Patents by Inventor Seung Won Baek
Seung Won Baek has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20240180041Abstract: The present invention relates to a heterojunction semiconductor substrate having excellent dielectric properties, a method of manufacturing the same, and an electronic device using the same. The present invention provides a heterojunction semiconductor substrate with improved interlayer adhesion, low leakage current, and excellent dielectric properties that maintain strength in a ferroelectric fatigue experiment by interposing a metal layer and a conductive metal oxide layer on a semiconductor substrate to form an epitaxial oxide thin film layer composed of perovskite piezoelectric oxide. The heterojunction semiconductor substrate can be applied to sensors, actuators, transducers, or MEMS devices that use the high functionality of the high-quality epitaxial oxide thin film layer, including applications in electronic and optical devices.Type: ApplicationFiled: November 29, 2023Publication date: May 30, 2024Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Seung Hyub BAEK, Soo Young JUNG, Sunghoon HUR, Ji-Soo JANG, Jungho YOON, Hyun-Cheol SONG, Seong Keun KIM, Chong Yun KANG, Ji-Won CHOI, Jin Sang KIM
-
Publication number: 20240180043Abstract: Disclosed is a heterojunction semiconductor flexible substrate in which an epitaxial oxide thin film layer is hetero-bonded to a thinned silicon substrate using a metal layer, a manufacturing method thereof, and the heterojunction semiconductor flexible substrate can be applied to sensor, actuator, transducer, or micro electro mechanical systems (MEMS) device using high functionality of the epitaxial oxide thin film layer of high quality as well as an electronic and/or optical device.Type: ApplicationFiled: November 16, 2023Publication date: May 30, 2024Applicant: KOREA INSTITUTE OF SCIENCE AND TECHNOLOGYInventors: Seung Hyub BAEK, Min Seok KIM, Ji-Soo JANG, Sunghoon HUR, Jungho YOON, Hyun-Cheol SONG, Seong Keun KIM, Ji-Won CHOI, Jin Sang KIM, Chong Yun KANG
-
Publication number: 20240153104Abstract: The disclosed embodiment provides an apparatus and method for measuring eye movement, that can accurately measure eye movement by determining the eye position at high speed and high resolution even with a low-cost camera by using a phase mask and rolling shutter method instead of a lens, and can perform early diagnosis of neurological diseases, etc. based on the measured eye movement.Type: ApplicationFiled: November 2, 2022Publication date: May 9, 2024Inventors: Seung Ah LEE, Tae Young KIM, Kyung Won LEE, Nak Kyu BAEK, Jae Woo JUNG
-
Patent number: 11915965Abstract: A wafer processing method of the present invention includes mounting a wafer part on a chuck table, loading the wafer part on the chuck table, spraying, by a spray arm module, a first processing solution onto the wafer part to process the wafer part, spraying, by the spray arm module, a second processing solution onto the wafer part to process the wafer part, drying the wafer part on the chuck table, and unloading the wafer part from the chuck table.Type: GrantFiled: July 15, 2022Date of Patent: February 27, 2024Assignee: ZEUS CO., LTD.Inventors: Seung Dae Baek, Sung Yup Kim, Jin Won Kim, Jae Hwan Son
-
Patent number: 10682075Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.Type: GrantFiled: October 18, 2017Date of Patent: June 16, 2020Assignee: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATIONInventors: Min Ho Lee, Woo Jin Park, Seung Won Baek, Hae Seok Jeong, Taek Beom Yoo, Yoon Jin Lee, Hae Hyun Lee, Byoung Hyun Choi, Soo Min Hyun
-
Patent number: 10525568Abstract: The wafer polishing system is disclosed. The wafer polishing system may comprise a polishing unit; a slurry distribution unit mounted on the polishing unit and distributing a slurry flowing into the polishing unit for wafer polishing; a slurry tank connected to the slurry distribution unit and storing the slurry; a slurry pump connected to the polishing unit and the slurry tank for transferring the slurry from the slurry tank to the polishing unit; a first circulation line in which one side is connected to the slurry tank; a second circulation line in which one side is connected to the other side of the first circulation line and the other side is connected to the slurry distribution unit; and a cleaning liquid supply unit connected to the second circulation line for supplying a cleaning liquid flowing through the second circulation line.Type: GrantFiled: February 24, 2017Date of Patent: January 7, 2020Assignee: SK SILTRON CO., LTD.Inventors: Seung Won Baek, Jae Pyo Lee
-
Publication number: 20190239774Abstract: A dry eye syndrome alert system through posture and work detection, includes: a data collecting unit configured to detect a posture of a user to collect posture data of the user and preprocess the posture data; an eye blink frequency calculating unit configured to identify a posture change of the user on the basis of the posture data, calculate a motion variability on the basis of the posture change, and estimate an eye blink frequency of the user on the basis of the motion variability; and a diagnosis and alert output unit configured to store data regarding the estimated eye blink frequency, compare the estimated eye blink frequency with a preset reference value, and output an alert to the user when the estimated eye blink frequency is less than or equal to the preset reference value.Type: ApplicationFiled: October 18, 2017Publication date: August 8, 2019Applicant: SEOUL NATIONAL UNIVERSITY R&DB FOUNDATIONInventors: Min Ho LEE, Woo Jin PARK, Seung Won BAEK, Hae Seok JEONG, Taek Beom YOO, Yoon Jin LEE, Hae Hyun LEE, Byoung Hyun CHOI, Soo Min HYUN
-
Publication number: 20180185982Abstract: The wafer polishing system is disclosed. The wafer polishing system may comprise a polishing unit; a slurry distribution unit mounted on the polishing unit and distributing a slurry flowing into the polishing unit for wafer polishing; a slurry tank connected to the slurry distribution unit and storing the slurry; a slurry pump connected to the polishing unit and the slurry tank for transferring the slurry from the slurry tank to the polishing unit; a first circulation line in which one side is connected to the slurry tank; a second circulation line in which one side is connected to the other side of the first circulation line and the other side is connected to the slurry distribution unit; and a cleaning liquid supply unit connected to the second circulation line for supplying a cleaning liquid flowing through the second circulation line.Type: ApplicationFiled: February 24, 2017Publication date: July 5, 2018Inventors: Seung Won BAEK, Jae Pyo LEE
-
Patent number: 7863988Abstract: A microwave signal generator includes a magnetron to generate a microwave signal, a coupler to receive the microwave signal generated by the magnetron and to send the microwave signal to a load; and a band-pass filter to receive the microwave signal from the coupler and to filter the microwave signal to obtain a signal from an oscillation frequency band of the magnetron. The band-pass filter feeds the signal from the oscillation frequency band back to the magnetron in order to fix an oscillation frequency of the magnetron and is a DR (Dielectric Resonator) filter.Type: GrantFiled: August 8, 2008Date of Patent: January 4, 2011Assignee: LG Electronics Inc.Inventors: Seung Won Baek, Chae Hyun Baek, Yong Soo Lee, Jin Joo Choi
-
Publication number: 20090091395Abstract: The microwave signal generator includes a magnetron generating microwave signal. A filter filters a signal that may be a signal of the intrinsic oscillation frequency band of the magnetron, which is fed-back to the magnetron.Type: ApplicationFiled: August 8, 2008Publication date: April 9, 2009Inventors: Seung Won Baek, Chae Hyun Baek, Yong Soo Lee, Jin Joo Choi
-
Patent number: 7511251Abstract: A magnetron is provided including a yoke having an internal space, a first magnet provided at one end of the internal space, a second magnet provided at a second end of the internal space, the second magnet being axially spaced from the first magnet. Further, an anode cylinder that generates radio frequency energy may be provided axially between the first and second magnets, a first pole piece and a second pole piece may be provided proximate first and second openings of the anode cylinder, respectively. Additionally, the magnetron may also include a seal that intercepts external leakage, the seal may have an inward protrusion extending axially towards the anode cylinder; and a choke filter that intercepts external leakage provided proximate the seal.Type: GrantFiled: December 20, 2006Date of Patent: March 31, 2009Assignee: LG Electronics Inc.Inventors: Seung-Won Baek, Jong-Soo Lee
-
Patent number: 7318997Abstract: Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus comprises an electric field generator for generating an electric field to be applied to infiltrate an acid (H+) produced when a photoresist film is exposed into non-exposure regions. Non-exposure regions into which an acid is infiltrated along with exposure regions in a development process can be removed by applying an electric field to the acid produced during exposure of a photoresist film such that the acid is infiltrated into the non-exposure regions.Type: GrantFiled: September 27, 2004Date of Patent: January 15, 2008Assignee: Dongbu Electronics Co., Ltd.Inventors: Hyung-Won Kim, Seung-Won Baek
-
Publication number: 20070145899Abstract: A magnetron is provided including a yoke having an inner space; a first magnet provided at one end of the inner space, a second magnet provided at a second end of the inner space, the second magnet being axially spaced from the first magnet. Further, there is an anode cylinder that generates a high frequency provided between the first magnet and the second magnet; a first pole piece and a second pole piece provided proximate first and second openings of the anode cylinder, respectively. Additionally, a seal that prevents outward leakage and has an inward protrusion extending axially toward the anode cylinder; and a choke filter, provided beneath a free end of the inwardly bent end of the seal to prevent outward leakage, may be provided.Type: ApplicationFiled: December 22, 2006Publication date: June 28, 2007Applicant: LG ELECTRONICS INC.Inventors: Seung-Won BAEK, Jong-Soo LEE
-
Publication number: 20070139125Abstract: A magnetron is provided including a yoke having an internal space, a first magnet provided at one end of the internal space, a second magnet provided at a second end of the internal space, the second magnet being axially spaced from the first magnet. Further, an anode cylinder that generates radio frequency energy may be provided axially between the first and second magnets, a first pole piece and a second pole piece may be provided proximate first and second openings of the anode cylinder, respectively. Additionally, the magnetron may also include a seal that intercepts external leakage, the seal may have an inward protrusion extending axially towards the anode cylinder; and a choke filter that intercepts external leakage provided proximate the seal.Type: ApplicationFiled: December 20, 2006Publication date: June 21, 2007Applicant: LG ELECTRONICS INC.Inventors: Seung-Won BAEK, Jong-Soo LEE
-
Patent number: 7220949Abstract: Disclosed herein is a capacitor for a magnetron. The capacitor has dielectric members, which have a converging angle of less than 180° defined between lines extending from both sides of each dielectric member formed between corresponding ends of inner and outer electrodes of the dielectric member. The capacitor is reduced in size while having enhanced capacitance, thereby reducing a manufacturing time. The capacitor also has central conductors having enlarged portions larger than the inner electrode, thereby further enhancing the capacitance.Type: GrantFiled: August 17, 2005Date of Patent: May 22, 2007Assignee: LG Electronics, Inc.Inventors: Jong Soo Lee, Yong Soo Lee, Seung Won Baek
-
Patent number: 7123464Abstract: A high pressure condenser for a magnetron, in which a pair of dielectric ceramics having an arch shape are separated from each other, central conductors are connected to internal peripheries of the dielectric ceramics, and a ground metal is connected to external peripheries of the dielectric ceramics, thereby not requiring any additional structure for connecting the dielectric ceramics and the central conductors, simplifying the structures of the central conductors, and reducing the quantity of the dielectric ceramics needed in proportion to the separation interval between the dielectric ceramics.Type: GrantFiled: November 2, 2004Date of Patent: October 17, 2006Assignee: LG Electronics Inc.Inventors: Seung Won Baek, Yong Soo Lee, Jong Soo Lee
-
Publication number: 20050074703Abstract: Disclosed are an exposure apparatus for forming fine patterns of a semiconductor using an electric field and a method for forming fine patterns using the exposure apparatus. The exposure apparatus comprises an electric field generator for generating an electric field to be applied to infiltrate an acid (H+) produced when a photoresist film is exposed into non-exposure regions. Non-exposure regions into which an acid is infiltrated along with exposure regions in a development process can be removed by applying an electric field to the acid produced during exposure of a photoresist film such that the acid is infiltrated into the non-exposure regions.Type: ApplicationFiled: September 27, 2004Publication date: April 7, 2005Inventors: Hyung-Won Kim, Seung-Won Baek