung Soo Kang, Seung Mo Lim, Byeong Cheol Moon, Boum Seock Kim, Yong Hui Li, Seung Min Lee
  • Patent number: 11915853
    Abstract: A coil component is provided. The coil component includes a body having fifth and sixth surfaces opposing each other, first and second surfaces respectively connecting the fifth and sixth surfaces of the body and opposing each other, and third and fourth surfaces respectively connecting the first and second surfaces of the body and opposing each other in one direction, a recess disposed in an edge between one of the first and second surfaces of the body and the sixth surface of the body, a coil portion disposed inside the body and exposed through the recess, and an external electrode including a connection portion disposed in the recess and connected to the coil portion, and a pad portion disposed on one surface of the body. A length of the pad portion in the one direction is greater than a length of the connection portion in the one direction.
    Type: Grant
    Filed: November 6, 2020
    Date of Patent: February 27, 2024
    Assignee: SAMSUNG ELECTRO-MECHANICS CO., LTD.
    Inventors: Seung Mo Lim, Seung Min Lee, Byeong Cheol Moon, Yong Hui Li, Byung Soo Kang, Ju Hwan Yang, Tai Yon Cho, No Il Park, Tae Jun Choi
  • Patent number: 11772974
    Abstract: Provided are a graphene preparation apparatus, including: a chamber having a space for preparation of graphene; a first electrode and a second electrode disposed in the chamber to be separated a predetermined distance from each other, the first electrode and the second electrode supporting a catalytic metal and receiving electric current for preparation of the graphene to heat the catalytic metal using Joule heating; additional heaters disposed at opposite sides of the catalytic metal, respectively, and heating the catalytic metal to compensate for a temperature difference between both end regions and a central region of the catalytic metal heated using Joule heating induced by the first electrode and the second electrode; and a current supply unit supplying electric current to the first electrode and the second electrode.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: October 3, 2023
    Assignee: CENTER FOR ADVANCED META-MATERIALS
    Inventors: Hyun June Jung, Jae Hyun Kim, Choong Man Moon, Hak Joo Lee, Bong Kyun Jang, Kwang Seop Kim, Seung Mo Lee, Yun Hwangbo
  • Publication number: 20230300974
    Abstract: An embodiment of the present invention provides a stretchable substrate allowing various pitch control for a device thereon, and a method of controlling a device spacing using the same. Here, the stretchable substrate includes a cell and an electrode wiring. The cell is divided by cutting lines to form a plurality of cells. The electrode wiring is continuously provided on the plurality of cells not to cross the cutting line. A cell is connected to a neighboring cell by a connection portion in which a cutting line is not formed, and when a tensile force is applied, the cell is hinge-rotated around the connection portion, and the electrode wiring maintains a continuous state even when the cell is hinged.
    Type: Application
    Filed: August 31, 2021
    Publication date: September 21, 2023
    Inventors: Bongkyun JANG, Sejeong WON, Jae-Hyun KIM, Hak Joo LEE, Seung-Mo LEE, Kwangseop KIM, Ah Hyun PARK
  • Publication number: 20230116960
    Abstract: Disclosed herein are a metastructure having a zero elastic modulus zone, which can experience constant stress in a predetermined strain zone, and a method for designing the same. The metastructure includes a first unit and a second unit, wherein the first unit has a structure capable of buckling and has a stress-strain relation having a zone corresponding to a negative elastic modulus, the second unit is disposed adjacent to the first unit and has a stress-strain relation having a zone corresponding to a positive elastic modulus, and the metastructure has zero elastic modulus in a predetermined target strain zone through synthesis of the negative elastic modulus of the first unit with the positive elastic modulus of the second unit.
    Type: Application
    Filed: December 19, 2022
    Publication date: April 20, 2023
    Applicant: CENTER FOR ADVANCED META-MATERIALS
    Inventors: Bong Kyun JANG, Jae Hyun KIM, Se Jeong WON, Hak Joo LEE, Seung Mo LEE, Kwang Seop KIM
  • Patent number: 11465406
    Abstract: A film transferring method according to an embodiment of the present invention of transferring a film adhered to a substrate to a roller in a state that a first adhesion force between the roller and the film and a second adhesion force between the film and the substrate are substantially the same includes: a transporting step of transporting the substrate and the film of which a first adhesion surface formed on one surface is adhered to the substrate in a first direction; a close contacting step of closely contacting the front end of the second adhesion surface formed on the other surface of the film that is transported with the roller rotating in the first rotation direction; and a transferring step of peeling the film from the substrate and simultaneously transferring it to the roller by peeling the front adhesion surface of the first adhesion surface from the substrate, while simultaneously transferring the front end of the second adhesion surface to the roller and continuously transporting the substrate i
    Type: Grant
    Filed: October 28, 2019
    Date of Patent: October 11, 2022
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Bongkyun Jang, Jae-Hyun Kim, Hyun-Sung Park, Seung-Mo Lee, Kwangseop Kim, Byung-iK Choi
  • Publication number: 20220009221
    Abstract: A film transferring method according to an embodiment of the present invention of transferring a film adhered to a substrate to a roller in a state that a first adhesion force between the roller and the film and a second adhesion force between the film and the substrate are substantially the same includes: a transporting step of transporting the substrate and the film of which a first adhesion surface formed on one surface is adhered to the substrate in a first direction; a close contacting step of closely contacting the front end of the second adhesion surface formed on the other surface of the film that is transported with the roller rotating in the first rotation direction; and a transferring step of peeling the film from the substrate and simultaneously transferring it to the roller by peeling the front adhesion surface of the first adhesion surface from the substrate, while simultaneously transferring the front end of the second adhesion surface to the roller and continuously transporting the substrate i
    Type: Application
    Filed: October 28, 2019
    Publication date: January 13, 2022
    Inventors: Bongkyun JANG, Jae-Hyun KIM, Hyun-Sung PARK, Seung-Mo LEE, Kwangseop KIM, Byung-lk CHOI
  • Publication number: 20210235588
    Abstract: A method for transferring a micro device on a curved surface according to an exemplary embodiment of the present invention includes: coating an adhesive layer on an external circumferential surface of a tube; providing a micro device pattern on one side of a substrate; positioning an external circumferential surface of the tube to contact the substrate and allow a length direction of the device pattern to cross a radius direction of the tube, and rotating the tube with respect to an axis-direction of the tube and simultaneously moving at least one of the tube and the substrate in a rectilinear way to transfer the micro device pattern on the substrate to the adhesive layer; and fixing the transferred micro device pattern to the adhesive layer by curing the adhesive layer.
    Type: Application
    Filed: June 21, 2019
    Publication date: July 29, 2021
    Inventors: Bongkyun JANG, Jae-Hyun KIM, Kyung-Sik KIM, Seung-Mo LEE, Hyun June Jung, Hak Joo LEE
  • Patent number: 10858486
    Abstract: The present invention relates to a super absorbent polymer and a production method thereof which enable production of a super absorbent polymer exhibiting a more improved absorption rate while maintaining excellent absorption characteristics.
    Type: Grant
    Filed: March 17, 2016
    Date of Patent: December 8, 2020
    Inventors: Seung Mo Lee, Gi Cheul Kim, Ki Hyun Kim, Je Kyun Lee, Jong Hun Kim, Taegyeong Kang
  • Publication number: 20200331758
    Abstract: Provided are a graphene preparation apparatus, including: a chamber having a space for preparation of graphene; a first electrode and a second electrode disposed in the chamber to be separated a predetermined distance from each other, the first electrode and the second electrode supporting a catalytic metal and receiving electric current for preparation of the graphene to heat the catalytic metal using Joule heating; additional heaters disposed at opposite sides of the catalytic metal, respectively, and heating the catalytic metal to compensate for a temperature difference between both end regions and a central region of the catalytic metal heated using Joule heating induced by the first electrode and the second electrode; and a current supply unit supplying electric current to the first electrode and the second electrode.
    Type: Application
    Filed: December 10, 2018
    Publication date: October 22, 2020
    Applicant: CENTER FOR ADVANCED META-MATERIALS
    Inventors: Hyun June JUNG, Jae Hyun KIM, Choong Man MOON, Hak Joo LEE, Bong Kyun JANG, Kwang Seop KIM, Seung Mo LEE, Yun HWANGBO
  • Patent number: 10744750
    Abstract: A selective transfer roll stamp is provided which rotates on a source substrate to selectively transfer elements arranged on the source substrate. The selective transfer roller stamp includes: a roller unit rotating about an axis of rotation and including projecting portions protruding in a radial direction and recessed portions formed between neighboring projecting portions; and an adhesive layer formed on the outer circumferential surface of the roller unit and coming into contact with the elements, wherein the outer circumferential surface of the adhesive layer is made flat in a circumferential direction.
    Type: Grant
    Filed: November 29, 2016
    Date of Patent: August 18, 2020
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Kwangseop Kim, Chan Kim, Bongkyun Jang, Jae-Hyun Kim, Seung-Mo Lee, Yun Hwangbo
  • Patent number: 10669381
    Abstract: The present invention relates to a method for a super absorbent polymer. The method for preparing a super absorbent polymer according to the present invention makes it possible to provide a super absorbent polymer in which characteristics such as a centrifuge retention capacity and an absorption rate are improved in a balanced manner.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: June 2, 2020
    Assignee: LG Chem, Ltd.
    Inventors: Seung Mo Lee, Gi Cheul Kim, Kyu Pal Kim
  • Patent number: 10626225
    Abstract: The present invention relates to a method for a super absorbent polymer. The method for preparing a super absorbent polymer according to the present invention makes it possible to provide a super absorbent polymer in which characteristics such as a centrifuge retention capacity and an absorption rate are improved in a balanced manner.
    Type: Grant
    Filed: March 18, 2016
    Date of Patent: April 21, 2020
    Assignee: LG Chem, Ltd.
    Inventors: Seung Mo Lee, Gi Cheul Kim, Kyu Pal Kim
  • Publication number: 20190308400
    Abstract: A selective transfer roll stamp is provided which rotates on a source substrate to selectively transfer elements arranged on the source substrate. The selective transfer roller stamp includes: a roller unit rotating about an axis of rotation and including projecting portions protruding in a radial direction and recessed portions formed between neighboring projecting portions; and an adhesive layer formed on the outer circumferential surface of the roller unit and coming into contact with the elements, wherein the outer circumferential surface of the adhesive layer is made flat in a circumferential direction.
    Type: Application
    Filed: November 29, 2016
    Publication date: October 10, 2019
    Inventors: Kwangseop KIM, Chan KIM, Bongkyun JANG, Jae-Hyun KIM, Seung-Mo LEE, Yun HWANGBO
  • Patent number: 10418188
    Abstract: In a method for manufacturing a supercapacitor, a first graphene current collector, a first electrode and a first separating layer are sequentially formed on a first metal layer, to form a first stacked layer. A second graphene current collector and a second electrode are sequentially formed on a second metal layer, to form a second stacked layer. The second electrode of the second stacked layer is formed on the first separating layer of the first stacked layer, to form a third stacked layer. The third stacked layer is compressed to remove the first and second metal layers, to form a unit stacked layer. The unit stacked layer and a second separating layer or an insulating layer are alternately formed.
    Type: Grant
    Filed: February 24, 2017
    Date of Patent: September 17, 2019
    Assignee: KOREA INSTITUTE OF MACHINERY & MATERIALS
    Inventors: Jae-hyun Kim, Seung-mo Lee, Bong-kyun Jang, In-kyu You, Sung-hoon Hong, Ju-mi Kim, Bit-na Kim
  • Publication number: 20190066935
    Abstract: In a method for manufacturing a supercapacitor, a first graphene current collector, a first electrode and a first separating layer are sequentially formed on a first metal layer, to form a first stacked layer. A second graphene current collector and a second electrode are sequentially formed on a second metal layer, to form a second stacked layer. The second electrode of the second stacked layer is formed on the first separating layer of the first stacked layer, to form a third stacked layer. The third stacked layer is compressed to remove the first and second metal layers, to form a unit stacked layer. The unit stacked layer and a second separating layer or an insulating layer are alternately formed.
    Type: Application
    Filed: February 24, 2017
    Publication date: February 28, 2019
    Inventors: Jae-hyun KIM, Seung-mo LEE, Bong-kyun JANG, In-kyu YOU, Sung-hoon HONG, Ju-mi KIM, Bit-na KIM
  • Patent number: 10144809
    Abstract: The present invention relates to a method for preparing super absorbent polymer, and the method for preparing super absorbent polymer according to the present invention may reduce the content of non-reacted monomers in the super absorbent polymer, by using three kinds of polymerization initiators.
    Type: Grant
    Filed: December 10, 2015
    Date of Patent: December 4, 2018
    Assignee: LG Chem, Ltd.
    Inventors: Seung Mo Lee, Gi Cheul Kim, Kum Hyoung Lee, Se Yeol Park