Patents by Inventor Shih-Chun Chen
Shih-Chun Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12002906Abstract: The present disclosure provides a semiconductor device and a semiconductor component. The semiconductor device includes an active structure, a ring-shaped semiconductor contact layer, a first electrode, and an insulating layer. The active structure has a first-conductivity-type semiconductor layer, a second-conductivity-type semiconductor layer, and an active layer located between the first-conductivity-type semiconductor layer and the second-conductivity-type semiconductor layer. The ring-shaped semiconductor contact layer is located on the second-conductivity-type semiconductor layer and having a first inner sidewall and a first outer sidewall. The first electrode has an upper surface and covers the ring-shaped semiconductor contact layer. The insulating layer covers the first electrode and the active structure and has a second inner sidewall and a second outer sidewall. The first inner sidewall is not flush with the second inner sidewall in a vertical direction.Type: GrantFiled: August 19, 2021Date of Patent: June 4, 2024Assignee: EPISTAR CORPORATIONInventors: Hao-Chun Liang, Wei-Shan Yeoh, Yao-Ning Chan, Yi-Ming Chen, Shih-Chang Lee
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Patent number: 12002768Abstract: A semiconductor package and a manufacturing method for the semiconductor package are provided. The semiconductor package includes a molded semiconductor device, a first redistribution structure, and conductive vias. The molded semiconductor device comprises a sensor die with a first surface and a second surface opposite the first surface, wherein the sensor die has an input/output region and a sensing region at the first surface. The first redistribution structure is disposed on the first surface of the sensor die, wherein the first redistribution structure covers the input/output region and exposes the sensing region, and the first redistribution structure comprises a conductive layer having a redistribution pattern and a ring structure. The redistribution pattern is electrically connected with the sensor die. The ring structure surrounds the sensing region and is separated from the redistribution pattern, wherein the ring structure is closer to the sensing region than the redistribution pattern.Type: GrantFiled: August 27, 2021Date of Patent: June 4, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yu-Chih Huang, Chih-Hao Chang, Po-Chun Lin, Chun-Ti Lu, Zheng-Gang Tsai, Shih-Wei Chen, Chia-Hung Liu, Hao-Yi Tsai, Chung-Shi Liu
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Publication number: 20240170537Abstract: Semiconductor structures are provided. The semiconductor structure includes a substrate and nanostructures formed over the substrate. In addition, the nanostructures includes channel regions and source/drain regions. The semiconductor structure further includes a gate structure vertically sandwiched the channel regions of the nanostructures and a contact wrapping around and vertically sandwiched between the source/drain regions of the nanostructures.Type: ApplicationFiled: February 1, 2024Publication date: May 23, 2024Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ta-Chun LIN, Kuo-Hua PAN, Jhon-Jhy LIAW, Chao-Ching CHENG, Hung-Li CHIANG, Shih-Syuan HUANG, Tzu-Chiang CHEN, I-Sheng CHEN, Sai-Hooi YEONG
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Publication number: 20240162308Abstract: The present disclosure provides a semiconductor structure with having a source/drain feature with a central cavity, and a source/drain contact feature formed in central cavity of the source/drain region, wherein the source/drain contact feature is nearly wrapped around by the source/drain region. The source/drain contact feature may extend to a lower most of a plurality semiconductor layers.Type: ApplicationFiled: February 9, 2023Publication date: May 16, 2024Inventors: Pin Chun SHEN, Che Chia CHANG, Li-Ying WU, Jen-Hsiang LU, Wen-Chiang HONG, Chun-Wing YEUNG, Ta-Chun LIN, Chun-Sheng LIANG, Shih-Hsun CHANG, Chih-Hao CHANG, Yi-Hsien CHEN
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Patent number: 11979593Abstract: Method and apparatus for affine CPMV or ALF refinement are mentioned. According to this method, statistical data associated with the affine CPMV or ALF refinement are collected over a picture area. Updated parameters for the affine CPMV refinement or the ALF refinement are then derived based on the statistical data, where a process to derive the updated parameters includes performing multiplication using a reduced-precision multiplier for the statistical data. The reduced-precision multiplier truncates at least one bit of the mantissa part. In another embodiment, the process to derive the updated parameters includes performing reciprocal for the statistical data using a lookup table with (m?k)-bit input by truncating k bits from the m-bit mantissa part, and contents of the lookup table includes m-bit outputs. m and k are positive integers.Type: GrantFiled: April 25, 2022Date of Patent: May 7, 2024Assignee: MEDIATEK INC.Inventors: Shih-Chun Chiu, Tzu-Der Chuang, Ching-Yeh Chen, Chun-Chia Chen, Chih-Wei Hsu, Yu-Wen Huang
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Patent number: 11974367Abstract: A lighting device includes a light board and a light dimmer circuit. The light board includes multiple first light emitting elements and second light emitting elements. The first light emitting elements are disposed in a first area of the light board. The second light emitting elements are disposed in a second area of the light board. The light dimmer circuit is configured to drive the second light emitting elements to generate flickering lights from the second area of the light board, and is configured to drive the first light emitting elements to generate non-flickering lights from the first area of the light board.Type: GrantFiled: October 4, 2022Date of Patent: April 30, 2024Assignee: DELTA ELECTRONICS, INC.Inventors: Chih-Hsien Wang, Ming-Chieh Cheng, Po-Yen Chen, Shih-Chieh Chang, Kuan-Hsien Tu, Xiu-Yi Lin, Ling-Chun Wang
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Patent number: 11973021Abstract: A semiconductor device includes a first metal layer, a second metal layer, and an inter-metal dielectric layer disposed between the first metal layer and the second metal layer. The inter-metal dielectric layer includes: a first dielectric layer disposed on the first metal layer and in direct contact with the first metal layer, wherein the first dielectric layer has a stress value less than 0; a second dielectric layer disposed on the first dielectric layer, wherein the second dielectric layer has a stress value greater than 0; and a third dielectric layer disposed on the second dielectric layer, wherein the third dielectric layer has a stress value less than 0. A thickness of the third dielectric layer is greater than a thickness of the second dielectric layer, and the thickness of the second dielectric layer is greater than a thickness of the first dielectric layer.Type: GrantFiled: September 17, 2021Date of Patent: April 30, 2024Assignee: Vanguard International Semiconductor CorporationInventors: Kai-Chun Chen, Shih-Ming Tseng, Hsing-Chao Liu, Hsiao-Ying Yang
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Publication number: 20240135244Abstract: The disclosure provides a method for tree-based machine learning model reduction and an electronic device using the same. A boosting tree model including multiple subtrees is obtained. Subtree importance of each of the subtrees is determined according to feature importance information respectively corresponding to multiple model features of the boosting tree model. At least one continuous tree subset is extracted from the subtrees according to the subtree importance of each of the subtrees. The at least one continuous tree subset includes at least one of the subtrees. At least one reduced boosting tree model of the boosting tree model is obtained according to the at least one continuous tree subset.Type: ApplicationFiled: December 7, 2022Publication date: April 25, 2024Applicant: Industrial Technology Research InstituteInventors: Shih-Chang Chen, Chao-Chun Yeh
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Patent number: 11967596Abstract: An integrated circuit includes a first-voltage power rail and a second-voltage power rail in a first connection layer, and includes a first-voltage underlayer power rail and a second-voltage underlayer power rail below the first connection layer. Each of the first-voltage and second-voltage power rails extends in a second direction that is perpendicular to a first direction. Each of the first-voltage and second-voltage underlayer power rails extends in the first direction. The integrated circuit includes a first via-connector connecting the first-voltage power rail with the first-voltage underlayer power rail, and a second via-connector connecting the second-voltage power rail with the second-voltage underlayer power rail.Type: GrantFiled: August 5, 2021Date of Patent: April 23, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Guo-Huei Wu, Shih-Wei Peng, Wei-Cheng Lin, Hui-Zhong Zhuang, Chih-Liang Chen, Li-Chun Tien, Lee-Chung Lu
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Patent number: 11942750Abstract: A laser inspection system is provided. A laser source emits a laser with a first spectrum and the laser is transmitted by a first optical fiber. A gain optical fiber doped with special ions is connected to the first optical fiber, and a light detector is provided around the gain optical fiber. When the laser with the first spectrum passes through the gain optical fiber, the gain optical fiber absorbs part of the energy level of the laser with the first spectrum, so that the laser with the first spectrum is converted to generate light with a second spectrum based on the frequency conversion phenomenon. The light detector detects the intensity of the light with the second spectrum, so that the power of the laser source can be obtained.Type: GrantFiled: November 23, 2020Date of Patent: March 26, 2024Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTEInventors: Yi-Chi Lee, Hsin-Chia Su, Shih-Ting Lin, Yu-Cheng Song, Fu-Shun Ho, Chih-Chun Chen
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Patent number: 11934916Abstract: An electronic device includes a pair of depletion gates, an accumulation gate, and a conductive resonator. The depletion gates are spaced apart from each other. The accumulation gate is over the depletion gates. The conductive resonator is over the depletion gates and the accumulation gate. The conductive resonator includes a first portion, a second portion, and a third portion. The first portion and the second portion are on opposite sides of the accumulation gate. The third portion interconnects the first and second portions of the conductive resonator and across the depletion gates. A bottom surface of the first portion of the conductive resonator is lower than a bottom surface of the accumulation gate.Type: GrantFiled: July 8, 2021Date of Patent: March 19, 2024Assignees: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD., NATIONAL TAIWAN UNIVERSITYInventors: Jiun-Yun Li, Shih-Yuan Chen, Yao-Chun Chang, Ian Huang, Chiung-Yu Chen
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Patent number: 11923886Abstract: An antenna device and a method for configuring the same are provided. The antenna device includes a grounding metal, a grounding part, a radiating part, a feeding part, a proximity sensor, and a sensing metal. The radiating part is electrically connected to the grounding metal through the grounding part. The feeding part is coupled to the grounding metal through a feeding point. The sensing metal is electrically connected to the proximity sensor. The sensing metal is separated from the radiating part at a distance. The distance is less than or equal to one thousandth of a wavelength corresponding to an operating frequency of the antenna device.Type: GrantFiled: August 27, 2021Date of Patent: March 5, 2024Assignee: COMPAL ELECTRONICS, INC.Inventors: Jhih-Ciang Chen, Shih-Chia Liu, Yen-Hao Yu, Li-Chun Lee, Yan-Ming Lin, Jui-Hung Lai
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Patent number: 11923413Abstract: Semiconductor structures are provided. The semiconductor structure includes a substrate and nanostructures formed over the substrate. The semiconductor structure further includes a gate structure surrounding the nanostructures and a source/drain structure attached to the nanostructures. The semiconductor structure further includes a contact formed over the source/drain structure and extending into the source/drain structure.Type: GrantFiled: February 7, 2022Date of Patent: March 5, 2024Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Ta-Chun Lin, Kuo-Hua Pan, Jhon-Jhy Liaw, Chao-Ching Cheng, Hung-Li Chiang, Shih-Syuan Huang, Tzu-Chiang Chen, I-Sheng Chen, Sai-Hooi Yeong
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Publication number: 20240073555Abstract: The present disclosure discloses an image processing apparatus having lens color-shading correction mechanism. A first and a second calibration circuits perform lens color-shading correction on an input image according to a first and a second calibration parameters to generate a first and a second calibrated images. A first and a second statistic circuits perform statistic on the first and the second calibrated images to generate a first and a second statistic results.Type: ApplicationFiled: July 20, 2023Publication date: February 29, 2024Inventors: SHENG-KAI CHEN, HUI-CHUN LIEN, WEN-TSUNG HUANG, SHIH-HSIANG YEN, SZU-PO HUANG
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Patent number: 11731413Abstract: An attaching apparatus, an intermediary mechanism thereof, and an attaching method are provided. The intermediary mechanism is provided for being selectively arranged between a pressing mechanism and a carrying mechanism. The intermediary mechanism includes a frame, a deformable sheet fixed on the frame, and an adhesive layer disposed on the deformable sheet. The frame is provided for being fastened to one of the pressing mechanism and the carrying mechanism. The adhesive layer is provided for adhering at least one attaching object onto one side of the deformable sheet facing the carrying mechanism. The deformable sheet is configured to be gradually deformed toward the carrying mechanism by being pressed with the pressing mechanism, so that the at least one attaching object is abutted against an attached object on the carrying mechanism.Type: GrantFiled: September 30, 2019Date of Patent: August 22, 2023Assignee: MIRLE AUTOMATION CORPORATIONInventors: Yen-Dao Lee, Chun-Chieh Lu, Shih-Chun Chen
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Patent number: 11658046Abstract: Batch semiconductor packaging structures with back-deposited shielding layer and manufacturing method are provided. A grid having multiple frames is glued on an adhesive substrate. Multiple semiconductor devices respectively align with corresponding frames and are stuck on the adhesive substrate. Then a metal layer covers the semiconductor devices and the grid. A distance between four peripheries of a bottom of each semiconductor device and the corresponding frame is smaller than a distance between the bottom and the adhesive substrate, so that the a portion of the metal layer extended to the peripheries of the bottom is effectively reduced during forming the metal layer. After the semiconductor devices are picked up, no metal scrap is remined thereon. Therefore, the adhesive substrate does not need to form openings in advance and is reusable. The grid is also reusable so the manufacturing cost of the present invention is decreased.Type: GrantFiled: November 10, 2020Date of Patent: May 23, 2023Assignee: Powertech Technology Inc.Inventors: Shih-Chun Chen, Sheng-Tou Tseng, Kun-Chi Hsu, Chin-Ta Wu, Ting-Yeh Wu
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Patent number: 11587808Abstract: A chip carrier device includes a frame, a chip support and a limiter. The chip support is disposed on the frame, and includes a supporting film for chips to be adhered thereto. A peripheral portion of the supporting film is attached to a surrounding frame part of the frame. A crossing portion of the supporting film passes through a center of the supporting film, and interconnects two opposite points of the peripheral portion. The supporting film is formed with through holes. The limiter includes a limiting part that interconnects two opposite points of the surrounding frame part, that is positioned corresponding to the crossing portion, and that is positioned on one side of the supporting film where the chips are to be arranged.Type: GrantFiled: August 20, 2020Date of Patent: February 21, 2023Assignee: Powertech Technology Inc.Inventors: Shih-Chun Chen, Sheng-Tou Tseng, Kun-Chi Hsu, Chin-Ta Wu, Ying-Lin Chen, Ting-Yeh Wu
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Patent number: 11410945Abstract: A semiconductor package having a partial outer metal layer and packaging method thereof is disclosed. In the method, a specific packaging substrate or a specific positioning plate is used to package multiple semiconductor devices and a partial outer metal layer is quickly formed on an encapsulation of each semiconductor device in the same step.Type: GrantFiled: November 10, 2020Date of Patent: August 9, 2022Assignee: Powertech Technology Inc.Inventors: Shih-Chun Chen, Sheng-Tou Tseng, Kun-Chi Hsu, Chin-Ta Wu, Ying-Lin Chen, Ting-Yeh Wu
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Publication number: 20220161538Abstract: An attaching apparatus, an intermediary mechanism thereof, and an attaching method are provided. The intermediary mechanism is provided for being selectively arranged between a pressing mechanism and a carrying mechanism. The intermediary mechanism includes a frame, a deformable sheet fixed on the frame, and an adhesive layer disposed on the deformable sheet. The frame is provided for being fastened to one of the pressing mechanism and the carrying mechanism. The adhesive layer is provided for adhering at least one attaching object onto one side of the deformable sheet facing the carrying mechanism. The deformable sheet is configured to be gradually deformed toward the carrying mechanism by being pressed with the pressing mechanism, so that the at least one attaching object is abutted against an attached object on the carrying mechanism.Type: ApplicationFiled: September 30, 2019Publication date: May 26, 2022Inventors: YEN-DAO LEE, CHUN-CHIEH LU, SHIH-CHUN CHEN
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Patent number: D1029919Type: GrantFiled: December 11, 2019Date of Patent: June 4, 2024Assignee: QUANTA COMPUTER INC.Inventors: Jyun-Jie Chen, Yen-Chun Chou, Shih-Yun Lee, Gwo-Chyuan Chen