Patents by Inventor Shigeru Koibuchi
Shigeru Koibuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240150549Abstract: A resin composition, containing: an elastomer; a methacrylic compound; and a thermal polymerization initiator. A cured product of the resin composition. A laminate having: a base material film; and a transparent resin layer disposed on the base material film, in which the transparent resin layer contains the resin composition or the cured product. A transparent antenna 110, having: a transparent base material 110a; and a mesh-shaped conductive member 110b disposed on the transparent base material 110a, in which the transparent base material 110a contains the cured product. An image display device 100 has the transparent antenna 110.Type: ApplicationFiled: February 21, 2022Publication date: May 9, 2024Inventors: Daisuke OTSUKI, Masato MIYATAKE, Shigeru KOIBUCHI, Takeshi NOJIRI
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Publication number: 20240141150Abstract: A resin composition, containing: an elastomer; a (meth)acrylic compound; and a thermal polymerization initiator. A cured product of the resin composition. A laminate having: a base material film; and a transparent resin layer disposed on the base material film, in which the transparent resin layer contains the resin composition or the cured product. A transparent antenna 110, having: a transparent base material 110a; and a mesh-shaped conductive member 110b disposed on the transparent base material 110a, in which the transparent base material 110a contains the cured product. An image display device 100 has the transparent antenna 110.Type: ApplicationFiled: February 21, 2022Publication date: May 2, 2024Inventors: Daisuke OTSUKI, Masato MIYATAKE, Shigeru KOIBUCHI, Takeshi NOJIRI
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Patent number: 8721192Abstract: An optical connecting structure has an optical fiber, a pressing member having a circular outer cross section, and an optical member, wherein the optical member has an optical element, an optical fiber stopper structure, and an optical fiber holding groove, wherein the optical fiber stopper structure is positioned between the optical element and the optical fiber holding groove, wherein the optical fiber is inserted along the optical fiber holding groove so as to contact with the optical fiber stopper structure, and wherein the pressing member is arranged on the optical fiber holding groove mutually perpendicular, the pressing member presses the upper surface of the optical fiber to a direction of a bottom of the optical fiber holding groove, and the optical fiber and the optical element are thereby optically connected.Type: GrantFiled: November 14, 2008Date of Patent: May 13, 2014Assignee: Hitachi Chemical Co., Ltd.Inventors: Nobuo Miyadera, Toshihiro Kuroda, Shigeru Koibuchi, Kyouichi Sasaki
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Publication number: 20100310214Abstract: An optical connecting structure has an optical fiber, a pressing member having a circular outer cross section, and an optical member, wherein the optical member has an optical element, an optical fiber stopper structure, and an optical fiber holding groove, wherein the optical fiber stopper structure is positioned between the optical element and the optical fiber holding groove, wherein the optical fiber is inserted along the optical fiber holding groove so as to contact with the optical fiber stopper structure, and wherein the pressing member is arranged on the optical fiber holding groove mutually perpendicular, the pressing member presses the upper surface of the optical fiber to a direction of a bottom of the optical fiber holding groove, and the optical fiber and the optical element are thereby optically connected.Type: ApplicationFiled: November 14, 2008Publication date: December 9, 2010Inventors: Nobuo Miyadera, Toshihiro Kuroda, Shigeru Koibuchi, Kyouichi Sasaki
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Patent number: 7373064Abstract: The present invention provides a polymeric optical waveguide film whose core and clad are constituted from polymer materials and which is characterized in that a protective layer of a polymer material having resistance to solvent attack higher than that observed for the clad is arranged on at least one of the surface and back face of the waveguide film. The present invention thus permits the preparation of such a film, the clad of which is hardly damaged, which is excellent in the resistance to solvent attack and which never undergoes cracking even when it is bought into contact with a commonly used solvent such as acetone.Type: GrantFiled: August 30, 2006Date of Patent: May 13, 2008Assignee: Hitachi Chemical Co., Ltd.Inventors: Masatoshi Yamaguchi, Tooru Takahashi, Shigeru Koibuchi, Nobuo Miyadera
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Publication number: 20060291790Abstract: The present invention provides a polymeric optical waveguide film whose core and clad are constituted from polymer materials and which is characterized in that a protective layer of a polymer material having resistance to solvent attack higher than that observed for the clad is arranged on at least one of the surface and back face of the waveguide film. The present invention thus permits the preparation of such a film, the clad of which is hardly damaged, which is excellent in the resistance to solvent attack and which never undergoes cracking even when it is bought into contact with a commonly used solvent such as acetone.Type: ApplicationFiled: August 30, 2006Publication date: December 28, 2006Applicant: HITACHI CHEMICAL CO., LTD.Inventors: Masatoshi YAMAGUCHI, Tooru TAKAHASHI, Shigeru KOIBUCHI, Nobuo MIYADERA
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Publication number: 20030054184Abstract: The invention provides an optical element comprising a substrate having provided thereon a coating of an organic zirconium compound, a coating of a fluorine-free polyimide resin and a coating of a fluorine-containing polyimide resin, in this order. The element has increased adhesive property with the substrate and reliability.Type: ApplicationFiled: September 30, 2002Publication date: March 20, 2003Applicant: Hitachi Chemical Co., Ltd.Inventors: Nobuo Miyadera, Tooru Takahashi, Yutaka Honda, Shigeru Koibuchi, Tatemi Ido, Shinji Tsuji, Takamitsu Nagara
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Patent number: 5314783Abstract: A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.Type: GrantFiled: November 2, 1992Date of Patent: May 24, 1994Assignees: Hitachi Chemical Co., Ltd., Hitachi, Ltd.Inventors: Shigeru Koibuchi, Asao Isobe, Michiaki Hashimoto
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Patent number: 5215858Abstract: A photosensitive resin composition comprising (A) an alkaline aqueous solution-soluble novolak resin, (B) a photosensitizer obtained by reacting a polyhydroxy compound with 1,2-naphthoquinone-(2)-diazido-5(or 4)-sulfonyl chloride, and (C) an ultraviolet absorber such as 2-(2'-hydroxy-5'-methylphenyl)-benzotriazole, has a strong absorption against a light of a wavelength of 365 nm and is suitable for producing semiconductor elements, etc.Type: GrantFiled: March 21, 1989Date of Patent: June 1, 1993Assignees: Hitachi Chemical Company, Ltd., Hitachi, Ltd.Inventors: Shigeru Koibuchi, Asao Isobe, Michiaki Hashimoto
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Patent number: 4801519Abstract: A developing solution comprising at least two compounds selected from choline and quaternary ammonium salts is suitable for developing a negative-type photosensitive resin composition with exposure to a smaller light amount.Type: GrantFiled: April 13, 1987Date of Patent: January 31, 1989Assignees: Hitachi Chemical Company Ltd., Hitachi, Ltd.Inventors: Shigeru Koibuchi, Asao Isobe, Daisuke Makino, Yutaka Takeda
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Patent number: 4792516Abstract: A photosensitive composition comprising (a) a photosensitive component such as an aromatic diazo compound or an aromatic azide, (b) a polymer and (c) a quaternary alkylammonium salt wherein each straight- or branched-chain alkyl group has 1 to 7 carbon atoms is suitable for producing a positive type or negative type photresist excellent in contrast and sensitivity in the microlithography of semiconductor elements.Type: GrantFiled: January 5, 1987Date of Patent: December 20, 1988Assignee: Hitachi Chemical CompanyInventors: Minoru Toriumi, Hiroshi Shiraishi, Ryotaro Irie, Shigeru Koibuchi
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Patent number: 4722883Abstract: Fine patterns with high degree of resolution and high resistance to etching can be produced by coating a solution of a photosensitive composition comprising (a) an aromatic azide compound and (b) an alkaline-aqueous-solution-soluble polymer on a substrate, exposing predetermined portions of the coated photosensitive composition to ultraviolet light, developing with an alkaline aqueous solution to form a resist pattern, and etching the substrate using said resist pattern as a mask.Type: GrantFiled: August 7, 1986Date of Patent: February 2, 1988Assignee: Hitachi, Ltd.Inventors: Shigeru Koibuchi, Asao Isobe, Daisuke Makino
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Patent number: 4698291Abstract: 4'-Azidobenzal-2-methoxyacetophenone is an excellent photosensitive compound and can give a photosensitive composition together with an alkaline-aqueous-solution-soluble polymer which can be insolubilized in an alkaline aqueous solution by photochemical curing with 4'-azidobenzal-2-methoxyacetophenone, and if necessary together with an organic solvent, said composition showing a very small change in viscosity with the lapse of long time.Type: GrantFiled: July 17, 1986Date of Patent: October 6, 1987Assignees: Hitachi Chemical Co., Ltd., Hitachi, Ltd.Inventors: Shigeru Koibuchi, Asao Isobe, Daisuke Makino
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Patent number: 4554237Abstract: Disclosed are photosensitive resin composition useful for formation of fine patterns on semiconductor devices, magnetic bubble devices, etc. which is highly sensitive and is excellent in developability and which has no problem such as precipitation of azide compounds and remaining azide particles after development and a method for forming fine patterns with said composition.Said photosensitive resin composition comprises (a) at least one polymer compound selected from the group consisting of a novolak resin and a polyhydroxystyrene resin and (b) an azide compound represented by the general formula (1): ##STR1## [wherein X is --N.sub.3 or --SO.sub.2 N.sub.3, Y is ##STR2## R.sup.1 is a lower alkylene such as --CH.sub.2 CH.sub.2 --, --CH.sub.2 CH.sub.2 CH.sub.2 --, or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 CH.sub.2 --, a hydroxyalkylene or an aminoalkylene such as ##STR3## (wherein R.sup.4 and R.sup.5 are lower alkyl or hydrogen, R.sup.6 -R.sup.8 are lower alkyl groups, R.sup.Type: GrantFiled: December 22, 1982Date of Patent: November 19, 1985Assignees: Hitach, Ltd., Hitachi Chemical Company, Ltd.Inventors: Fumio Kataoka, Fusaji Shoji, Hitoshi Yokono, Daisuke Makino, Shigeru Koibuchi, Asao Isobe
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Patent number: 4499163Abstract: A photosensitive resin composition comprising (a) 20 to 75 parts by weight of a urethane diacrylate or dimethacrylate compound obtained by reacting trimethylhexamethylene diisocyanate and/or isophorone diisocynate dihydric alcohol and an acrylic or methacrylic monoester of a dihydric alcohol, (b) 20 to 75 parts by weight of a linear polymeric compound having a glass transition temperature of about 40.degree. to 150.degree. C., and (c) a sensitizer and/or a sensitizer system which generate free radicals owing to actinic light, is excellent in heat resistance, resistance to thermal shock and solvent resistance, and is suitable for forming a soldering mask. Further, a photosensitive element produced by forming a layer of the above-mentioned composition on a support gives a protective coating film excellent in heat resistance, resistance to thermal shock and solvent resistance, and is particularly suitable for a soldering mask.Type: GrantFiled: July 11, 1983Date of Patent: February 12, 1985Assignee: Hitachi Chemical Company, Ltd.Inventors: Toshiaki Ishimaru, Katsushige Tsukada, Nobuyuki Hayashi, Shigeru Koibuchi, Asao Isobe