Patents by Inventor Shihei Motofuji

Shihei Motofuji has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240059644
    Abstract: Provided is a compound (Z) represented by the formula (1) or (2) below. In the formulas (1) and (2), Xs in each of the formulas (1) and (2) are each independently a carboxy group, a carboxylate group, or a monovalent group represented by the formula (3); at least one of Xs in each of the formulas (1) and (2) is a carboxy group or a carboxylate group; and at least one of Xs in each of the formulas (1) and (2) is a monovalent group represented by the formula (3) —C(O)—Y-(AO)n—R (3). In the formula (3), —Y— is —O—, —NH—, or —S—; A is a C2-C4 alkylene group; R is a hydrogen atom or a C1-C15 monovalent hydrocarbon group in which a hydrogen atom is optionally substituted with a C1-C10 alkoxy group; n is an integer of 4 to 1000; at least one of n As is an ethylene group; and when the formulas (1) and (2) each have multiple monovalent groups represented by the formula (3), each of —Y—, A, R, and n is the same or different among the monovalent groups.
    Type: Application
    Filed: December 21, 2021
    Publication date: February 22, 2024
    Applicants: SANYO CHEMICAL INDUSTRIES, LTD., JUNTENDO EDUCATIONAL FOUNDATION
    Inventors: Yuta MURAKAMI, Kenichiro NAKAI, Nozomi OTA, Shihei MOTOFUJI, Tetsuya NAKAMURA, Yuka MATSUMOTO
  • Patent number: 11299587
    Abstract: The present invention provides a raw material for bulk drugs and a pharmaceutical additive which provide excellent formulation stability and excellent over-time stability of drug efficacy when used to modify a bulk drug, a polypeptide, a bioactive protein, an enzyme, and the like. The present invention relates to a raw material for bulk drugs or a pharmaceutical additive, containing: a polyether composition (A) represented by formula (1), wherein the polyether composition (A) has a unimodal molecular weight distribution, the polyether composition (A) has a ratio (Mw/Mn) of the weight average molecular weight (Mw) to the number average molecular weight (Mn) of 1.
    Type: Grant
    Filed: December 21, 2018
    Date of Patent: April 12, 2022
    Assignee: SANYO CHEMICAL INDUSTRIES, LTD.
    Inventors: Shihei Motofuji, Kenichiro Nakai, Kyosuke Michigami, Itsuka Matsumoto
  • Publication number: 20210363300
    Abstract: The present invention provides a raw material for bulk drugs and a pharmaceutical additive which provide excellent formulation stability and excellent over-time stability of drug efficacy when used to modify a bulk drug, a polypeptide, a bioactive protein, an enzyme, and the like. The present invention relates to a raw material for bulk drugs or a pharmaceutical additive, containing: a polyether composition (A) represented by formula (1), wherein the polyether composition (A) has a unimodal molecular weight distribution, the polyether composition (A) has a ratio (Mw/Mn) of the weight average molecular weight (Mw) to the number average molecular weight (Mn) of 1.
    Type: Application
    Filed: December 21, 2018
    Publication date: November 25, 2021
    Applicant: SANYO CHEMICAL INDUSTRIES, LTD.
    Inventors: Shihei MOTOFUJI, Kenichiro NAKAI, Kyosuke MICHIGAMI, Itsuka MATSUMOTO
  • Patent number: 8853290
    Abstract: Provided is a photosensitive composition which can be cured with low energy consumption, even when a substance (such as a colorant) that attenuates or shades an illumination light is contained in a high concentration or even when the photosensitive composition is in the form of a thick film. Specifically provided is a photosensitive composition which comprises the following four components: (1) a radical initiator (A); (2) an acid generator (B) or a base generator (C); (3) a polymerizable substance (D); and (4) a colorant (E), a metal oxide powder (F), or a metal powder (G).
    Type: Grant
    Filed: June 1, 2010
    Date of Patent: October 7, 2014
    Assignee: Sanyo Chemical Industries, Ltd.
    Inventors: Shihei Motofuji, Shintaro Higuchi, Atsushi Shiraishi, Takao Mukai, Megumu Sakakibara
  • Publication number: 20140045966
    Abstract: The photosensitive composition of the present invention includes: (1) a radical initiator (A); (2) an acid generator (B) and/or a base generator (C); and (3) a polymerizable substance (D), wherein at least one of the radical initiator (A), the acid generator (B) and the base generator (C) are to generate an active species (H) on exposure to active rays, the active species (H) reacting with the radical initiator (A), the acid generator (B) or the base generator (C) to generate another active species (I), the active species (I) initiating polymerization of the polymerizable substance (D), the active species (H) or (I) is an acid or a base, and the photosensitive composition contains substantially no colorants, metal oxide powder, or metallic powder.
    Type: Application
    Filed: March 6, 2012
    Publication date: February 13, 2014
    Inventors: Shihei Motofuji, Shintaro Higuchi, Hironobu Tokunaga, Takao Mukai, Takeshi Otaka, Yusuke Mizuno, Yasuhiro Shindo, Eiji Matsumoto
  • Publication number: 20120142806
    Abstract: Provided is a photosensitive composition which can be cured with low energy consumption, even when a substance (such as a colorant) that attenuates or shades an illumination light is contained in a high concentration or even when the photosensitive composition is in the form of a thick film. Specifically provided is a photosensitive composition which comprises the following four components: (1) a radical initiator (A); (2) an acid generator (B) or a base generator (C); (3) a polymerizable substance (D); and (4) a colorant (E), a metal oxide powder (F), or a metal powder (G).
    Type: Application
    Filed: June 1, 2010
    Publication date: June 7, 2012
    Applicant: SANYO CHEMICAL INDUSTRIES, LTD.
    Inventors: Shihei Motofuji, Shintaro Higuchi, Atsushi Shiraishi, Takao Mukai, Megumu Sakakibara