Abstract: The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.

Abstract: A projection aligner scans a plurality of light beams over a mask in a main scanning direction to transfer an image of a mask pattern on an object by the light beams passed through the mask. The projection aligner has a plurality of optical systems for projecting light beams passed through the mask onto the object. Each of the optical system includes a lens unit, a reflector provided to one side of the lens unit and a deflector provided to the other side of the lens unit. The light beam passed through the mask is deflected by the deflector, passes through the lens unit, reflected back by the reflector, passes through the lens unit again, and deflected by the deflector toward the object. The size of the image formed by the light beam is varied by moving the reflector in the main scanning direction and moving the deflector in a direction perpendicular to the object. The location of the image on the object in the auxiliary direction is adjusted by further moving the reflector in the auxiliary direction.

Abstract: The projection aligner for transferring an image of a mask pattern of a mask onto an object to be exposed comprises a projection optical system that forms the image of the mask pattern onto the object, an expansion ratio determiner that measures lengths of the object in first and second directions and determines first and second expansion ratios, which are expansion ratios of the object in the first and second directions, respectively, based on those lengths, and a magnification controller that adjusts the magnification of the projection optical system to a value between the first and second expansion ratios.

Abstract: The projection aligner transfers the image of the pattern formed on the mask to the object by scanning a light beam across the mask and the object. The projection aligner includes a driving mechanism for synchronously moving the mask and the object and thereby scanning the light beam across the mask and the object in a predetermined beam scanning direction. The light beam scanning the mask passes through the mask and is projected onto the object by a projection optical system of which magnification is adjusted by a magnification adjusting mechanism. The magnification adjusting mechanism and the driving mechanism are controlled by a controller such that the difference between the magnification of said projection optical system and a velocity ratio of the mask and the object moved by the driving mechanism becomes below a predetermined maximum value which is determined based on a line width of the pattern formed on the mask.

Abstract: The projection aligner transfers the image of the pattern formed on the mask to the object by scanning a light beam across the mask and the object. The projection aligner includes a driving mechanism for synchronously moving the mask and the object and thereby scanning the light beam across the mask and the object in a predetermined beam scanning direction. The light beam scanning the mask passes through the mask and is projected onto the object by a projection optical system of which magnification is adjusted by a magnification adjusting mechanism. The magnification adjusting mechanism and the driving mechanism are controlled by a controller such that the difference between the magnification of said projection optical system and a velocity ratio of the mask and the object moved by the driving mechanism becomes below a predetermined maximum value which is determined based on a line width of the pattern formed on the mask.

Abstract: The projection aligner for transferring an image of a mask pattern of a mask onto an object to be exposed comprises a projection optical system that forms the image of the mask pattern onto the object, an expansion ratio determiner that measures lengths of the object in first and second directions and determines first and second expansion ratios, which are expansion ratios of the object in the first and second directions, respectively, based on those lengths, and a magnification controller that adjusts the magnification of the projection optical system to a value between the first and second expansion ratios.

Abstract: The projection aligner transfers a mask pattern formed on a mask to a substrate. A collimated light beam is emitted from a light source toward the mask. The light beam passed through the mask is deflected by a first mirror formed on a deflector toward a lens unit having a positive power. A reflector is provided at the other side of the lens unit to reflect back the light beam passed through the lens unit. The light beam reflected by the reflector passed through the lend unit again and then deflected by a second mirror formed on the deflector toward the substrate to form an image of the mask pattern. The size of the image formed on the substrate is adjusted by moving the reflector along the optical axis of the lens unit, and the deflector along the optical path of the light beam passed through the mask.

Abstract: The projection aligner includes a lens unit having an optical axis parallel to a mask, a reflector provided to one side of the lens unit to reflect back light passed therethrough, a light source that emits a light beam toward the object through the mask, and a deflector being inserted in an optical path of the light beam at the other side of the lens unit movably along the optical axis of said lens unit. The deflector has first and second mirrors which are inclined against the optical axis of the lens unit in opposite, directions to each other. The first mirror is arranged to deflect the light beam coming from the mask toward the reflector through the lens unit. The second mirror is arranged to deflect the light beam reflected by the reflector and passed through the lens unit toward the object.

Abstract: A projection aligner scans a plurality of light beams over a mask in a main scanning direction to transfer an image of a mask pattern on an object by the light beams passed through the mask. The projection aligner has a plurality of optical systems for projecting light beams passed through the mask onto the object. Each of the optical system includes a lens unit, a reflector provided to one side of the lens unit and a deflector provided to the other side of the lens unit. The light beam passed through the mask is deflected by the deflector, passes through the lens unit, reflected back by the reflector, passes through the lens unit again, and deflected by the deflector toward the object. The size of the image formed by the light beam is varied by moving the reflector in the main scanning direction and moving the deflector in a direction perpendicular to the object. The location of the image on the object in the auxiliary direction is adjusted by further moving the reflector in the auxiliary direction.

Abstract: A projection aligner transfers an image of a mask onto an object. The mask and the object are substantially parallel with each other. The project aligner has a light source that emits light in a predetermined direction. The light is directed toward the object through the mask. A deflection unit including first and second mirrors inserted in an optical path of the light directed from the mask to the object. An angle formed by the first and second mirrors of the deflection unit is greater than 180 degrees. The light reflected by the first mirror passes through the lens unit, is reflected by a mirror unit, and is deflected by the second mirror to the object. Optical paths of the light from the mask to the first mirror and the light from the second mirror to the object are substantially parallel with each other, and the deflection unit is driven in the predetermined direction.