Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.

Abstract: Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.

Abstract: A method for optical metrology of a sample, the method may include illuminating areas of the sample by sets of pulses of different wavelengths, during a movement of a variable speed of the sample; collecting light reflected from the sample, as a result of the illuminating, to provide sets of frames, each set of frames comprises partially overlapping frames associated with the different wavelengths; and processing the frames to provide optical metrology results indicative of one or more evaluated parameters of elements of the areas of the sample; wherein the processing is based on a mapping between the sets of frames and reference measurements obtained by an other optical metrology process that exhibits a higher spectral resolution than a spectral resolution obtained by the illuminating and the collecting.

Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.

Abstract: A method, a system, and a non-transitory computer readable medium for accurate Raman spectroscopy. The method may include executing at least one iteration of the steps of: (i) performing, by an optical measurement system, a calibration process that comprises (a) finding a misalignment between a region of interest defined by a spatial filter, and an impinging beam of radiation that is emitted from an illuminated area of a sample, the impinging beam impinges on the spatial filter; and (b) determining a compensating path of propagation of the impinging beam that compensates the misalignment; and (ii) performing a measurement process, while the optical measurement system is configured to provide the compensating path of propagation of the impinging beam, to provide one or more Raman spectra.

Abstract: A measurement system is presented configured for integration with a processing equipment for applying optical measurements to a structure.

Abstract: Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.

Abstract: Optical apparatus includes an image sensor and an optical assembly, which is configured to focus optical radiation via an aperture stop onto the image sensor. The optical assembly includes a plurality of optical surfaces, consisting of a first, curved surface through which the optical radiation enters the assembly, a final surface through which the rays exit the assembly toward the image sensor, and at least two intermediate surfaces between the first and final surfaces. An interference filter, which has a center wavelength and a passband no greater than 4% of the center wavelength, and includes a coating formed on one of the optical surfaces. All rays of the optical radiation passing through the aperture stop are incident on the coating over a range of incidence angles with a half-width that is no greater than three fourths of the numerical aperture of the optical assembly.

Abstract: Optical apparatus includes a matrix of light sources arranged on a substrate with a predetermined, uniform spacing between the light sources. A beam homogenizer includes a first optical surface, including a first microlens array, which has a first pitch equal to the spacing between the light sources and which is aligned with the matrix so that a respective optical axis of each microlens in the array intercepts a corresponding light source in the matrix and transmits light emitted by the corresponding light source. A second optical surface, including a second microlens array, is positioned to receive and focus the light transmitted by the first microlens array and has a second pitch that is different from the first pitch.

Abstract: Optical apparatus includes an image sensor and an optical assembly, which is configured to focus optical radiation via an aperture stop onto the image sensor. The optical assembly includes a plurality of optical surfaces, consisting of a first, curved surface through which the optical radiation enters the assembly, a final surface through which the rays exit the assembly toward the image sensor, and at least two intermediate surfaces between the first and final surfaces. An interference filter, which has a center wavelength and a passband no greater than 4% of the center wavelength, and includes a coating formed on one of the optical surfaces. All rays of the optical radiation passing through the aperture stop are incident on the coating over a range of incidence angles with a half-width that is no greater than three fourths of the numerical aperture of the optical assembly.

Abstract: Optical apparatus includes an image sensor and an optical assembly, which is configured to focus optical radiation via an aperture stop onto the image sensor. The optical assembly includes a plurality of optical surfaces, consisting of a first, curved surface through which the optical radiation enters the assembly, a final surface through which the rays exit the assembly toward the image sensor, and at least two intermediate surfaces between the first and final surfaces. An interference filter, which has a center wavelength and a passband no greater than 4% of the center wavelength, and includes a coating formed on one of the optical surfaces. All rays of the optical radiation passing through the aperture stop are incident on the coating over a range of incidence angles with a half-width that is no greater than three fourths of the numerical aperture of the optical assembly.

Abstract: Optical apparatus includes a beam source, which is configured to generate an optical beam having a pattern imposed thereon. A projection lens is configured to receive and project the optical beam so as to cast the pattern onto a first area in space having a first angular extent. A field multiplier is interposed between the projection lens and the first area and is configured to expand the projected optical beam so as to cast the pattern onto a second area in space having a second angular extent that is at least 50% greater than the first angular extent.

Abstract: Optical apparatus includes a matrix of light sources arranged on a substrate with a predetermined, uniform spacing between the light sources. A beam homogenizer includes a first optical surface, including a first microlens array, which has a first pitch equal to the spacing between the light sources and which is aligned with the matrix so that a respective optical axis of each microlens in the array intercepts a corresponding light source in the matrix and transmits light emitted by the corresponding light source. A second optical surface, including a second microlens array, is positioned to receive and focus the light transmitted by the first microlens array and has a second pitch that is different from the first pitch.

Abstract: Optical apparatus includes an image sensor and an optical assembly, which is configured to focus optical radiation via an aperture stop onto the image sensor. The optical assembly includes a plurality of optical surfaces, consisting of a first, curved surface through which the optical radiation enters the assembly, a final surface through which the rays exit the assembly toward the image sensor, and at least two intermediate surfaces between the first and final surfaces. An interference filter, which has a center wavelength and a passband no greater than 4% of the center wavelength, and includes a coating formed on one of the optical surfaces. All rays of the optical radiation passing through the aperture stop are incident on the coating over a range of incidence angles with a half-width that is no greater than three fourths of the numerical aperture of the optical assembly.

Abstract: The present invention provides a projection display comprising an illumination system comprising at least one laser source unit and configured and operable for producing one or more light beams; a spatial light modulating (SLM) system accommodated at output of the illumination system and comprising one or more SLM units for modulating light incident thereon in accordance with image data; and a light projection optics for imaging modulated light onto a projection surface.

Abstract: An optical device (300) is disclosed. The optical device (300) comprises a planar substrate (316) formed with an input optical element (310) for receiving and redirecting light for propagation of the light within the substrate (316), and a left and a right output optical element (312, 314) for receiving light propagating within the substrate (316) and coupling the light out of the substrate (316). In an embodiment of the invention, the device comprises a mounting member (330) for mounting the substrate (316) in front of a face of a viewer such that the substrate is slanted at a tilt angle with respect to a line of sight of the viewer and the left and the right output optical elements (312, 314) respectively provide the light to a left eye (25) and a right eye of the viewer.

Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.

Abstract: A method and apparatus for reducing speckle during inspection of articles used in the manufacture of semiconductor devices, including wafers, masks, photomasks, and reticles. The coherence of a light beam output by a coherent light source, such as a pulsed laser, is reduced by disposing elements in a light path. Examples of such elements include optical fiber bundles; optical light guides; optical gratings; an integrating sphere; and an acousto-optic modulator. These various elements may be combined as desired, such that light beams output by the element combinations have optical path length differences that are greater than a coherence length of the light beam output by the coherent light source.