Patents by Inventor Shigeru Kido

Shigeru Kido has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070251817
    Abstract: A suction pad used for use in a substrate treatment apparatus which treats a substrate by immersing the substrate in a solution while the pad attaches to the substrate, including: a main face for attaching to the substrate; an outer face disposed along the outer periphery of the substrate; and a suction opening formed in the main face. In a cross-sectional shape including the main face and the outer face, the angle formed between a line corresponding to the main face and a line corresponding to the outer face is an acute angle.
    Type: Application
    Filed: March 30, 2007
    Publication date: November 1, 2007
    Applicant: CANON KABUSHIKI KAISHA
    Inventor: Shigeru Kido
  • Publication number: 20060289313
    Abstract: A reactive oxygen species measuring device according to the present invention comprises a reactive oxygen species sensor provided with an electrode assembly capable of detecting the presence of reactive oxygen species or the like in terms of an electric current, a power source means for applying a measuring voltage to the reactive oxygen species sensor, and a reactive oxygen species concentration measuring means for measuring a concentration of the reactive oxygen species or the like from the current detected by the reactive oxygen species sensor. According to the present invention, a concentration of reactive oxygen species or the like such as in vivo or in vitro superoxide anion radical (O2?.) can be measured reliably, and the entire device can be formed in a smaller size and always mounted to a living body.
    Type: Application
    Filed: February 24, 2004
    Publication date: December 28, 2006
    Inventors: Makoto Yuasa, Fumio Mizoguchi, Hitoshi Takebayashi, Masahiko Abe, Masumi Koishi, Shigeru Kido, Masamitsu Nagahama, Masayuki Kawasaki, Masahiko Yokosuka, Takashi Ishihara, Rizwangul Ibrahim
  • Publication number: 20060231124
    Abstract: Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W?1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W?1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W?1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.
    Type: Application
    Filed: May 15, 2006
    Publication date: October 19, 2006
    Applicants: Chemical Art Technology Inc., Cannon Kabushiki Kaisha
    Inventors: Hiroshi Watanabe, Tamotsu Mezaki, Shigeru Kido, Kiyofumi Sakaguchi
  • Publication number: 20060049487
    Abstract: A semiconductor device manufacturing method is disclosed. A semiconductor substrate having a separation region and a semiconductor region which covers the separation region entirely is prepared. One or a plurality of circuit elements are formed in the semiconductor region. The semiconductor substrate is split at the separation region.
    Type: Application
    Filed: September 8, 2005
    Publication date: March 9, 2006
    Inventors: Nobuhiko Sato, Shigeru Kido, Kazutaka Momoi
  • Publication number: 20050077192
    Abstract: An electrode for active oxygen species comprising a conductive component with a polymer membrane of a metal porphyrin complex formed on the surface is disclosed. The electrode for active oxygen species can detect active oxygen species such as superoxide anion radicals, hydrogen peroxide, and .OH and other active radical species (NO, ONOO—, etc.) in any environment including in vivo environment as well as in vitro environment. The electrode thus can be used for specifying various diseases and examining active oxygen species in food or in water such as tap water and sewage water.
    Type: Application
    Filed: December 19, 2002
    Publication date: April 14, 2005
    Applicant: makoto yuasa
    Inventors: Makoto Yuasa, Masahiko Abe, Aritomo Yamaguchi, Asako Shiozawa, Masuhide Ishikawa, Katsuya Eguchi, Shigeru Kido
  • Publication number: 20040060574
    Abstract: Provided is a processing method capable of reliably processing the inside of a depression such as a trench, a contact hole, a deep pattern, or a pore of a porous substrate. A chemical solution M is supplied into a processing bath 1 placing a substrate W, and the processing bath 1 is repetitively evacuated and pressurized several times at a pressure lower than the atmospheric pressure. Alcohol X is brought into contact with the surface of the substrate W and supplied into a depression W-1. The chemical solution M is supplied into the processing bath 1 containing the substrate W until the chemical solution M reaches a water level at which the substrate W is dipped, thereby allowing the chemical solution M to enter the depression W-1. The chemical solution M is discharged from the processing bath 1, and a portion of the chemical solution M entering the depression W-1 and mixed with the alcohol X is evaporated by evacuating the processing bath 1. This process is repeated several times.
    Type: Application
    Filed: July 16, 2003
    Publication date: April 1, 2004
    Applicants: CHEMICAL ART TECHNOLOGY INC., CANON KABUSHIKI KAISHA
    Inventors: Hiroshi Watanabe, Tamotsu Mezaki, Shigeru Kido, Kiyofumi Sakaguchi
  • Patent number: 4935241
    Abstract: A pharmaceutical preparation for the treatment of tinea pedis, containing as basic components about 0.1% to about 2.5% of croconazole hydrochloride and about 1%-15% of an ethyl acrylate-methyl methacrylate copolymer in an aqueous alcohol, and if necessary, about 0.1% to about 2.5% of a thickening agent and/or a plasticizer.
    Type: Grant
    Filed: November 3, 1988
    Date of Patent: June 19, 1990
    Assignee: Shionogi & Co., Ltd.
    Inventors: Izumi Saitoh, Kaori Ikeda, Shigeru Kido, Yoshio Doi, Shohei Egawa
  • Patent number: 4923893
    Abstract: External preparations consisting essentially of about 0.1% to about 5% of tocopherol acetate and/or about 0.05% to about 0.3% of glycyrrhetinic acid, about 1% to about 15% of a methacrylic acid-ethyl acrylate copolymer, and about 0.2% to about 3% of a thickening agent in an alcoholic solvent, wherein said copolymer is characterized by that the monomer ratio of ethyl acrylate to methacrylic acid is within a range from 75/25 to 95/5, with residual monomer being 50 ppm or less and with practically no surfactants.
    Type: Grant
    Filed: November 4, 1988
    Date of Patent: May 8, 1990
    Assignee: Shionogi & Co., Ltd.
    Inventors: Izumi Saitoh, Shigeru Kido, Yoshio Doi, Shohei Egawa
  • Patent number: 4914140
    Abstract: An acrylic copolymer of ethyl acrylate and methacrylic acid wherein the weight ratio of ethyl acrylate to methacrylic acid is in a range between 75:25 and 95:5, containing therein a residual monomer content of 50 ppm or less, but substantially no surfactants, and which is useful as agents for protecting the skin and manufactured from the following essential components:a. an acrylic copolymer of ethyl acrylate and methacrylic acid wherein the weight ratio of ethyl acrylate to methacrylic acid is in a range between 75:25 and 95:5, containing therein residual monomers in an amount of 50 ppm or less, but substantially no surfactants--approximately 2 to 10%;b. cellulose derivative--approximately 0.2 to 2%; andc. a necessary amount of an aqueous alcohol to make the whole 100%.
    Type: Grant
    Filed: May 18, 1989
    Date of Patent: April 3, 1990
    Assignees: Shinonogi and Co., Ltd., Nisshin Chemical Co., Ltd.
    Inventors: Izumi Saitoh, Shigeru Kido, Yoshio Sasaki, Syuichiro Shinohara
  • Patent number: 4874830
    Abstract: An acrylic copolymer of ethyl acrylate and methacrylic acid wherein the weight ratio of ethyl acrylate to methacrylic acid is in a range between 75:25 and 95:5, containing therein a residual monomer content of 50 ppm or less, but substantially no surfactants, and which is useful as agents for protecting the skin and manufactured from the following essential components:a. an acrylic copolymer of ethyl acrylate and methacrylic acid wherein the weight ratio of ethyl acrylate to methacrylic acid is in a range between 75:25 and 95:5, containing therein the residual monomers in an amount of 50 ppm or less, but substantially no surfactants . . . approximately 2 to 10%;b. cellulose derivative . . . approximately 0.2 to 2%; andc. a necessary amount of an aqueous alcohol to make the whole 100%.
    Type: Grant
    Filed: October 19, 1987
    Date of Patent: October 17, 1989
    Assignees: Shionogi & Co., Ltd., Nisshin Chemical Co., Ltd.
    Inventors: Izumi Saitoh, Shigeru Kido, Yoshio Sasaki, Syuichiro Shinohara