Abstract: The present invention relates to a display device, comprising: a first substrate comprising a first inner surface, a first outer surface opposite to the first inner surface, a display region, a bonding region adjacent to the display region, a plurality of thin film transistors disposed on the first inner surface and corresponding to the display region; a second substrate opposite to the display region and comprising a second inner surface, a second outer surface opposite to the second inner surface, a first color resist and a second color resist each disposed on the second inner surface; a display molecular layer disposed between the first substrate and the second substrate; an electrical shielding layer disposed on the first outer surface of the first substrate, wherein the electrical shielding layer comprises a first shielding region corresponding to the first color resist and a second shielding region corresponding to the bonding region.

Abstract: The present invention relates to a display device, comprising: a first substrate comprising a first inner surface, a first outer surface opposite to the first inner surface, a display region, a bonding region adjacent to the display region, a plurality of thin film transistors disposed on the first inner surface and corresponding to the display region; a second substrate opposite to the display region and comprising a second inner surface, a second outer surface opposite to the second inner surface, a first color resist and a second color resist each disposed on the second inner surface; a display molecular layer disposed between the first substrate and the second substrate; an electrical shielding layer disposed on the first outer surface of the first substrate, wherein the electrical shielding layer comprises a first shielding region corresponding to the first color resist and a second shielding region corresponding to the bonding region.

Abstract: A method for manufacturing a display panel is disclosed. The method includes: forming a color filter and a transparent conductive film on a surface of a first substrate, the color filter being interposed between the first substrate and the transparent conductive film; forming an electrostatic protective layer on the other surface of the first substrate; forming another transparent conductive film on a second substrate; forming a light-valve molecular layer between the first substrate and the second substrate; performing a defect inspection in the display panel; and irradiating a laser onto the electrostatic protective layer when a defect is found in the display panel, such that a carbonization structure is formed in the electrostatic protective layer at a position corresponding to the defect.

Abstract: A method for manufacturing a display panel is disclosed. The method includes: forming a color filter and a transparent conductive film on a surface of a first substrate, the color filter being interposed between the first substrate and the transparent conductive film; forming an electrostatic protective layer on the other surface of the first substrate; forming another transparent conductive film on a second substrate; forming a light-valve molecular layer between the first substrate and the second substrate; performing a defect inspection in the display panel; and irradiating a laser onto the electrostatic protective layer when a defect is found in the display panel, such that a carbonization structure is formed in the electrostatic protective layer at a position corresponding to the defect.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.

Abstract: An exposure apparatus is provided and adapted for exposing a photoresist layer on a layer to form a plurality of strip exposed patterns. The exposure apparatus includes a light source, a lens group and a mask. The lens group is disposed between the photoresist layer and the light source and includes a plurality of strip lens parallel to each other, wherein an overlapping region between any two neighboring strip lens is defined as a lens connecting region, and the other regions excluding the lens connecting regions are defined as lens regions. The mask is disposed between the photoresist layer and the lens group and includes a plurality of shielding patterns, wherein an outline of the shielding patterns corresponds to the strip exposed patterns, each shielding pattern has a strip opening, and an extension direction of the strip openings is substantially parallel to an extension direction of the shielding patterns.