Patents by Inventor Shigeru Yamagata
Shigeru Yamagata has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9403620Abstract: A silica container contains a substrate having a rotational symmetry, containing mainly a silica, and gaseous bubbles in a peripheral part of the substrate; a transparent silica glass in an inner peripheral part of the substrate; and an inner layer, formed on an inner surface of the substrate and containing a transparent silica glass; wherein the substrate contains Li, Na, and K in a total concentration of 50 or less ppm by weight; the substrate has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm; the inner layer contains Li, Na, and K in a total concentration of 100 or less ppb by weight and at least one of Ca, Sr, and Ba in a total concentration of 50 to 2000 ppm by weight; and the inner layer has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm.Type: GrantFiled: April 12, 2013Date of Patent: August 2, 2016Assignee: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Shigeru Yamagata, Tomomi Usui
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Patent number: 9382640Abstract: The present invention provides a single-crystal silicon pulling silica container including an outer layer made of opaque silica glass containing gaseous bubbles and an inner layer made of transparent silica glass that does not substantially contain the gaseous bubbles; the container also including: a bottom portion, a curved portion, and a straight body portion, wherein continuous grooves are formed on a surface of the inner layer from at least part of the bottom portion to at least part of the straight body portion through the curved portion. As a result, there are provided the single-crystal silicon pulling silica container that can reduce defects called voids or pinholes in the pulled single-crystal silicon and a method for manufacturing such a silica container.Type: GrantFiled: October 2, 2012Date of Patent: July 5, 2016Assignee: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventor: Shigeru Yamagata
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Patent number: 9376761Abstract: The present invention is directed to a single-crystal silicon pulling silica container, the silica container including a straight body portion, a curved portion, and a bottom portion, wherein the OH group concentration in the straight body portion is 30 to 300 ppm by mass, the OH group concentration in the bottom portion is 30 ppm by mass or less, and the difference in the OH group concentration between the straight body portion and the bottom portion is 30 ppm by mass or more. As a result, a low-cost single-crystal silicon pulling silica container, the silica container that can reduce cavity defects called voids and pinholes in pulled single crystal silicon, is provided.Type: GrantFiled: November 8, 2012Date of Patent: June 28, 2016Assignee: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventor: Shigeru Yamagata
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Publication number: 20160055407Abstract: The present invention is an RFID tag sheet to which information can be inputted by simple operations and configurations by using a sheet, card, or others in which a plurality of RFID tags are embedded without requirement for rewriting the contents of RFID tags and updating corresponding data. A typical embodiment of the present invention has a shielding member attached detachably to a surface of an RFID tag sheet made of a sheet-shaped electric wave transmitting material in which a plurality of RFID tags are embedded so that all or some of the RFID tags are covered, and the shielding member is made of a material that shields electromagnetic waves used in communication between the RFID tag and a reader device.Type: ApplicationFiled: April 2, 2013Publication date: February 25, 2016Inventors: Shigeru Yamagata, Shigeru Yamauchi, Tsuyoshi Miyazaki, Kenichiro Tomoi
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Patent number: 9145325Abstract: A method for producing a silica container having a rotational symmetry includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.Type: GrantFiled: June 13, 2014Date of Patent: September 29, 2015Assignee: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Shigeru Yamagata, Tomomi Usui
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Publication number: 20150114284Abstract: The present invention provides a silica container for pulling single crystal, the container having a straight body portion, a curved portion, and a bottom portion, wherein an outer side of the container is made of opaque silica glass containing bubbles, and an inner side of the container is made of transparent silica glass, and a mixed silica layer in which a phase in which a crystalline silica powder is fused and a phase in which an amorphous silica powder is fused are mixed in a granular texture is provided on at least an inner surface layer portion of the straight body portion. As a result, there is provided the silica container for pulling single crystal silicon which can suppress melt surface vibration of a silicon melt in the silica container at a high temperature.Type: ApplicationFiled: March 25, 2014Publication date: April 30, 2015Inventor: Shigeru Yamagata
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Patent number: 8915097Abstract: Producing a silica container includes forming a powder mixture by adding an Al compound or a crystal nucleating agent into a first powdered raw material; preliminarily molding to an intended shape by feeding the powder mixture to an inner wall of an outer frame while rotating the outer frame having aspiration holes; forming a silica substrate; and forming a transparent silica glass layer on an inner surface of the silica substrate, wherein the preliminarily molded article is degassed by aspiration from a peripheral side and heated from inside the preliminarily molded article at high temperature making a peripheral part of the preliminarily molded article to a sintered body while an inner part to a fused glass body, and a second powdered raw material having a higher silica purity than the first powdered raw material is spread from inside the silica substrate and heated from the inside at high temperature.Type: GrantFiled: March 12, 2013Date of Patent: December 23, 2014Assignee: Shin-Etsu Quartz Products Co., LtdInventors: Shigeru Yamagata, Tomomi Usui
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Patent number: 8915096Abstract: A method for producing a silica container includes forming a preliminarily molded substrate, wherein a first powdered raw material is fed to an inner wall of an outer frame having aspiration holes while rotating the outer frame; forming a preliminarily molded intermediate layer, wherein a second powdered raw material added with an aluminum compound or a crystal nucleating agent as an additive is fed to an inner wall of the preliminarily molded substrate; and forming an inner layer, wherein the preliminarily molded substrate and the preliminarily molded intermediate layer are degassed by aspiration from a peripheral side with heating from an inside forming a substrate and an intermediate layer, and a third powdered raw material having a high silica purity is spread from inside the substrate having the formed intermediate layer with heating from the inside forming an inner layer on an inner surface of the intermediate layer.Type: GrantFiled: March 11, 2013Date of Patent: December 23, 2014Assignee: Shin-Etsu Quartz Products Co., Ltd.Inventors: Shigeru Yamagata, Tomomi Usui
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Publication number: 20140290308Abstract: A method for producing a silica container having a rotational symmetry includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.Type: ApplicationFiled: June 13, 2014Publication date: October 2, 2014Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Shigeru YAMAGATA, Tomomi USUI
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Publication number: 20140283737Abstract: The present invention is directed to a single-crystal silicon pulling silica container, the silica container including a straight body portion, a curved portion, and a bottom portion, wherein the OH group concentration in the straight body portion is 30 to 300 ppm by mass, the OH group concentration in the bottom portion is 30 ppm by mass or less, and the difference in the OH group concentration between the straight body portion and the bottom portion is 30 ppm by mass or more. As a result, a low-cost single-crystal silicon pulling silica container, the silica container that can reduce cavity defects called voids and pinholes in pulled single crystal silicon, is provided.Type: ApplicationFiled: November 8, 2012Publication date: September 25, 2014Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventor: Shigeru Yamagata
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Patent number: 8815403Abstract: A method for producing a silica container having a rotational symmetry is provided. The method includes forming a preliminarily molded article by feeding a powdered substrate's raw material to an inner wall of an outer frame having aspiration holes with rotating the frame, and forming a silica substrate. The preliminarily molded article is aspirated from an outer peripheral side with controlling a humidity inside the outer frame by ventilating gases present in the outer frame with charging from inside the preliminarily molded article a gas mixture comprised of an O2 gas and an inert gas and made below a prescribed dew-point temperature by dehumidification, and at the same time heated from inside the preliminarily molded article by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded article to a sintered body while an inner peripheral part to a fused glass body.Type: GrantFiled: June 25, 2010Date of Patent: August 26, 2014Assignee: Shin-Etsu Quartz Products Co., Ltd.Inventors: Shigeru Yamagata, Tomomi Usui
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Publication number: 20140182510Abstract: A single-crystal silicon pulling silica container including: a transparent silica glass layer in the inner side of the silica container; and an opaque silica glass layer containing gaseous bubbles in the outer side of the silica container, wherein the transparent layer constitutes of a high-OH group layer placed on an inner surface side of the silica container containing the OH group at a concentration of 200 to 2000 ppm by mass and a low-OH group layer having the OH group concentration lower than the high-OH group layer containing Ba at a concentration of 50 to 2000 ppm by mass. Resulting in the silica container used for pulling single-crystal silicon, providing the silica container improves etching corrosion resistance of the container inner surface to silicon melt when the entire inner surface of transparent silica glass of the container is crystallized short after using the container and method for such silica container.Type: ApplicationFiled: February 19, 2013Publication date: July 3, 2014Inventor: Shigeru Yamagata
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Publication number: 20140150715Abstract: A single-crystal silicon pulling silica container includes: a transparent layer made of transparent silica glass in an inner side of the silica container, and an opaque layer made of opaque silica glass containing gaseous bubbles in an outer side of the silica container, wherein the transparent layer is constituted of a high-OH group layer that is placed in an inner surface side of the silica container and contains the OH group at a concentration of 200 to 2000 ppm by mass and a low-OH group layer that has the OH group concentration lower than that of the high-OH group layer, and Ba is applied to the inner surface of the high-OH group layer at a concentration of 25 to 1000 ?g/cm2.Type: ApplicationFiled: March 18, 2013Publication date: June 5, 2014Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventor: Shigeru Yamagata
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Patent number: 8733127Abstract: A method for producing a silica container, the method including forming a preliminarily molded silica substrate to an intended shape by feeding a powdered substrate's raw material (silica particles) to an inner wall of a carbon-made outer frame having aspiration holes with rotating the outer frame, and forming the silica substrate wherein the preliminarily molded substrate is degassed by aspiration from its outer peripheral side with charging from an inner peripheral side of the preliminarily molded silica substrate a reducing gas containing more than 10% by volume of an H2 gas, and at the same time heated from inside the preliminarily molded silica substrate by a discharge-heat melting method with carbon electrodes, thereby making an outer peripheral part of the preliminarily molded silica substrate to a sintered body while an inner peripheral part of the preliminarily molded silica substrate to a fused glass body.Type: GrantFiled: June 1, 2010Date of Patent: May 27, 2014Assignee: Shin-Etsu Quartz Products Co., Ltd.Inventors: Shigeru Yamagata, Tomomi Usui
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Publication number: 20140053772Abstract: The present invention provides a single-crystal silicon pulling silica container including an outer layer made of opaque silica glass containing gaseous bubbles and an inner layer made of transparent silica glass that does not substantially contain the gaseous bubbles; the container also including: a bottom portion, a curved portion, and a straight body portion, wherein continuous grooves are formed on a surface of the inner layer from at least part of the bottom portion to at least part of the straight body portion through the curved portion. As a result, there are provided the single-crystal silicon pulling silica container that can reduce defects called voids or pinholes in the pulled single-crystal silicon and a method for manufacturing such a silica container.Type: ApplicationFiled: October 2, 2012Publication date: February 27, 2014Applicant: Shin-Etsu Quartz Products Co., Ltd.Inventor: Shigeru Yamagata
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Publication number: 20140041575Abstract: The present invention is directed to a silica container for pulling single crystal silicon, the silica container including a straight body portion, a curved portion, and a bottom portion, wherein the outside of the silica container is made of opaque silica glass containing gaseous bubbles, the inside of the silica container is made of transparent silica glass containing substantially no gaseous bubble, and, on the inner surface of the bottom portion, a silica glass layer containing the OH group in a concentration of more than 300 ppm by mass but 3000 ppm by mass or less, the silica glass layer having a thickness of 20 ?m or more but 1000 ?m or less, is formed. As a result, a low-cost silica container for pulling single crystal silicon, the silica container that can reduce cavity defects called voids and pinholes in pulled single crystal silicon, is provided.Type: ApplicationFiled: January 22, 2013Publication date: February 13, 2014Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventor: Shigeru Yamagata
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Publication number: 20130248408Abstract: A silica container contains a substrate having a rotational symmetry, containing mainly a silica, and gaseous bubbles in a peripheral part of the substrate; a transparent silica glass in an inner peripheral part of the substrate; and an inner layer, formed on an inner surface of the substrate and containing a transparent silica glass; wherein the substrate contains Li, Na, and K in a total concentration of 50 or less ppm by weight; the substrate has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm; the inner layer contains Li, Na, and K in a total concentration of 100 or less ppb by weight and at least one of Ca, Sr, and Ba in a total concentration of 50 to 2000 ppm by weight; and the inner layer has a linear light transmittance of 91.8% to 93.2% at a light wavelength of 600 nm.Type: ApplicationFiled: April 12, 2013Publication date: September 26, 2013Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Shigeru Yamagata, Tomomi Usui
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Publication number: 20130227990Abstract: A method for producing a silica container includes forming a preliminarily molded substrate, wherein a first powdered raw material is fed to an inner wall of an outer frame having aspiration holes while rotating the outer frame; forming a preliminarily molded intermediate layer, wherein a second powdered raw material added with an aluminum compound or a crystal nucleating agent as an additive is fed to an inner wall of the preliminarily molded substrate; and forming an inner layer, wherein the preliminarily molded substrate and the preliminarily molded intermediate layer are degassed by aspiration from a peripheral side with heating from an inside forming a substrate and an intermediate layer, and a third powdered raw material having a high silica purity is spread from inside the substrate having the formed intermediate layer with heating from the inside forming an inner layer on an inner surface of the intermediate layer.Type: ApplicationFiled: March 11, 2013Publication date: September 5, 2013Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.Inventors: Shigeru YAMAGATA, Tomomi USUI
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Publication number: 20130227991Abstract: Producing a silica container includes forming a powder mixture by adding an Al compound or a crystal nucleating agent into a first powdered raw material; preliminarily molding to an intended shape by feeding the powder mixture to an inner wall of an outer frame while rotating the outer frame having aspiration holes; forming a silica substrate; and forming a transparent silica glass layer on an inner surface of the silica substrate, wherein the preliminarily molded article is degassed by aspiration from a peripheral side and heated from inside the preliminarily molded article at high temperature making a peripheral part of the preliminarily molded article to a sintered body while an inner part to a fused glass body, and a second powdered raw material having a higher silica purity than the first powdered raw material is spread from inside the silica substrate and heated from the inside at high temperature.Type: ApplicationFiled: March 12, 2013Publication date: September 5, 2013Applicant: Shin-Etsu Quartz Products Co., Ltd.Inventors: Shigeru YAMAGATA, Tomomi USUI
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Patent number: 8460769Abstract: A method is provided for producing a silica container arranged with a substrate, having a rotational symmetry, comprised of mainly a silica, and containing gaseous bubbles at least in its peripheral part, and an inner layer, formed on an inner surface of the substrate and comprised of a transparent silica glass; wherein a powdered silica, having particle diameter of 10 to 1000 ?m, containing Ca, Sr, and Ba with the total concentration of 50 to 5000 ppm by weight, and releasing hydrogen molecules with the amount of 3×1016 to 3×1019 molecules/g upon heating at 1000° C. under vacuum, is prepared at least as a powdered raw material for forming the inner layer, and then the inner layer is formed from the powdered silica as the powdered raw material for forming the inner layer.Type: GrantFiled: September 1, 2010Date of Patent: June 11, 2013Assignee: Shin-Estu Quartz Products Co., Ltd.Inventors: Shigeru Yamagata, Tomomi Usui