Patents by Inventor Shantikumar V. Nair

Shantikumar V. Nair has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • COMPOSITIONS AND METHODS FOR AUTOIMMUNE DISEASE TREATMENT
    Publication number: 20200246441
    Abstract: The present invention relates to compositions and methods for the treatment or prevention of autoimmune diseases such as demyelination disorders. The invention includes a composition comprising a peptide antigen comprising at least one beta (?) amino acid coupled to a carrier nano or microparticle of silica. In one embodiment the demyelination disorder is multiple sclerosis.
    Type: Application
    Filed: August 21, 2017
    Publication date: August 6, 2020
    Inventors: MANZOOR KOYAKUTTY, CLAUDE C.A. BERNARD, KRISHNAKUMAR N MENON, PRASHANT SADANANDAN, NATALIE L PAYNE, SHANTIKUMAR V NAIR
  • Bond layer for silicon containing substrate
    Patent number: 7056574
    Abstract: A bond layer and a further layer on the bond layer, the bond layer comprising a silicon layer having a dispersion of fibers, wherein at least some of the fibers extend between the bond layer and the further layer. The fibers are formed from a material selected from the group consisting of (1) alumina, (2) yttria, (3) aluminum silicate, (4) silicon carbide, (5) silicon nitride, (6) compounds of rare earth elements, alkaline earth elements, aluminum, silicon, oxygen, yttrium, nitrogen, niobium, tantalum, hafnium, zirconium, carbon and mixtures of (1) thru (6).
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: June 6, 2006
    Assignee: United Technologies Corporation
    Inventors: Greg C. Ojard, Harry E. Eaton, Shantikumar V. Nair, Yasser A. Gowayed
  • Environmental barrier coating for silicon based substrates such as silicon nitride
    Patent number: 6902836
    Abstract: A bond layer for a silicon based substrate comprises a mixture of a first phase and a second phase, wherein the first phase is selected from the group consisting of refractory metal oxides, refractory metal silicates and mixtures thereof and the second phase is selected from the group consisting of refractory metal oxide forming metals, SiC, Si3N4, and mixtures thereof.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: June 7, 2005
    Assignee: United Technologies Corporation
    Inventors: Harry E. Eaton, Shantikumar V. Nair, Ellen Y. Sun, Tania Bhatia
  • ENVIRONMENTAL BARRIER COATING FOR SILICON BASED SUBSTRATES SUCH AS SILICON NITRIDE
    Publication number: 20040234783
    Abstract: A bond layer for a silicon based substrate comprises a mixture of a first phase and a second phase, wherein the first phase is selected from the group consisting of refractory metal oxides, refractory metal silicates and mixtures thereof and the second phase is selected from the group consisting of refractory metal oxide forming metals, SiC, Si3N4, and mixtures thereof.
    Type: Application
    Filed: May 22, 2003
    Publication date: November 25, 2004
    Inventors: Harry E. Eaton, Shantikumar V. Nair, Ellen Y. Sun, Tania Bhatia
  • BOND LAYER FOR SILICON CONTAINING SUBSTRATE
    Publication number: 20040234740
    Abstract: A bond layer and a further layer on the bond layer, the bond layer comprising a silicon layer having a dispersion of fibers, wherein at least some of the fibers extend between the bond layer and the further layer. The fibers are formed from a material selected from the group consisting of (1) alumina, (2) yttria, (3) aluminum silicate, (4) silicon carbide, (5) silicon nitride, (6) compounds of rare earth elements, alkaline earth elements, aluminum, silicon, oxygen, yttrium, nitrogen, niobium, tantalum, hafnium, zirconium, carbon and mixtures of (1) thru (6).
    Type: Application
    Filed: May 22, 2003
    Publication date: November 25, 2004
    Inventors: Greg C. Ojard, Harry E. Eaton, Shantikumar V. Nair, Yasser A. Gowayed
  • Bond layer for silicon containing substrate
    Patent number: 6777093
    Abstract: A bond layer for a silicon based substrate comprises a silicon layer having a dispersion of particulate material therein, wherein the particulate material is selected from the group consisting of (1) alumina, (2) yttria, (3) aluminum silicate, (4) compounds of rare earth elements, alkaline earth elements, aluminum, oxygen, yttrium, nitrogen, niobium, tantalum, hafnium, zirconium, carbon, silicon and mixtures thereof.
    Type: Grant
    Filed: May 22, 2003
    Date of Patent: August 17, 2004
    Assignee: United Technologies Corporation
    Inventors: Greg C. Ojard, Harry E. Eaton, Shantikumar V. Nair