Patents by Inventor Shi-Jay Lin

Shi-Jay Lin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Semiconductor wafer imaging mask having uniform pattern features and method of making same
    Patent number: 6566017
    Abstract: A mask used to image circuit patterns onto a semiconductor wafer exhibits improved uniformity of critical feature dimensions. A pattern of dummy features is formed around the outer periphery of the main pattern field during manufacture of the mask. The presence of the dummy field eliminates loading of the etch rate at the marginal areas of the main pattern field, thereby assuring that all of the features in the main pattern field are etched at substantially the same rate. The dummy field pattern is covered by an opaque layer of material after etching of the mask in order to prevent the dummy features from being imaged onto the wafer.
    Type: Grant
    Filed: August 14, 2000
    Date of Patent: May 20, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Jeng-Horng Chen, Shi-Jay Lin