Abstract: The instant application describes a display device that includes a substrate; a gate electrode provided on the substrate; a gate insulating film provided on the gate electrode; a semiconductor layer provided on the gate insulating film; a source electrode and a drain electrode provided on the semiconductor layer; a protective insulating film provided on the source electrode and the drain electrode; a pixel electrode provided on the protective insulating film, and connected to one of the source electrode and the drain electrode through a contact hole formed through the protective insulating film; and a shield provided on the protective insulating film, the shield not being electrically connected to the pixel electrode.

Abstract: A manufacturing method for a liquid crystal display device according to this application is a manufacturing method for a liquid crystal display device having a transparent substrate (2), a TFT (5) formed on the transparent substrate (2), a lower insulating film (4) covering the TFT (5), an organic insulating film (6) covering the lower insulating film (4), a common electrode (7) formed on the organic insulating film (6), an upper insulating film (8) covering the common electrode (7), and a pixel electrode (9) formed on the upper insulating film (8). Annealing process is performed after formation of the organic insulating film (6) before formation of the upper insulating film (8).

Abstract: According to a manufacturing method for a liquid crystal display device according to this application, a first terminal hole (3b) for exposure of a part of a gate line (52) is formed in a gate insulating film (3); a pixel hole (8a) for exposure of a part of a drain electrode (57) and a second terminal hole (8b) overlapping the first terminal hole (3b) in a plan view for exposure of a part of the gate line (52) are formed in a lower insulating film (4) and an upper insulating film (8); and a pixel electrode (9) connected to the drain electrode (57) via the pixel hole (8a) and a terminal (92) connected to the gate line (52) via the second terminal hole (8b) are formed.

Abstract: The instant application describes a display device that includes a substrate; a gate electrode provided on the substrate; a gate insulating film provided on the gate electrode; a semiconductor layer provided on the gate insulating film; a source electrode and a drain electrode provided on the semiconductor layer; a protective insulating film provided on the source electrode and the drain electrode; a pixel electrode provided on the protective insulating film, and connected to one of the source electrode and the drain electrode through a contact hole formed through the protective insulating film; and a shield provided on the protective insulating film, the shield not being electrically connected to the pixel electrode.

Abstract: A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.

Abstract: A mask including a transparent substrate, a non-transmitting layer, a first transmitting layer and a second transmitting layer is provided. The transparent substrate has a first region, a second region, and a third region. The non-transmitting layer is disposed in the first region of the transparent substrate. The first transmitting layer is disposed in the second region and the third region of the transparent substrate. The second transmitting layer is disposed on the first transmitting layer in the third region.

Abstract: The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.

Abstract: The invention provides a novel technology where a TFT array substrate for a display device is formed with three photomasks. The invention is achieved by using the novel technology in combination with a well-known four-masks process. For the novel technology, during the lithography process where a photosensitive acrylic resin film is used to make contacts, taper patterns required for general through holes are formed simultaneously with a fine pattern formed in a light shielding area that is tapered more approximately to vertical, using a photomask with phase-shift effect. Thus the pixel electrode pattern can be separated without using lithography process in subsequent processes.