Patents by Inventor Sheng-Chun Yang

Sheng-Chun Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220020573
    Abstract: A radio frequency (RF) screen for a microwave powered ultraviolet (UV) lamp system is disclosed. In one example, a disclosed RF screen includes: a sheet comprising a conductive material; and a frame around edges of the sheet. The conductive material defines a predetermined mesh pattern of individual openings across substantially an operative area of the screen. Each of the individual openings has a triangular shape.
    Type: Application
    Filed: July 15, 2020
    Publication date: January 20, 2022
    Inventors: Sheng-chun YANG, Po-Wei LIANG, Chao-Hung WAN, Yi-Ming LIN, Liu Che KANG
  • Patent number: 11183404
    Abstract: A diffuser for diffusing a gas includes a base portion and a head portion fluidly coupled to the base portion. The head portion includes a diffuser element configured to diffuse a first fraction of the gas through a circumference of the diffuser element and a second fraction of the gas through an end surface of the diffuser element. The head portion further includes a connecting structure having a first connecting portion configured to receive a portion of the diffuser element therein and a second connecting portion protruding outwardly from the first connecting portion and configured to couple to the base portion.
    Type: Grant
    Filed: April 26, 2019
    Date of Patent: November 23, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Sheng-chun Yang, Yi-Ming Lin, Chao-Hung Wan
  • Publication number: 20210265142
    Abstract: A method for processing semiconductor wafer is provided. The method includes loading a semiconductor wafer on a top surface of a wafer chuck. The method also includes supplying a gaseous material between the semiconductor wafer and the top surface of the wafer chuck through a first gas inlet port and a second gas inlet port located underneath a fan-shaped sector of the top surface. The method further includes supplying a fluid medium to a fluid inlet port of the wafer chuck and guiding the fluid medium from the fluid inlet port to flow through a number of arc-shaped channels located underneath the fan-shaped sector of the top surface. In addition, the method includes supplying a plasma gas over the semiconductor wafer.
    Type: Application
    Filed: February 25, 2020
    Publication date: August 26, 2021
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Sheng-Chun YANG, Yi-Ming LIN, Po-Wei LIANG, Chu-Han HSIEH, Chih-Lung CHENG, Po-Chih HUANG
  • Publication number: 20210079524
    Abstract: Pumping liners for use in an apparatus for depositing a material on a work piece by chemical vapor deposition includes a plurality of unevenly spaced apertures are disclosed. Uneven spacing of the plurality of apertures produces a uniform flow of processing gases within a processing chamber with which the pumping liner is associated. Films of materials deposited onto a work piece by chemical vapor deposition techniques using disclosed pumping liners exhibit desirable properties such as uniform thickness and smooth and uniform surfaces.
    Type: Application
    Filed: September 13, 2019
    Publication date: March 18, 2021
    Inventors: Sheng-chun YANG, Yi-Ming LIN, Chih-tsung LEE, Yun-Tzu CHIU, Chao-Hung WAN
  • Publication number: 20210066096
    Abstract: An apparatus for fabricating a semiconductor device has a housing defining a buffer chamber, a plurality of reactor ports formed in the housing for establishing interfaces with a plurality of process chambers that are to receive a wafer during a fabrication process to fabricate the semiconductor device, a wafer positioning robot positioned within the buffer chamber to transport the wafer between the plurality of process chambers through the plurality of reactor ports, a purge port formed in the housing for introducing a purge gas into the buffer chamber, a pump port formed in the housing for exhausting a portion of the purge gas from the buffer chamber, and a first flow enhancer that directs the purge gas flowing in an axial direction along a longitudinal axis of the purge port into the buffer chamber in a plurality of radial directions relative to the longitudinal axis.
    Type: Application
    Filed: August 26, 2020
    Publication date: March 4, 2021
    Inventors: Chih-Tsung LEE, Sheng-Chun YANG, Yun-Tzu CHIU, Chao-Hung WAN, Yi-Ming LIN, Chyi-Tsong NI
  • Patent number: 10879099
    Abstract: A humidity-controlled storage device includes a plurality of panels configured to form an enclosed volume. A first panel of the plurality of panels includes inlet and outlet ports. The storage device further includes a purge system with a gas inlet pipe, a gas supply system, and a gas extraction system. The gas inlet pipe includes a nozzle and a cylindrical portion coupled to the inlet port. The gas supply system is configured to supply a purge gas to the gas inlet pipe. The gas inlet pipe is configured to output the purge gas into the enclosed volume in a direction that creates a circular or an oval gas flow pattern within the enclosed volume. The gas extraction system is coupled to the outlet port and is configured to extract the purge gas from the enclosed volume.
    Type: Grant
    Filed: January 2, 2019
    Date of Patent: December 29, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Sheng-Chun Yang, Yi-Ming Lin, Chao-Hung Wan, Hsiu Hao Hsu, Guan Jung Chen, Po-Wei Liang
  • Publication number: 20200135513
    Abstract: A diffuser for diffusing a gas includes a base portion and a head portion fluidly coupled to the base portion. The head portion includes a diffuser element configured to diffuse a first fraction of the gas through a circumference of the diffuser element and a second fraction of the gas through an end surface of the diffuser element. The head portion further includes a connecting structure having a first connecting portion configured to receive a portion of the diffuser element therein and a second connecting portion protruding outwardly from the first connecting portion and configured to couple to the base portion.
    Type: Application
    Filed: April 26, 2019
    Publication date: April 30, 2020
    Inventors: Sheng-chun YANG, Yi-Ming LIN, Chao-Hung WAN
  • Publication number: 20200058532
    Abstract: A humidity-controlled storage device includes a plurality of panels configured to form an enclosed volume. A first panel of the plurality of panels includes inlet and outlet ports. The storage device further includes a purge system with a gas inlet pipe, a gas supply system, and a gas extraction system. The gas inlet pipe includes a nozzle and a cylindrical portion coupled to the inlet port. The gas supply system is configured to supply a purge gas to the gas inlet pipe. The gas inlet pipe is configured to output the purge gas into the enclosed volume in a direction that creates a circular or an oval gas flow pattern within the enclosed volume. The gas extraction system is coupled to the outlet port and is configured to extract the purge gas from the enclosed volume.
    Type: Application
    Filed: January 2, 2019
    Publication date: February 20, 2020
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Sheng-Chun YANG, Yi-Ming LIN, Chao-Hung WAN, Hsiu Hao HSU, Guan Jung CHEN, Po-Wei LIANG
  • Publication number: 20190136373
    Abstract: A chemical vapor deposition (CVD) apparatus is provided. The CVD apparatus includes a CVD chamber including multiple wall portions. A pedestal is disposed inside the CVD chamber, configured to support a substrate. A gas inlet port is disposed on one of the wall portions and below a substrate support portion of the pedestal. In addition, a gas flow guiding member is disposed inside the CVD chamber, coupled to the gas inlet port, and configured to dispense cleaning gases from the gas inlet port into the CVD chamber.
    Type: Application
    Filed: June 28, 2018
    Publication date: May 9, 2019
    Inventors: Chih-Hung YEH, Tsung-Lin LEE, Yi-Ming LIN, Sheng-Chun YANG, Tung-Ching TSENG
  • Patent number: 6470720
    Abstract: A steering wheel lock includes two shells, a male coupling member and a female coupling member respectively fixedly provided at the shells and coupled to each other for enabling the shells to be moved relatively to each other and closely attached to the top side of the steering wheel, and two locking units respectively disposed inside the shells and controlled to lock the shells, each locking unit including a lock body fixedly provided inside one shell, and a shackle inserted through two through holes on a peripheral stop flange of the corresponding shell into respective shackle holes of the respective lock body over the bottom side of the steering wheel and locked by spring latches of the respective lock body.
    Type: Grant
    Filed: October 31, 2001
    Date of Patent: October 29, 2002
    Inventors: Cheng-Feng Yang, Mu-Kuei Yang, Sheng-Chun Yang