Abstract: A method for synchronous control of a gantry mechanism with online inertia matching is applicable to a machine tool equipped with a gantry mechanism. The gantry mechanism includes two rails, a crossbeam and a saddle, in which the saddle is disposed on the crossbeam, and the crossbeam is disposed by crossing the two rails. Each of the two rails is furnished with a driving apparatus for synchronously driving the crossbeam, and the driving apparatus includes a drive motor and a lead screw. This method includes the steps of: obtaining gantry-mechanism information; detecting position information of the saddle on the crossbeam; evaluating the position information and the gantry-mechanism information to derive load-inertia variety information; and, evaluating the load-inertia variety information to adjust torque-output information of the drive motor corresponding to the respective driving apparatus.

Abstract: A method for synchronous control of a gantry mechanism with online inertia matching is applicable to a machine tool equipped with a gantry mechanism. The gantry mechanism includes two rails, a crossbeam and a saddle, in which the saddle is disposed on the crossbeam, and the crossbeam is disposed by crossing the two rails. Each of the two rails is furnished with a driving apparatus for synchronously driving the crossbeam, and the driving apparatus includes a drive motor and a lead screw. This method includes the steps of: obtaining gantry-mechanism information; detecting position information of the saddle on the crossbeam; evaluating the position information and the gantry-mechanism information to derive load-inertia variety information; and, evaluating the load-inertia variety information to adjust torque-output information of the drive motor corresponding to the respective driving apparatus.

Abstract: An arc processing method is provided. Firstly, a machining program code is provided, wherein the machining program code includes a control code for machining an arc having a start point and an end point. Then, the machining program code is analyzed to obtain a first start point vector and a first end point vector, both defined by a first coordinate system, of a tool. Then, the first start point vector is converted to a second start point vector defined by a second coordinate system. Then, the first end point vector is converted to a second end point vector defined by the second coordinate system. Then, a plurality of first interpolation vectors of interpolation points, defined by the second coordinate system and interposed between the second start point vector and the second end point vector, are obtained. Then, all the first interpolation vectors are converted into corresponding second interpolation vectors.

Abstract: A servo tuning device adapted to a multi-axis machine tool at least having two linear axes and a rotation axis used for a moving base and a working platform to move relatively along the two linear axes and the rotation axis. The servo tuning device includes a reflection component, a photoelectric sensor and a processor. The reflection component is configured to be disposed on one of the moving base and the working platform and has a reflection surface. The photoelectric sensor has a light-emitting element and a light-receiving element facing the reflection surface. The photoelectric sensor is configured to be disposed on the other one of the moving base and the working platform. The processor records information of relative movement between the photoelectric sensor and the reflection surface for calculating a loop gain value used for tuning a servo setting of the two linear axes or the rotation axis.

Abstract: In an apparatus for quantifying the amount of evaporation deposition of a solid substance and its method, the apparatus is connected to a reaction chamber, and a solid substance to be evaporated, a heating source and a load cell are disposed in a heating chamber. The load cell is for detecting the weight of the solid substance, and the reduced weight of the solid substance to be evaporated per unit time is equal to the mass flow of the reaction gas, so that the status of the reaction gas can be known by the weight simultaneously. When the solid substance is heated to a state to form the reaction gas, the heating chamber reaches a saturated vapor pressure greater than a vacuum background pressure of the reaction chamber, the reaction gas continues to flow along the pipeline stably towards the reaction chamber to manufacture a thin film.

Abstract: A linear evaporation apparatus includes a thermal insulation chamber, and crucibles, evaporation material heaters and a mixing chamber installed in the thermal insulation chamber. The mixing chamber includes a flow limiting and adjusting layer, a flow channel adjusting member, a mixed layer and a linear evaporation layer. The flow limiting and adjusting layer is a rectangular sheet with flow limit holes corresponsive to the crucibles respectively; the flow channel adjusting member is an interconnected structure having at least one flow inlet corresponsive to some of the flow limit holes and at least one flow outlet, and the mixed layer is a substantially I-shaped sheet structure, and the linear evaporation layer is a rectangular sheet having a linear source evaporation opening tapered from both ends to the middle, so as to improve the uniformity of the thin film and the utilization of the evaporation materials.

Abstract: In a method for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.

Abstract: In a method and apparatus for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.

Abstract: A high-conductivity thin-film structure for reducing metal contact resistance is disposed between a substrate and at least a metal electrode of a photoelectric component, characterized in that the thin-film structure has a first conductive layer and a second conductive layer, wherein the first conductive layer is a non-crystalline transparent conductive thin-film deposited on a lateral surface of the substrate, and the second conductive layer is a crystalline transparent conductive thin-film deposited on a lateral surface of the first conductive layer, wherein another surface of the second conductive layer is in contact with the metal electrode to serve as a conduction medium between the first conductive layer and the metal electrode. Therefore, the thin-film structure exhibits high conductivity, high transmittance, low contact resistance toward the metal electrode, and insusceptibility to unfavorable effects of coarseness of the surface of the substrate.

Abstract: In a method and apparatus for evaporation depositing uniform thin films, a film is deposited on a substrate of a vacuum environment while maintaining a constant deposition rate. A cover is installed on a wall of the evaporation vessel. When the evaporation material is heated to an evaporation state and the interior of the evaporation vessel reaches a first vapor saturation pressure, the vapor of the evaporation material flows towards a pressure stabilizing chamber. When the pressure stabilizing chamber reaches a second vapor saturation pressure which is smaller than the first vapor saturation pressure, the vacuum environment has a vacuum background pressure which is smaller than the second vapor saturation pressure, so that the evaporation material vapor flows from the pressure stabilizing chamber towards the vacuum environment at constant rate due to the pressure difference, so as to evaporate the substrate.

Abstract: A linear evaporation apparatus includes a thermal insulation chamber, and crucibles, evaporation material heaters and a mixing chamber installed in the thermal insulation chamber. The mixing chamber includes a flow limiting and adjusting layer, a flow channel adjusting member, a mixed layer and a linear evaporation layer. The flow limiting and adjusting layer is a rectangular sheet with flow limit holes corresponsive to the crucibles respectively; the flow channel adjusting member is an interconnected structure having at least one flow inlet corresponsive to some of the flow limit holes and at least one flow outlet, and the mixed layer is a substantially I-shaped sheet structure, and the linear evaporation layer is a rectangular sheet having a linear source evaporation opening tapered from both ends to the middle, so as to improve the uniformity of the thin film and the utilization of the evaporation materials.

Abstract: The present invention provides a manufacturing method for a machine tool having a human-machine interface and a program with predetermined manufacturing conditions.

Abstract: A program-converting module for a multi-axis cooperated machine and a program-converting method. Machining programs and mechanism data of a plurality of first machines are input to a first input module. Mechanism data of a plurality of second machines are input to a second input unit. A setting unit sets at least one of the first machines to be a source machine, and sets one of the second machines to be a target machine. A conversion unit uses a kinematical method to convert the machining program of the source machine into a machining program applicable to the target machine based on the mechanism data of the source and target machines, without requiring CAD/CAM software.

Abstract: An apparatus and a method of synchronizing and interpolating axes of a multi-system are provide. According to the number M of operating systems, the apparatus analyzes a multi-axis process program of N axes to generate M system process programs, wherein, N?M?2. A synchronous code is added to the M system process programs. According to the specifications of the operating systems, a delay time compensation program is added to the M system process programs to ensure the synchronization of the systems therebetween. The characteristics of the controllers and the servos of the operation systems are adjusted to unify the characteristics of the systems. The M system process programs are outputted to the operating systems correspondingly.

Abstract: An apparatus and a method for tuning control parameters are disclosed. The apparatus includes a parameter database, a user interface, a processing unit and a control unit. The parameter database stores several control parameter sets, which are classified into several data groups respectively corresponding to several total machining points. The user interface is for selecting one of the total machining points, and distributing the selected total machining point to at least one machining item to generate distribution data of points. The user interface is further for inputting embryo data. The processing unit selects one of the control parameter sets corresponding to the distribution data of points and the embryo data from the parameter database. The control unit controls a machine tool according to the corresponding one of the control parameter sets.

Abstract: The present invention provides a manufacturing method for a machine tool having a human-machine interface and a program with predetermined manufacturing conditions.

Abstract: A program-converting module for a multi-axis cooperated machine and a program-converting method. Machining programs and mechanism data of a plurality of first machines are input to a first input module. Mechanism data of a plurality of second machines are input to a second input unit. A setting unit sets at least one of the first machines to be a source machine, and sets one of the second machines to be a target machine. A conversion unit uses a kinematical method to convert the machining program of the source machine into a machining program applicable to the target machine based on the mechanism data of the source and target machines, without requiring CAD/CAM software.

Abstract: A method for controlling acceleration and deceleration before interpolating is provided. The method includes steps of previewing and analyzing a processing program to estimate a limitation of a processing velocity and distributing a processing velocity according to the limitation. The step of previewing and analyzing a processing program includes sub-steps of providing the processing program including a pathway formed by plural blocks, unitizing the motion vector of each block into the unit vector ( N ^ i = N _ i ? N _ i ? ) , calculating a length (DVi=?{right arrow over (DV)}i?) of a vector difference in the unit vectors between each block and its next block ({right arrow over (DV)}i={circumflex over (N)}i?{circumflex over (N)}i+1), calculating a sum of the length of the vector difference in a distance from a starting block (S=?DVn), and calculating the limitation of the processing velocity for an end of each block (Vlim) according to an inverse ratio of the sum (1/S).

Abstract: An apparatus and a method for tuning control parameters are disclosed. The apparatus includes a parameter database, a user interface, a processing unit and a control unit. The parameter database stores several control parameter sets, which are classified into several data groups respectively corresponding to several total machining points. The user interface is for selecting one of the total machining points, and distributing the selected total machining point to at least one machining item to generate distribution data of points. The user interface is further for inputting embryo data. The processing unit selects one of the control parameter sets corresponding to the distribution data of points and the embryo data from the parameter database. The control unit controls a machine tool according to the corresponding one of the control parameter sets.

Abstract: A template of a thin-film solar cell includes a substrate and an anodized layer. The anodized layer is formed on the substrate, and includes plural pores, wherein alkali halide precursor is filled into the pores for controlling diffused alkaline content. A preparation for fabricating a template of a thin-film solar cell includes steps of: a) providing a substrate; b) anodizing a surface of the substrate to form an anodized layer with plural pores; and c) filling alkali halide precursor into the pores.