Patents by Inventor Shang-Wei Tang

Shang-Wei Tang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Phosphorus containing novalac phenol resins, methods for manufacturing the same, and formulae containing the same
    Patent number: 8399576
    Abstract: Disclosed is a phosphorous containing phenol novolac resin, having a structure as below: In the above formula, Z is selected from — or —CH2—. Each Y is independently selected from —, —CH2—, —C(CH3)2—, —S—, —SO2—, —O—, —CO—, or —N?N—. Each X is independently selected from a hydrogen or phosphorous containing group, wherein the hydrogen and phosphorous containing group have a molar ratio of 1:0.1 to 0.1:1. Each R1 is independently selected from a hydrogen or C1-5 alkyl group. Each R2 is independently selected from a C1-5 alkyl group. m is an integer of 1 to 10, and n is 0 or 1.
    Type: Grant
    Filed: February 4, 2011
    Date of Patent: March 19, 2013
    Assignee: Grand Tek Advance Material Science Co., Ltd.
    Inventors: Shang-Wei Tang, Hsueh-Tso Lin, Kuan-Ching Chen, Dick Zhong
  • Organic silicon phosphate and fabrication method thereof
    Patent number: 8247589
    Abstract: The invention provides an organic silicon phosphate and fabrication method thereof. The organic silicon phosphate has formula (I): wherein R1 and R2 are the same or different and represent C1-C5 alkyl; R3 and R4 are the same or different and represent hydrogen, C1-C5 alkyl; R5 is aryl or C1-C5 alkyl; Y is a linking bond containing —CH2—, —C(CH3)2—, —S—, —SO2—, —O—, —CO—, or —N?N—; m is an integer from 0 to 4; n is 0 or 1 and k is an integer from 0 to 9.
    Type: Grant
    Filed: May 10, 2010
    Date of Patent: August 21, 2012
    Assignee: Grand Tek Advance Material Science Co., Ltd.
    Inventors: Shang-Wei Tang, Hsueh-Tso Lin, Kuan-Ching Chen, Dick Zhong
  • PHOSPHORUS CONTAINING NOVALAC PHENOL RESINS, METHODS FOR MANUFACTURING THE SAME, AND FORMULAE CONTAINING THE SAME
    Publication number: 20120172546
    Abstract: Disclosed is a phosphorous containing phenol novolac resin, having a structure as below: In the above formula, Z is selected from — or —CH2—. Each Y is independently selected from—, —CH2—, —C(CH3)2—, —S—, —SO2—, —O—,—CO—, or —N?N—. Each X is independently selected from a hydrogen or phosphorous containing group, wherein the hydrogen and phosphorous containing group have a molar ratio of 1:0.1 to 0.1:1. Each R1 is independently selected from a hydrogen or C1-5 alkyl group. Each R2 is independently selected from a C1-5 alkyl group. m is an integer of 1 to 10, and n is 0 or 1.
    Type: Application
    Filed: February 4, 2011
    Publication date: July 5, 2012
    Inventors: Shang-Wei Tang, Hsueh-Tso Lin, Kuan-Ching Chen, Dick Zhong
  • ORGANIC SILICON PHOSPHATE AND FABRICATION METHOD THEREOF
    Publication number: 20110160475
    Abstract: The invention provides an organic silicon phosphate and fabrication method thereof. The organic silicon phosphate has formula (I): wherein R1 and R2 are the same or different and represent C1-C5 alkyl; R3 and R4 are the same or different and represent hydrogen, C1-C5 alkyl; R5 is aryl or C1-C5 alkyl; Y is a linking bond containing —CH2—, —C(CH3)2—, —S—, —SO2—, —O—, —CO—, or —N?N—; m is an integer from 0 to 4; n is 0 or 1 and k is an integer from 0 to 9.
    Type: Application
    Filed: May 10, 2010
    Publication date: June 30, 2011
    Inventors: Shang-Wei Tang, Hsueh-Tso Lin, Kuan-Ching Chen, Dick Zhong