Abstract: This invention relates to a cleaning apparatus for cleaning workpieces such as semiconductors and other electronic devices by using chloro-fluoro-carbon solvent such as R113. Chloro-fluoro-carbon vapor is drawn from a lateral position of a layer of chloro-fluoro-carbon vapor through a suction duct and is cooled and liquefied in a collecting tank. The resulting liquid is returned to a cleaning tank through a return duct. This feature allows the gas generated from the chloro-fluoro-carbon vapor to be collected for repeated use, reduces the amount of chloro-fluoro-carbon solvent consumption, and prevents air pollution by the chloro-flouoro-carbon gas. Further, the entire apparatus may readily be constructed as a unit, thus at low manufacturing cost.