Patents by Inventor Shang-Ju Hsieh

Shang-Ju Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11111373
    Abstract: A polymethacrylate composition, an optical device made therefrom, and a display apparatus are provided. The polymethacrylate composition includes 50 to 85 parts by weight of methacrylate series polymer, 15 to 50 parts by weight of styrene series-maleic anhydride series copolymer, and an aromatic compound having a phosphite group. The methacrylate series polymer includes methacrylate series monomer unit and acrylate series monomer unit and has a weight average molecular weight (Mw) in a range between 20,000 and 200,000. The styrene series-maleic anhydride series copolymer includes 65 wt %-85 wt % of styrene series monomer unit, 15 wt %-35 wt % of maleic anhydride series monomer unit, and 0-20 wt % of second copolymerizable monomer unit. The content of the aromatic compound having a phosphite group in the polymethacrylate composition is 200 ppm-900 ppm.
    Type: Grant
    Filed: November 28, 2019
    Date of Patent: September 7, 2021
    Assignee: Chi Mei Corporation
    Inventor: Shang-Ju Hsieh
  • Publication number: 20200181388
    Abstract: A polymethacrylate composition, an optical device made therefrom, and a display apparatus are provided. The polymethacrylate composition includes 50 to 85 parts by weight of methacrylate series polymer, 15 to 50 parts by weight of styrene series-maleic anhydride series copolymer, and an aromatic compound having a phosphite group. The methacrylate series polymer includes methacrylate series monomer unit and acrylate series monomer unit and has a weight average molecular weight (Mw) in a range between 20,000 and 200,000. The styrene series-maleic anhydride series copolymer includes 65 wt %-85 wt % of styrene series monomer unit, 15 wt %-35 wt % of maleic anhydride series monomer unit, and 0-20 wt % of second copolymerizable monomer unit. The content of the aromatic compound having a phosphite group in the polymethacrylate composition is 200 ppm-900 ppm.
    Type: Application
    Filed: November 28, 2019
    Publication date: June 11, 2020
    Applicant: Chi Mei Corporation
    Inventor: Shang-Ju Hsieh
  • Patent number: 10221308
    Abstract: A resin composition for laser marking includes a resin and laser absorbers. The resin includes 40%˜83% (methyl)acrylate-styrene based copolymers (A), greater than 0 to 45% (methyl)acrylate based copolymers (B) and 5˜35% core-shell copolymers (C) by weight. The laser absorbers include 0.01˜0.25 parts of carbon black (D) for each 100 parts by weight of the resin. The (methyl)acrylate-styrene based copolymer (A) includes 40˜80% (methyl)acrylate-containing monomer units, 20% to 60% styrene series monomer units and 0% to 30% other-polymerizable monomer units by weight. The (methyl)acrylate based copolymers (B) includes 92˜99% methacrylate-type monomer units, 1˜8% acrylate series monomer units and 0˜7% vinyl-group-containing polymerizable monomer units by weight and has a weight-average molecular weight ranging from 70,000 to 150,000.
    Type: Grant
    Filed: February 2, 2017
    Date of Patent: March 5, 2019
    Assignee: CHI MEI CORPORATION
    Inventor: Shang-Ju Hsieh
  • Publication number: 20170226333
    Abstract: A resin composition for laser marking includes a resin and laser absorbers. The resin includes 40%˜83% (methyl)acrylate-styrene based copolymers (A), 0˜45% (methyl)acrylate based copolymers (B) and 5˜35% core-shell copolymers (C) by weight. The laser absorbers include 0.01˜0.25 parts of carbon black (D) for each 100 parts by weight of the resin. The (methyl)acrylate-styrene based copolymer (A) includes 40˜80% (methyl)acrylate-containing monomer units, 20% to 60% styrene series monomer units and 0% to 30% other-polymerizable monomer units by weight. The (methyl)acrylate based copolymers (B) includes 92˜99% methacrylate-type monomer units, 1˜8% acrylate series monomer units and 0˜7% vinyl-group-containing polymerizable monomer units by weight and has a weight-average molecular weight ranging from 70,000 to 150,000.
    Type: Application
    Filed: February 2, 2017
    Publication date: August 10, 2017
    Inventor: Shang-Ju Hsieh
  • Patent number: 4850026
    Abstract: A Chinese multifont recognition system, in which a scanner can input Chinese character pattern data into a recognition system to recognize all characters to complete the chinese input operation. The recognition system can recognize various printed fonts and chinese characters in various sizes. The recognition method is arranged that all the Chinese characters to be recognized are to be put in the system; all the features of a Chinese character are extracted, and stored in a feature data base. Later, any input Chinese character will recognized in accordance with the data base. Since it is a technique of extracting the features of a character pattern, the system can recognize the multifont Chinese characters. If it is necessary to expand the number of characters in the data base established originally, a character feature learning system may be used for storing new characters therein.
    Type: Grant
    Filed: July 5, 1988
    Date of Patent: July 18, 1989
    Assignee: Telecommunications Laboratories Dir. Gen'l of Telecom. Ministry of Communications
    Inventors: Sor-Shenn Jeng, Gan-How Chang, Kuang-Yao Chang, Jang-Keng Lin, Tsann-Shyong Liu, Rong-Hauh Ju, Hsien-Ju Chang, Yung-Lai Wu, Chih-Yen Yang, Jei-Shyong Huang, Shang-Ju Hsieh, Chun-Chu Wu