Patents by Inventor Shang-Sheng Li
Shang-Sheng Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230393481Abstract: A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.Type: ApplicationFiled: August 10, 2023Publication date: December 7, 2023Inventors: Chen Yi HSU, Shang-Sheng LI, Yung-Yao LEE
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Patent number: 11835861Abstract: A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.Type: GrantFiled: November 21, 2019Date of Patent: December 5, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chen Yi Hsu, Shang-Sheng Li, Yung-Yao Lee
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Publication number: 20230369084Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: ApplicationFiled: July 24, 2023Publication date: November 16, 2023Inventors: Tzu-Yang LIN, Cheng-Han WU, Chen-Yu LIU, Kuo-Shu TSENG, Shang-Sheng LI, Chen Yi HSU, Yu-Cheng CHANG
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Patent number: 11806743Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: GrantFiled: May 27, 2022Date of Patent: November 7, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANYInventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Patent number: 11769678Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: GrantFiled: November 20, 2020Date of Patent: September 26, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Tzu-Yang Lin, Cheng-Han Wu, Chen-Yu Liu, Kuo-Shu Tseng, Shang-Sheng Li, Chen Yi Hsu, Yu-Cheng Chang
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Publication number: 20230050816Abstract: A dispensing system includes a dispense material supply that contains a dispense material and a dispensing pump connected downstream from the dispense material supply. The dispensing pump includes a body made of a first electrically conductive material, one or more first electrical contacts that are disposed on the body of the dispensing pump, and one or more first connection wires that are coupled between each one of the one or more first electrical contacts and ground. The dispensing system also includes a dispensing nozzle connected downstream from the dispensing pump and includes a tube made of a second electrically conductive material, one or more second electrical contacts that are disposed on an outer surface of the tube, and one or more second connection wires that are coupled between each one of the one or more second electrical contacts and the ground.Type: ApplicationFiled: August 12, 2021Publication date: February 16, 2023Inventors: Tzu-Yang LIN, Yu-Cheng CHANG, Cheng-Han WU, Shang-Sheng LI, Chen-Yu LIU, Chen Yi HSU
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Publication number: 20220334486Abstract: A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.Type: ApplicationFiled: June 30, 2022Publication date: October 20, 2022Inventors: Chen Yi HSU, Shang-Sheng LI, Yung-Yao LEE
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Publication number: 20220288627Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: ApplicationFiled: May 27, 2022Publication date: September 15, 2022Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Patent number: 11344910Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: GrantFiled: December 29, 2017Date of Patent: May 31, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Publication number: 20210202284Abstract: A lithography includes a storage tank that stores process chemical fluid, an anti-collision frame, and an integrated sensor assembly. The storage tank includes a dispensing port positioned at a lowest part of the storage tank in a gravity direction. The anti-collision frame is coupled to the storage tank. An integrated sensor assembly is disposed on at least one of the anti-collision frame and the storage tank to measure a variation in fluid quality in response to fluid quality measurement of fluid.Type: ApplicationFiled: November 20, 2020Publication date: July 1, 2021Inventors: Tzu-Yang LIN, Cheng-Han WU, Chen-Yu LIU, Kuo-Shu TSENG, Shang-Sheng LI, Chen Yi HSU, Yu-Cheng CHANG
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Publication number: 20200174372Abstract: A resist material dispensing system includes a resist supply and a resist filter connected to the resist supply downstream from the resist supply. The resist material dispensing system includes a resist tank structure connected to the resist filter downstream from the resist filter and a resist pump device connected to the resist tank structure downstream from the resist tank structure. The resist tank structure is vertically arranged so that a resist material flows in a continuous downward flow from where the resist material enters the resist tank structure until the resist material exits the resist tank structure.Type: ApplicationFiled: November 21, 2019Publication date: June 4, 2020Inventors: Chen Yi HSU, Shang-Sheng LI, Yung-Yao LEE
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Publication number: 20180117621Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: ApplicationFiled: December 29, 2017Publication date: May 3, 2018Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Patent number: 9855579Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: GrantFiled: February 12, 2014Date of Patent: January 2, 2018Assignee: Taiwan Semiconductor Manufacturing CompanyInventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Patent number: 9793143Abstract: Embodiments of a semiconductor processing apparatus are provided. The semiconductor processing apparatus includes a housing and a support base disposed in the housing. The semiconductor processing apparatus also includes a carrying arm movably disposed on the support base and a nozzle device disposed on the carrying arm. The semiconductor processing apparatus further includes a wafer plate disposed on the support base. When a cleaning process is performed, the carrying arm is moved toward the wafer plate, and the nozzle device emits a first gas toward the support base and the wafer plate.Type: GrantFiled: January 6, 2014Date of Patent: October 17, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Yung-Chang Lu, Jian-Yuan Lai, Kai-Yuan Cheng
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Patent number: 9536759Abstract: A baking apparatus for baking a wafer is provided. The baking apparatus includes a wafer chuck configured to hold the wafer, and a heating device disposed over the wafer chuck and configured to heat the wafer. The baking apparatus also includes a carrying arm configured to transport the wafer over the wafer chuck. The wafer chuck is in physical contact with the center area of the bottom surface of the wafer when the wafer is held by the wafer chuck.Type: GrantFiled: May 29, 2015Date of Patent: January 3, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventors: Ching-Hai Yang, Shang-Sheng Li, Yao-Hwan Kao
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Publication number: 20160351423Abstract: A baking apparatus for baking a wafer is provided. The baking apparatus includes a wafer chuck configured to hold the wafer, and a heating device disposed over the wafer chuck and configured to heat the wafer. The baking apparatus also includes a carrying arm configured to transport the wafer over the wafer chuck. The wafer chuck is in physical contact with the center area of the bottom surface of the wafer when the wafer is held by the wafer chuck.Type: ApplicationFiled: May 29, 2015Publication date: December 1, 2016Inventors: Ching-Hai YANG, Shang-Sheng LI, Yao-Hwan KAO
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Publication number: 20150224532Abstract: A spin dispenser module and methods for using the same is disclosed. The spin dispenser module includes a cup having a basin with sidewalls and an exhaust, a rotatable platform situated inside the cup adapted for holding and rotating a substrate, a liquid dispenser disposed over the rotatable platform for dispensing a liquid coating material on top of the substrate, one or more ejector inlets disposed over the rotatable platform, the one or more ejectors connected to a negative pressure source, and a motor coupled to the rotatable platform to rate the rotatable platform at different rotational speeds. The one or more ejector inlets may be translatable and/or rotatable with optionally adjustable suction pressure. The ejector inlets operate after a liquid coating material is dispensed to avoid deposition of suspended organic compounds after a coating is formed.Type: ApplicationFiled: February 12, 2014Publication date: August 13, 2015Inventors: Ching-Hai Yang, Yao-Hwan Kao, Shang-Sheng Li, Kuo-Pin Chen, Hsiang-Kai Tseng, Chuan-Wei Chen
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Publication number: 20150194325Abstract: Embodiments of a semiconductor processing apparatus are provided. The semiconductor processing apparatus includes a housing and a support base disposed in the housing. The semiconductor processing apparatus also includes a carrying arm movably disposed on the support base and a nozzle device disposed on the carrying arm. The semiconductor processing apparatus further includes a wafer plate disposed on the support base. When a cleaning process is performed, the carrying arm is moved toward the wafer plate, and the nozzle device emits a first gas toward the support base and the wafer plate.Type: ApplicationFiled: January 6, 2014Publication date: July 9, 2015Applicant: Taiwan Semiconductor Manufacturing Co., LtdInventors: Ching-Hai YANG, Yao-Hwan KAO, Shang-Sheng LI, Yung-Chang LU, Jian-Yuan LAI, Kai-Yuan CHENG
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Patent number: 8873020Abstract: The present disclosure provides an apparatus for fabricating a semiconductor device. The apparatus includes a lithography tool. The lithography tool includes: a first nozzle configured to dispense a developer solution to a wafer; a second nozzle configured to dispense a cleaning solution to the first nozzle; and a controller configured to operate the second nozzle according to a predefined program. The present disclosure also provides a method of fabricating a semiconductor device. The method includes performing a developing process, wherein the performing the developing process includes dispensing a developer solution on a wafer using a first nozzle. The method also includes cleaning the first nozzle with a second nozzle, wherein the cleaning the first nozzle is executed according to one of a plurality of program recipes that each specify a sequence and a duration for which the first nozzle and the second nozzle are to be selectively activated.Type: GrantFiled: August 24, 2011Date of Patent: October 28, 2014Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ching-Hai Yang, Shang-Sheng Li
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Publication number: 20130052591Abstract: The present disclosure provides an apparatus for fabricating a semiconductor device. The apparatus includes a lithography tool. The lithography tool includes: a first nozzle configured to dispense a developer solution to a wafer; a second nozzle configured to dispense a cleaning solution to the first nozzle; and a controller configured to operate the second nozzle according to a predefined program. The present disclosure also provides a method of fabricating a semiconductor device. The method includes performing a developing process, wherein the performing the developing process includes dispensing a developer solution on a wafer using a first nozzle. The method also includes cleaning the first nozzle with a second nozzle, wherein the cleaning the first nozzle is executed according to one of a plurality of program recipes that each specify a sequence and a duration for which the first nozzle and the second nozzle are to be selectively activated.Type: ApplicationFiled: August 24, 2011Publication date: February 28, 2013Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ching-Hai Yang, Shang-Sheng Li