Patents by Inventor Shigeto SUGIMOTO

Shigeto SUGIMOTO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Deposition mask, producing method therefor and forming method for thin film pattern
    Patent number: 9586225
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Grant
    Filed: June 22, 2015
    Date of Patent: March 7, 2017
    Assignee: V TECHNOLOGY CO., LTD.
    Inventors: Shigeto Sugimoto, Koichi Kajiyama, Michinobu Mizumura, Syuji Kudo, Eriko Kimura, Hany Maher Aziz, Yoshitaka Kajiyama
  • Deposition mask, producing method therefor and forming method for thin film pattern
    Patent number: 9555434
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: January 31, 2017
    Assignee: V Technology Co., Ltd.
    Inventors: Shigeto Sugimoto, Koichi Kajiyama, Michinobu Mizumura, Syuji Kudo, Eriko Kimura, Hany Maher Aziz, Yoshitaka Kajiyama
  • Deposition mask, producing method therefor and forming method for thin film pattern
    Patent number: 9555433
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Grant
    Filed: March 15, 2016
    Date of Patent: January 31, 2017
    Assignee: V Technology Co., Ltd.
    Inventors: Shigeto Sugimoto, Koichi Kajiyama, Michinobu Mizumura, Syuji Kudo, Eriko Kimura, Hany Maher Aziz, Yoshitaka Kajiyama
  • DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN
    Publication number: 20160193623
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Application
    Filed: March 15, 2016
    Publication date: July 7, 2016
    Inventors: Shigeto SUGIMOTO, Koichi KAJIYAMA, Michinobu MIZUMURA, Syuji KUDO, Eriko KIMURA, Hany Maher AZIZ, Yoshitaka KAJIYAMA
  • DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN
    Publication number: 20160194745
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Application
    Filed: March 15, 2016
    Publication date: July 7, 2016
    Inventors: Shigeto SUGIMOTO, Koichi KAJIYAMA, Michinobu MIZUMURA, Syuji KUDO, Eriko KIMURA, Hany Maher AZIZ, Yoshitaka KAJIYAMA
  • Deposition mask, producing method therefor and forming method for thin film pattern
    Patent number: 9334556
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Grant
    Filed: March 14, 2014
    Date of Patent: May 10, 2016
    Assignee: V Technology Co., Ltd.
    Inventors: Shigeto Sugimoto, Koichi Kajiyama, Michinobu Mizumura, Syuji Kudo, Eriko Kimura, Hany Maher Aziz, Yoshitaka Kajiyama
  • DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN
    Publication number: 20150284839
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Application
    Filed: June 22, 2015
    Publication date: October 8, 2015
    Applicant: V TECHNOLOGY CO., LTD.
    Inventors: Shigeto SUGIMOTO, Koichi KAJIYAMA, Michinobu MIZUMURA, Syuji KUDO, Eriko KIMURA, Hany Maher AZIZ, Yoshitaka KAJIYAMA
  • DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN
    Publication number: 20140199808
    Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
    Type: Application
    Filed: March 14, 2014
    Publication date: July 17, 2014
    Applicant: V TECHNOLOGY CO., LTD.
    Inventors: Shigeto SUGIMOTO, Koichi KAJIYAMA, Michinobu MIZUMURA, Syuji KUDO, Eriko KIMURA, Hany Maher AZIZ, Yoshitaka KAJIYAMA