Patents by Inventor Shigeru Terashima
Shigeru Terashima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11745410Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.Type: GrantFiled: May 24, 2019Date of Patent: September 5, 2023Assignee: Canon Kabushiki KaishaInventors: Shigeru Terashima, Takahiro Nakayama, Yoichi Matsuoka
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Publication number: 20230219281Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.Type: ApplicationFiled: February 24, 2023Publication date: July 13, 2023Inventors: Shigeru Terashima, Takahiro Nakayama, Yoichi Matsuoka
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Patent number: 11036149Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.Type: GrantFiled: August 20, 2018Date of Patent: June 15, 2021Assignee: CANON KABUSHIKI KAISHAInventors: Yoichi Matsuoka, Kiyohito Yamamoto, Hisanobu Azuma, Shigeru Terashima, Toshihiro Maeda, Masami Yonekawa, Keiji Emoto, Kazuki Nakagawa
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Publication number: 20190366619Abstract: An imprint apparatus that forms a pattern of an imprint material on a substrate with use of a mold includes a mold holding unit configured to hold the mold, a suction unit provided at the mold holding unit and configured to suction a gas in a space in which the mold and the substrate face each other, a detector configured to detect particles included in the gas suctioned by the suction unit, and a control unit configured to perform error processing depending on a result of detection performed by the detector.Type: ApplicationFiled: May 24, 2019Publication date: December 5, 2019Inventors: Shigeru Terashima, Takahiro Nakayama, Yoichi Matsuoka
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Publication number: 20180356741Abstract: An imprint apparatus forms a pattern on a substrate by curing an imprint material on the substrate while the imprint material is in contact with a mold. The imprint apparatus includes a substrate chuck having a substrate holding region for holding the substrate, a peripheral member arranged to surround the side surface of the substrate held by the substrate chuck, and a control unit configured to control a cleaning process for cleaning at least a partial region of the peripheral member by using a cleaning member including a charging unit. The cleaning process includes an operation for attracting a particle in the partial region to the charging unit by moving the cleaning member relative to the peripheral member while the charging unit faces at least the partial region of the peripheral member.Type: ApplicationFiled: August 20, 2018Publication date: December 13, 2018Inventors: Yoichi Matsuoka, Kiyohito Yamamoto, Hisanobu Azuma, Shigeru Terashima, Toshihiro Maeda, Masami Yonekawa, Keiji Emoto, Kazuki Nakagawa
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Supply apparatus which supplies radicals, lithography apparatus, and method of manufacturing article
Patent number: 8980533Abstract: A supply apparatus for supplying radicals includes: a generator arranged in a chamber and configured to generate radicals by activating a gas supplied into the chamber; and a transport pipe having one end connected to the chamber and the other end from which the generated radicals are discharged. The generator is configured to activate the gas with infrared light radiation accompanied. An inner surface of the transport pipe is formed into a patterned shape by which the infrared light exiting the other end is less than the infrared light entering the one end.Type: GrantFiled: September 25, 2013Date of Patent: March 17, 2015Assignee: Canon Kabushiki KaishaInventor: Shigeru Terashima -
SUPPLY APPARATUS WHICH SUPPLIES RADICALS, LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
Publication number: 20140113235Abstract: A supply apparatus for supplying radicals includes: a generator arranged in a chamber and configured to generate radicals by activating a gas supplied into the chamber; and a transport pipe having one end connected to the chamber and the other end from which the generated radicals are discharged. The generator is configured to activate the gas with infrared light radiation accompanied. An inner surface of the transport pipe is formed into a patterned shape by which the infrared light exiting the other end is less than the infrared light entering the one end.Type: ApplicationFiled: September 25, 2013Publication date: April 24, 2014Applicant: CANON KABUSHIKI KAISHAInventor: Shigeru Terashima -
Patent number: 8686378Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.Type: GrantFiled: July 17, 2012Date of Patent: April 1, 2014Assignee: Canon Kabushiki KaishaInventor: Shigeru Terashima
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Patent number: 8665415Abstract: An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.Type: GrantFiled: April 20, 2011Date of Patent: March 4, 2014Assignee: Canon Kabushiki KaishaInventors: Takahiro Nakayama, Shigeru Terashima, Yutaka Watanabe
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Patent number: 8563950Abstract: An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.Type: GrantFiled: January 19, 2012Date of Patent: October 22, 2013Assignee: Canon Kabushiki KaishaInventors: Takahiro Nakayama, Shigeru Terashima
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Publication number: 20130040240Abstract: A charged particle beam drawing apparatus includes an electrostatic lens including an electrode member and configured to project the plurality of charged particle beams onto the substrate via the electrode member. In the electrode member are formed a plurality of first openings via which the plurality of charged particle beams pass, and a plurality of second openings different from the plurality of first openings, a total area of the plurality of second openings being not smaller than a total area of the plurality of first openings.Type: ApplicationFiled: July 17, 2012Publication date: February 14, 2013Applicant: CANON KABUSHIKI KAISHAInventor: Shigeru Terashima
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Publication number: 20120181455Abstract: An energy beam drawing apparatus includes a member, positioned between an energy beam source and a substrate, on which a deposit is deposited and a removing unit which removes the deposit. The removing unit includes a catalyst for generating, from a gas, an active species for decomposing the deposit by irradiation with the energy beam, a supplying mechanism for supplying the gas to a position where the active species is generated, and a moving mechanism for moving, when executing processing of removing the deposit, the catalyst to a first position which is irradiated with the energy beam, and moving, when executing drawing processing on the substrate, the catalyst to a second position which is not irradiated with the energy beam.Type: ApplicationFiled: January 19, 2012Publication date: July 19, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Takahiro NAKAYAMA, Shigeru TERASHIMA
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Publication number: 20120183905Abstract: A drawing apparatus for drawing a pattern on a substrate by using a charged-particle beam comprises: a blanking deflector which deflects the charged-particle beam; a stopping aperture member which can block the charged-particle beam deflected by the blanking deflector; a catalyst which generates, from a gas, an active species for decomposing a deposit formed on the stopping aperture member; and a supply mechanism which supplies the gas to the catalyst. In a removing operation of removing the deposit, while the supply mechanism supplies the gas to the catalyst, the charged-particle beam irradiates a region which is not irradiated with the charged-particle beam in a drawing operation of drawing the pattern, thereby generating the active species from the gas by the catalyst positioned in at least the region, and removing the deposit by decomposing the deposit by the generated active species.Type: ApplicationFiled: January 11, 2012Publication date: July 19, 2012Applicant: CANON KABUSHIKI KAISHAInventors: Shigeru TERASHIMA, Takahiro NAKAYAMA
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Publication number: 20110262866Abstract: An exposure apparatus which projects exposure light from a pattern of an illuminated original onto a substrate, comprises a projection system including an optical element and configured to project the exposure light onto the substrate, an enclosure configured to enclose the projection system, and a cleaning mechanism configured to clean the optical element by irradiating the optical element with ultraviolet light under an environment in which oxygen is present within the enclosure, the cleaning mechanism including a light source configured to generate ultraviolet light, a tubular member including an exit window and configured to partially enclose an optical path between the light source and the optical element, and a regulating device configured to regulate an environment of a space inside the tubular member so that a partial pressure of oxygen becomes lower in the space inside the tubular member than in a space which is outside the tubular member.Type: ApplicationFiled: April 20, 2011Publication date: October 27, 2011Applicant: CANON KABUSHIKI KAISHAInventors: Takahiro Nakayama, Shigeru Terashima, Yutaka Watanabe
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Patent number: 8004657Abstract: An exposure apparatus that includes a chamber in which an optical element, including a capping layer, is arranged, and that exposes a substrate to exposure light via the optical element. The apparatus includes a supply unit configured to supply a material into the chamber and a providing unit configured to provide electromagnetic waves to the capping layer. The apparatus is configured so that the electromagnetic waves provided by the providing unit cause a photochemical reaction of the material, to grow a layer on the capping layer, with at least one of a condition of supply of the material by the supply unit and a condition of provision of the electromagnetic waves by the providing unit being changed in accordance with each position of the capping layer, based on information of a decrease in an amount of the capping layer at each position, so as to repair the capping layer.Type: GrantFiled: February 21, 2007Date of Patent: August 23, 2011Assignee: Canon Kabushiki KaishaInventors: Masayuki Tanabe, Yutaka Watanabe, Shigeru Terashima, Mika Kanehira
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Patent number: 7738076Abstract: An exposure apparatus for exposing a substrate to exposure light via a pattern of a mask. The apparatus includes a stage configured to hold one of the substrate and the mask, and to move, a projection optical system configured to project the pattern onto the substrate, a defining member facing the stage and configured to define a space, between the stage and the projection optical system, through which the exposure light passes and which is to be filled with fluid, a first stream mechanism having a first supply port in the defining member and configured to stream the fluid through the space from the first supply port, an exhaust mechanism having an exhaust port in the defining member and configured to exhaust fluid in the space from the exhaust port, and a second stream mechanism having a second supply port different from the first supply port.Type: GrantFiled: July 31, 2006Date of Patent: June 15, 2010Assignee: Canon Kabushiki KaishaInventors: Noriyasu Hasegawa, Shigeru Terashima
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Patent number: 7724348Abstract: An exposure apparatus for exposing a substrate to exposure light via an original. The apparatus includes a reflector, which includes a multilayer film and a ruthenium film, and reflects the exposure light. The multilayer film reflects the exposure light, and the ruthenium film is arranged on the multilayer film. A vacuum container contains the reflector, an exhauster exhausts exhaust gas in the vacuum container, and a regulator supplies water vapor into the vacuum container and regulates an amount of the water vapor in the vacuum container, based on an amount of carbonaceous gas in the vacuum chamber, so as to retard oxidation of the ruthenium film.Type: GrantFiled: December 21, 2006Date of Patent: May 25, 2010Assignee: Canon Kabushiki KaishaInventors: Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima
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Patent number: 7566422Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.Type: GrantFiled: August 11, 2005Date of Patent: July 28, 2009Assignee: Canon Kabushiki KaishaInventors: Shinichi Hara, Yutaka Tanaka, Shigeru Terashima, Takayuki Hasegawa, Shin Matsui
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Publication number: 20080304031Abstract: An exposure apparatus exposes a substrate using light from a light source having a wavelength of 20 nm or smaller, and includes plural optical elements, each of which is configured to reflect the light, plural vacuum chambers, each of which houses one or more of the plural optical elements, and a gas supplier configured to supply to each vacuum chamber independently a gas used to inhibit contaminations that could occur on the optical element housed in each vacuum chamber, wherein the gas supplier supplies different types of gases to the plural vacuum chambers according to an illuminance of an illumined region on the optical element housed in each vacuum chamber.Type: ApplicationFiled: March 13, 2008Publication date: December 11, 2008Applicant: CANON KABUSHIKI KAISHAInventors: Mika Kanehira, Shigeru Terashima, Yutaka Watanabe
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Publication number: 20070202423Abstract: An exposure apparatus includes a chamber where an optical element having a capping layer is arranged, and exposes a substrate by using the optical element. The exposure apparatus includes a supply unit which supplies a material to repair the capping layer into the chamber, and a providing unit which provides electromagnetic waves to the optical element. The electromagnetic waves cause a photochemical reaction of the material to grow a layer on the capping layer so as to repair the capping layer.Type: ApplicationFiled: February 21, 2007Publication date: August 30, 2007Applicant: CANON KABUSHIKI KAISHAInventors: Masayuki Tanabe, Yutaka Watanabe, Shigeru Terashima, Mika Kanehira