Abstract: A method for monitoring at least one process parameter of a plasma process being performed on a semiconductor wafer, surface or surface and determine arc events occurring within the plasma tool chamber. The method comprises the steps of detecting the modulated light being generated from the plasma sheath during the plasma process; sampling RF voltage and current signals from the RF transmission line; processing the detected modulated light and the RF signals to produce at least one monitor statistic for the plasma process, and process the monitor signal to determine the occurrence of arcing events during the wafer processing.

Abstract: A method for monitoring at least one process parameter of a plasma process being performed on a semiconductor wafer, surface or surface and determine arc events occurring within the plasma tool chamber. The method comprises the steps of detecting the modulated light being generated from the plasma sheath during the plasma process; sampling RF voltage and current signals from the RF transmission line; processing the detected modulated light and the RF signals to produce at least one monitor statistic for the plasma process, and process the monitor signal to determine the occurrence of arcing events during the wafer processing.

Abstract: A method and apparatus for sterilizing an article. The method comprises placing an article in a sterilization container, generating oxidizing plasma radicals at atmospheric pressure, and providing the oxidizing plasma radicals to the sterilization container to sterilize the article in the container.

Abstract: A method and apparatus for sterilising an article. The method comprises placing an article in a sterilisation container, generating oxidizing plasma radicals at atmospheric pressure, and providing the oxidizing plasma radicals to the sterilisation container to sterilise the article in the container.

Abstract: Method and apparatus for measuring process parameters of a plasma etch process. A method for detecting at least one process parameter of a plasma etch process being performed on a semiconductor wafer. The method comprises the steps of detecting light being generated from the plasma during the etch process, filtering the detected light to extract modulated light; and processing the detected modulated light to determine at least one process parameter of the etch process.

Abstract: A client requests an object at a first server in a content delivery network (CDN), the request having been directed to said first server regardless of whether the first server has the requested object; When the first server does not have a copy of the requested object, it selectively replicating the requested object on the first server. The replicating is based at least in part on a measure of popularity of the requested object, wherein the requested object is not replicated to the first server when the measure of popularity of the requested object does not exceed a popularity threshold.

Abstract: A content delivery method directs a request by a client for an object to a first server in a content delivery network (CDN), regardless of whether the first server has the requested object. If the first server has the requested object, then it is served to the client from the first server; otherwise, the first server redirects the client request to a second server in the CDN to handle the request. The second server may be a peer server of the first server. The first and second servers may be edge servers in the CDN.

Abstract: A method, system and computer program product for managed object replication and delivery redirects, directly or indirectly, a client's request for an object that is not available at a best or optimal handling edge server of a network to a parent server that has the requested object. So, where the requested object is not available at the handling edge server, the client's request is redirected directly to the parent server that can provide the requested object to the client or indirectly via one or more parent servers to a parent server that can provide the requested object to the client. The method, system and computer program product further intelligently replicates the object to the edge server if the object is popular enough. Likewise, an object is removed from an edge server when it is no longer popular. All redirection and replication operations are preferably transparent to the end-user and do not degrade the quality of service.

Abstract: A method, system and computer program product for managed object replication and delivery redirects, directly or indirectly, a client's request for an object that is not available at a best or optimal handling edge server of a network to a parent server that has the requested object. So, where the requested object is not available at the handling edge server, the client's request is redirected directly to the parent server that can provide the requested object to the client or indirectly via one or more parent servers to a parent server that can provide the requested object to the client. The method, system and computer program product further intelligently replicates the object to the edge server if the object is popular enough. Likewise, an object is removed from an edge server when it is no longer popular. All redirection and replication operations are preferably transparent to the end-user and do not degrade the quality of service.