Abstract: A preparation method for silver nanowires, including: dissolving a dispersant in a tribasic alcohol to get a viscous clear solution, dissolving the silver nitrate in a tribasic alcohol to get a clear solution; then, adding the silver nitrate solution to the dispersant solution for uniform mixing, finally, transferring the mixed solution into a reaction kettle, putting into an oven with a set temperature (170˜200° C.), and ending the reaction after a period of time. The mother solution of silver nanowires is diluted with alcohol and then centrifuged to separate organics, the novel silver nanowires with a uniform aspect ratio and nodes are obtained.

Abstract: A preparation method for silver nanowires, including: dissolving a dispersant in a tribasic alcohol to get a viscous clear solution, dissolving the silver nitrate in a tribasic alcohol to get a clear solution; then, adding the silver nitrate solution to the dispersant solution for uniform mixing, finally, transferring the mixed solution into a reaction kettle, putting into an oven with a set temperature (170˜200° C.), and ending the reaction after a period of time. The mother solution of silver nanowires is diluted with alcohol and then centrifuged to separate organics, the novel silver nanowires with a uniform aspect ratio and nodes are obtained.

Abstract: A preparation method for silver nanowires with a uniform aspect ratio, including: dissolving at a certain temperature silver nitrate in glycerol to get a solution A; dissolving at a certain temperature polyvinylpyrrolidone (PVP) in glycerol to get a solution B; mixing uniformly the solution A and the solution B to form a solution C; then, adding a certain amount of a medium into the solution C and mixing uniformly to form a solution D, finally, transferring the solution D into a reaction kettle, putting the reaction kettle into an oven with a set temperature, and ending the reaction after a certain time of reaction. The reactants are centrifuged twice to obtain precipitated silver nanowires.

Abstract: A variable near-null compensator for measuring aspheric surfaces by subaperture stitching includes a pair of counter-rotating CGH phase plates, each of the phase plates having a phase function including two terms Z5 and Z7 of Zernike polynomials. The phase plates are mounted on a pair of precision rotary center-through tables, wherein rotational axes of the pair of precision rotary center-through tables coincide with the optical axes of the phase plates. A figure metrology apparatus includes a wavefront interferometer, the test mirror mount, the near-null compensator and the mechanical adjustment components therefor. The optical axis of the near-null compensator coincides with the optical axis of the interferometer. A method for measuring aspheric surfaces by subaperture stitching includes the steps of mounting the test mirror, measuring the subapertures with the figure metrology apparatus, and finally processing the data by stitching.

Abstract: A variable near-null compensator for measuring aspheric surfaces by subaperture stitching includes a pair of counter-rotating CGH phase plates, each of the phase plates having a phase function including two terms Z5 and Z7 of Zernike polynomials. The phase plates are mounted on a pair of precision rotary center-through tables, wherein rotational axes of the pair of precision rotary center-through tables coincide with the optical axes of the phase plates. A figure metrology apparatus includes a wavefront interferometer, the test mirror mount, the near-null compensator and the mechanical adjustment components therefor. The optical axis of the near-null compensator coincides with the optical axis of the interferometer. A method for measuring aspheric surfaces by subaperture stitching includes the steps of mounting the test mirror, measuring the subapertures with the figure metrology apparatus, and finally processing the data by stitching.