Patents by Inventor Shigeaki Yonemori

Shigeaki Yonemori has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11072534
    Abstract: Industrial-scale production of diiodosilane through reaction between phenylsilane and iodine is safely and efficiently performed. Provided is a diiodosilane producing method wherein reaction is started between phenylsilane and iodine at a low temperature, the method including at least the step of, after dropping and mixing step finishes, pumping a reaction solution little by little continuously while raising a temperature thereof.
    Type: Grant
    Filed: July 17, 2019
    Date of Patent: July 27, 2021
    Assignee: YAMANAKA HUTECH CORPORATION
    Inventors: Naoto Kimura, Yasushi Yamamoto, Shigeaki Yonemori
  • Publication number: 20200123016
    Abstract: Industrial-scale production of diiodosilane through reaction between phenylsilane and iodine is safely and efficiently performed. Provided is a diiodosilane producing method wherein reaction is started between phenylsilane and iodine at a low temperature, the method including at least the step of, after dropping and mixing step finishes, pumping a reaction solution little by little continuously while raising a temperature thereof.
    Type: Application
    Filed: July 17, 2019
    Publication date: April 23, 2020
    Applicant: YAMANAKA HUTECH CORPORATION
    Inventors: Naoto KIMURA, Yasushi YAMAMOTO, Shigeaki YONEMORI
  • Publication number: 20120059137
    Abstract: Provided is a monodisperse polymer of chloromethylstyrene as a bifunctional compound. Chloromethylstyrene is purified to a purity of at least 99% and polymerized preferably using a RAFT reagent.
    Type: Application
    Filed: May 10, 2010
    Publication date: March 8, 2012
    Applicant: AGC SEIMI CHEMICAL CO., LTD.
    Inventors: Riina Kambara, Hideharu Mori, Takeshi Endo, Shigeaki Yonemori
  • Publication number: 20060270209
    Abstract: To provide a process for producing a transparent electrode comprising a tin oxide film which can readily be patterned, which can be realized at a low cost, and which has low resistivity and is excellent in transparency. A process for producing a transparent electrode having a patterned tin oxide film formed on a substrate, which comprises a step of forming a tin oxide film having light absorption characteristics on a substrate, a patterning step of removing part of the tin oxide film having light absorption characteristics, and a step of subjecting the patterned tin oxide film having light absorption characteristics to heat treatment to obtain a tin oxide film.
    Type: Application
    Filed: August 9, 2006
    Publication date: November 30, 2006
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Akira Mitsui, Hidefumi Odaka, Shigeaki Yonemori, Yasuhiko Akao
  • Patent number: 7025796
    Abstract: A method for evaluating the quality of abrasive grains for polishing glass, which comprises adding abrasive grains to be measured, to an aqueous medium having silica dissolved therein, to have the silica adsorbed on the abrasive grains under such a condition that the silica undergoes substantially no polymerization in the aqueous medium, followed by solid-liquid separation to separate the abrasive grains from the mother liquor, and measuring the concentration of silica remaining in the mother liquor to measure the adsorption rate (?) of silica on the abrasive grains.
    Type: Grant
    Filed: November 21, 2003
    Date of Patent: April 11, 2006
    Assignee: Seimi Chemical Co., Ltd.
    Inventors: Hirotsugu Komiya, Sumihisa Yamaguchi, Tetsufumi Hisatsune, Atsuyoshi Takenaka, Shigeaki Yonemori
  • Publication number: 20040139764
    Abstract: A method for evaluating the quality of abrasive grains for polishing glass, which comprises adding abrasive grains to be measured, to an aqueous medium having silica dissolved therein, to have the silica adsorbed on the abrasive grains under such a condition that the silica undergoes substantially no polymerization in the aqueous medium, followed by solid-liquid separation to separate the abrasive grains from the mother liquor, and measuring the concentration of silica remaining in the mother liquor to measure the adsorption rate (&eegr;) of silica on the abrasive grains.
    Type: Application
    Filed: November 21, 2003
    Publication date: July 22, 2004
    Applicant: Seimi Chemical Co., Ltd.
    Inventors: Hirotsugu Komiya, Sumihisa Yamaguchi, Tetsufumi Hisatsune, Atsuyoshi Takenaka, Shigeaki Yonemori
  • Publication number: 20030162029
    Abstract: A tetrafluoroethylene-ethylene copolymer (ETFE) film, wherein polar groups are present on the surface of the film after a surface treatment, and the surface roughness Ra is at most the surface roughness Ra of the surface of an untreated film; an ETFE film, wherein polar groups are present on the surface of the film after a surface treatment, and the amount of a weak boundary layer is at most one time of the amount of a weak boundary layer on the surface of an untreated film; a laminate employing such a film having an extremely excellent bonding strength; and a process for producing it with a mass production property.
    Type: Application
    Filed: December 6, 2002
    Publication date: August 28, 2003
    Applicant: ASAHI GLASS COMPANY, LTD.
    Inventors: Satoshi Oki, Atsushi Hayashi, Makoto Fukawa, Hiroshi Aruga, Yasuo Hayashi, Shigeaki Yonemori, Yukio Jitsugiri
  • Patent number: 6534182
    Abstract: A tetrafluoroethylene-ethylene copolymer (ETFE) film, wherein polar groups are present on the surface of the film after a surface treatment, and the surface roughness Ra is at most the surface roughness Ra of the surface of an untreated film; an ETFE film, wherein polar groups are present on the surface of the film after a surface treatment, and the amount of a weak boundary layer is at most one time of the amount of a weak boundary layer on the surface of an untreated film; a laminate employing such a film having an extremely excellent bonding strength; and a process for producing it with a mass production property.
    Type: Grant
    Filed: September 27, 1999
    Date of Patent: March 18, 2003
    Assignee: Asahi Glass Company Ltd.
    Inventors: Satoshi Oki, Atsushi Hayashi, Makoto Fukawa, Hiroshi Aruga, Yasuo Hayashi, Shigeaki Yonemori, Yukio Jitsugiri
  • Patent number: 4390511
    Abstract: SF.sub.6 is produced by a pyrolysis of SF.sub.5 Cl obtained by a reaction of sulfur or sulfur chloride with chlorine and an amine/hydrogen fluoride complex or a reaction of sulfur tetrafluoride with chlorine and an amine/hydrogen fluoride complex.
    Type: Grant
    Filed: July 27, 1981
    Date of Patent: June 28, 1983
    Assignee: Asahi Glass Company Ltd.
    Inventors: Yoshio Oda, Shinsuke Morikawa, Masaaki Ikemura, Tomio Yarita, Makoto Noshiro, Isao Gotoh, Yukio Jitsugiri, Shigeaki Yonemori, Kimihiko Sato, Keiichi Uchida