Abstract: A fabrication method of an active device array substrate is disclosed. A first metal material layer, a gate insulation material layer, a channel material layer, a second metal material layer, and a first photoresist layer are formed over a substrate sequentially. The first photoresist layer is patterned with a multi-tone mask to form a first patterned photoresist layer with two thicknesses. A first and second removing processes are performed sequentially using the first patterned photoresist layer as a mask to form a gate, a gate insulation layer, a channel layer, and a source/drain. The first patterned photoresist layer is removed. A passivation layer and a second patterned photoresist layer are formed over the substrate. A third removing process is performed to form a plurality of contact holes. A pixel electrode material layer is formed over the substrate. The second patterned photoresist layer is lifted off to form a pixel electrode.

Abstract: A method and apparatus for creating a generalized response model for a sheet forming machine are provided. Sheet property profiles are measured while the setpoint of an actuator is changed. A response (or change) profile of the sheet property resulting from a setpoint change is calculated. A finite set of critical points are selected from the property response profile. Using the selected critical points, the property response profile is classified in one of a finite number of response types. Under each of the response types, the property response profile is fitted with a plurality of continuous functions associated therewith. These continuous functions are combined to form the response model that minimizes the deviation between the property response and the fitted combination of continuous functions.

Abstract: A fabrication method of an active device array substrate is disclosed. A first metal material layer, a gate insulation material layer, a channel material layer, a second metal material layer, and a first photoresist layer are formed over a substrate sequentially. The first photoresist layer is patterned with a multi-tone mask to form a first patterned photoresist layer with two thicknesses. A first and second removing processes are performed sequentially using the first patterned photoresist layer as a mask to form a gate, a gate insulation layer, a channel layer, and a source/drain. The first patterned photoresist layer is removed. A passivation layer and a second patterned photoresist layer are formed over the substrate. A third removing process is performed to form a plurality of contact holes. A pixel electrode material layer is formed over the substrate. The second patterned photoresist layer is lifted off to form a pixel electrode.

Abstract: A pixel structure having the following structure is provided. A light-shielding layer with a flat layer covering thereon is disposed on a substrate. A channel layer, a data line and a first pad are disposed on the flat layer. A source and a drain partially cover two sides of the channel layer. A gate dielectric layer with a gate, a scan line and a second pad disposed thereon covering the channel layer, the source and the data line exposes the drain and the first pad. A protection layer covering the gate and the scan line exposes the drain, the first and second pads. A patterned transparent conductive layer includes a pixel electrode disposed on the protection layer, a first retain portion disposed on the first pad and a second retain portion disposed on the second pad.

Abstract: A perpendicular magnetic recording medium is disclosed. The perpendicular magnetic recording medium includes a substrate; an intermediate layer disposed on the substrate; at least one soft underlayer (SUL) disposed between the substrate and the intermediate layer, wherein the soft underlayer contacts the intermediate layer and the substrate; and a magnetic recording layer disposed on the intermediate layer.

Abstract: A pixel structure and a fabrication method thereof are provided. A substrate with a light-shielding layer and a flat layer formed thereon is provided. A first photomask process is conducted to pattern a first metal layer and a semiconductor layer for forming a source, a drain, a channel layer, a data line and a first pad. A second photomask process is conducted to pattern the protection layer, the second metal layer and the gate dielectric layer for forming a gate, a scan line and a second pad, and a part of the drain is exposed. A third photomask process is conducted to pattern a transparent conductive layer for forming a pixel electrode.

Abstract: A method for controlling an industrial process, such as a paper machine, is devised to handle multiple manipulated and controlled variables of the process. The method includes making available for selection a plurality of different multivariable sub-control systems for controlling the process. A user interface table is generated and displayed showing configuration information about the plurality of multivariable sub-control systems. A selection of one of the multivariable sub-control systems is received through the user interface and used by the computer system for configuring the multivariable control system and performing control calculation for the multivariable control system.

Abstract: A method and apparatus for generating a comprehensive response model for a sheet forming machine are provided. A finite number of critical points and a response type are used to create a continuous response profile for each actuator zone. The continuous response profile for each actuator zone is discretized into a discrete response profile based on the resolution appropriate for an application. A multi-zone response model for each pair of actuator set and sheet property profile is created from the discretized response profile of the actuator zones in the actuator set. The comprehensive response model for a multivariable sheet-forming machine is created from a collection of multi-zone response models for multiple pairs of actuator sets and sheet property profiles.

Abstract: A method and apparatus for creating a generalized response model for a sheet forming machine are provided. Sheet property profiles are measured while the setpoint of an actuator is changed. A response (or change) profile of the sheet property resulting from a setpoint change is calculated. A finite set of critical points are selected from the property response profile. Using the selected critical points, the property response profile is classified in one of a finite number of response types. Under each of the response types, the property response profile is fitted with a plurality of continuous functions associated therewith. These continuous functions are combined to form the response model that minimizes the deviation between the property response and the fitted combination of continuous functions.

Abstract: A fabrication method of an active device array substrate is disclosed. A first metal material layer, a gate insulation material layer, a channel material layer, a second metal material layer, and a first photoresist layer are formed over a substrate sequentially. The first photoresist layer is patterned with a multi-tone mask to form a first patterned photoresist layer with two thicknesses. A first and second removing processes are performed sequentially using the first patterned photoresist layer as a mask to form a gate, a gate insulation layer, a channel layer, and a source/drain. The first patterned photoresist layer is removed. A passivation layer and a second patterned photoresist layer are formed over the substrate. A third removing process is performed to form a plurality of contact holes. A pixel electrode material layer is formed over the substrate. The second patterned photoresist layer is lifted off to form a pixel electrode.

Abstract: An active device array substrate, having a display region and a peripheral circuit region outside of the display region, is provided. The peripheral circuit region has a terminal region and a narrow-edge region between the terminal region and the display region. The active device array substrate includes a pixel array, multiple electrode lines and a testing device. The pixel array is disposed in the display region. The electrode lines are disposed in the peripheral circuit region and electrically connected with the pixel array. The testing device is disposed in the narrow-edge region for inspecting the active device array substrate. After the inspection, an additional cutting process is needless for removing the testing device, so that the process cost is reduced. A liquid crystal display panel with the above active device array substrate is also provided.

Abstract: A pixel structure and a fabrication method thereof are provided. A substrate with a light-shielding layer and a flat layer formed thereon is provided. A first photomask process is conducted to pattern a first metal layer and a semiconductor layer for forming a source, a drain, a channel layer, a data line and a first pad. A second photomask process is conducted to pattern the protection layer, the second metal layer and the gate dielectric layer for forming a gate, a scan line and a second pad, and a part of the drain is exposed. A third photomask process is conducted to pattern a transparent conductive layer for forming a pixel electrode.

Abstract: A controller to provide base level fiber orientation control of a paper web. The controller achieves one or more indices that are derived from the online measurements of a fiber orientation sensor of the fiber ratio and the fiber angle. The indices are used for control of the sheet forming processes. The controller may be implemented by a single or multi stage fuzzy controller or the combination of fuzzy controllers with non-fuzzy logic controllers.

Abstract: Headbox transient responses for sheet weight and moisture are modeled as a combination of two sets of time constants and dead time delays. One set represents a shorter delay with faster response dynamics, the fast mode weight and moisture responses, and the other models the longer delay with slower dynamics, the slow mode weight and moisture responses. A weight and/or moisture transient model is then formed for headbox changes by combining the fast mode weight and moisture responses and the slow mode weight and moisture responses. Stock weight and moisture dynamic and delay time models are determined for operation of stock flow of the paper making machine and the stock flow is controlled in accordance with the stock weight and/or moisture models and the headbox weight transient and/or moisture transient model to compensate for weight and moisture changes in a web of paper being manufacture which weight and moisture changes result from headbox changes.

Abstract: A controller to provide base level fiber orientation control of a paper web. The controller achieves one or more indices that are derived from the online measurements of a fiber orientation sensor of the fiber ratio and the fiber angle. The indices are used for control of the sheet forming processes. The controller may be implemented by a single or multi stage fuzzy controller or the combination of fuzzy controllers with non-fuzzy logic controllers.

Abstract: The CD profile of a web of material being produced is monitored and controlled to update CD control settings on-line so that changes in the operation of a machine manufacturing the web can be corrected before significant profile deviations from a desired CD profile target result. Detected variances in the profile that satisfy a search criteria initiate searches for improved CD control settings. The CD control of the present application recognizes CD actuator mapping misalignments, determines improved CD control settings and applies the improved CD control settings to fine tune a CD controller and thereby improve upon or correct mapping misalignments. The CD control of the present application also recognizes non-smoothness of the setpoints of the CD actuators and controls the smoothness of the setpoints. Recognition and correction of either CD actuator mapping misalignments or CD actuator setpoint smoothness or both can be performed by the automated optimization of the present application.

Abstract: Multiple two-dimensional variation patterns are extracted from two-dimensional sheet measurement data of sheet material being manufactured with the variation patterns being classified to identify the causes of the extracted patterns. The extracted two-dimensional variation patterns are identified with the elements or components of the process or machine which caused the patterns. The machine components which cause the variation patterns can then be adjusted and/or controlled so that the patterns can be reduced or substantially eliminated in sheets of material produced by the machine. In addition to adjustment and/or control of the process or machine producing the sheet of material, the extracted variation patterns can be used as new representations of sheet quality, process or machine quality and the patterns will provide more in-depth understanding for operators of the machine.

Abstract: A plurality of random probing sequences are used to perturb a corresponding plurality of cross-machine direction (CD) actuators of a web manufacturing machine. The web of sheet material is measured as the CD actuators are perturbed. The global process machine direction (MD) dynamics is estimated and a CD response is estimated for each of the plurality of CD actuators using the plurality of random probing sequences, measurements of the web of sheet material and the estimated global process MD dynamics. The estimated global process MD dynamics and the estimated CD responses form 2D responses for the plurality of CD actuators. To refine the 2D responses, the estimates of global process MD dynamics, and CD responses for each of the plurality of CD actuators are iterated. The actuator dynamics of the plurality of CD actuators may also be estimated and used in the estimates of the global process MD dynamics of the plurality of CD actuators and CD responses for each of the plurality of CD actuators.

Abstract: A new two-dimensional (2D) variation modeling and control technique for a machine producing a web of material, such as paper, uses functional transformation with basis functions which are wavelets, preferably wavelets derived from and closely resembling the responses generated by actuation of cross direction (CD) actuators of the machine. By using the disclosed functional transformation together with carefully selected basis functions, memory and real-time processing requirements are substantially reduced so that practical controls can be readily implemented. In addition, the functional transformation technique of the present application expands conventional CD correction to also correct for a portion of the residual variations which, until now, have remained uncorrected. The new 2D profile is treated as the superposition of two main components: a pure machine direction (MD) variation component and a two-dimensional sheet variation component.

Abstract: Sensors are spaced along an extended process from its beginning end to its finishing end. Each sensor is associated with a parallel inferential control loop (PICL) and generates an actual measurement signal for a portion of the process. Each PICL includes a process model emulating the sensed portion of the process with the process models being cascaded from the beginning end through and including the finishing end. Each PICL generates a loop control signal corresponding to its sensed portion of process with the loop control signals from the PICLs being summed to generate a total control signal which controls a control element at the beginning end of the process and also is received by the first or most up-stream process model. The process models produce expected measurement signals which are combined with the actual measurement signals to determine difference signals for each PICL which includes a reset model emulating the sensed portion of the process.