Abstract: Embodiments of the disclosure generally relate to comprehensive, expandable substrate inspection systems. The inspection systems include multiple metrology units adapted to inspect, detect, or measure one or more characteristics of a substrate, including thickness, resistivity, saw marks, geometry, stains, chips, micro cracks, crystal fraction, and photoluminescence. The inspection systems may be utilized to identify defects on substrates and estimate solar cell efficiency of a solar cell produced with the substrate, prior to processing a substrate into a solar cell. Substrates may be transferred through the inspection system between metrology units on a track or conveyor, and then sorted based upon inspection data.

Abstract: Embodiments of the disclosure generally relate to comprehensive, expandable substrate inspection systems. The inspection systems include multiple metrology units adapted to inspect, detect, or measure one or more characteristics of a substrate, including thickness, resistivity, saw marks, geometry, stains, chips, micro cracks, crystal fraction, and photoluminescence. The inspection systems may be utilized to identify defects on substrates and estimate solar cell efficiency of a solar cell produced with the substrate, prior to processing a substrate into a solar cell. Substrates may be transferred through the inspection system between metrology units on a track or conveyor, and then sorted based upon inspection data.

Abstract: An interior antenna is provided for coupling RF energy to a plasma in a process chamber having a wall. The antenna comprises a coil having a face exposed to the plasma in the process chamber. A plurality of standoffs are provided to support the coil at a spacing from the wall of the process chamber. At least one standoff comprises a terminal thorough which an electrical power can be applied to the coil, the terminal comprising a conductor receptacle. A conductor cup is around the standoff having the terminal. The conductor cup comprises a sidewall having an inner diameter that is sufficiently large to maintain a sidewall gap between the sidewall and the terminal.

Abstract: An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.

Abstract: An antenna for coupling RF energy to a plasma in a process chamber having a wall comprises a coil having a face exposed to the plasma in the chamber. A plurality of standoffs support the coil at a set spacing from the wall of the process chamber, at least one standoff comprising a terminal thorough which electrical power is applied to the coil from an external power source. The terminal comprises a conductor receptacle having a first length L1 and a jacket around the conductor receptacle, the jacket having a second length L2. The length L1 is larger than the length L2. A conductor cup is provided about the standoff having the terminal.