Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems.

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.

Abstract: The present invention provides a modular high repetition rate ultraviolet gas discharge laser light source for a production line machine. The system includes an enclosed and purged beam path with beam pointing control for delivery the laser beam to a desired location such as the entrance port of the production line machine. In preferred embodiments, the production line machine is a lithography machine and two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality. A pulse stretcher more than doubles the output pulse length resulting in a reduction in pulse power (mJ/ns) as compared to prior art laser systems.

Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

Abstract: The present invention provides an ultra pure purge system for discharge lasers. The LNP, the output coupler, the wavemeter and selected high voltage components are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is filtered and directed to each of the inlet ports. Gas exiting the outlet ports may be directed to flow monitors having alarms so that any loss of purge will be immediately detected. Purge gas may be exhausted or recirculated.

Abstract: A laser component purge system for discharge lasers. The LNP, the output coupler and the wavemeter are contained in sealed chambers each having a purge inlet port and a purge outlet port. Purge gas such as N2 is directed to each of the inlet ports. A purge monitoring system is provided which monitors the purge flow and provides one or more signals to a processor which is programmed to minimize laser timeouts attributable to purge conditions without endangering the purged optical components. In a preferred embodiment, gas exiting the outlet ports are directed to flow monitors which provide the one or more signals to the processor. Purge gas may be exhausted or recirculated.

Abstract: The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.

Abstract: An excimer laser system with a fluorine control having a fixed volume inject bottle in which fluorine is injected prior to it being injected into the laser chamber. A manifold and feedback control system is provided to permit precise injection at rates approaching continuous fluorine injection. The system permits the laser to be operated in a small sweet spot as measured by a narrow range of charging voltage.

Abstract: An excimer laser with a laser gas containing fluorine in which the fluorine concentration is maintained continuously at or substantially at desired predetermined levels. A real time or substantially real time fluorine monitor provides a feedback signal to a fluorine flow control system which provides continuous fluorine injection flow into the laser chamber to precisely compensate for fluorine depletion and maintain fluorine concentration precisely at desired levels. In a preferred embodiment, fluorine detector which may be a chemical detector periodically measures the fluorine concentration in laser gas discharged from the laser in order to calibrate the real time or substantially real time fluorine monitor. In a second preferred embodiment, the continuous inlet flow is from two gas sources, one containing fluorine, a noble gas and a buffer gas and the other containing only the noble gas and the buffer gas.