Abstract: Disclosed is a processing apparatus which can realize highly fine batch pattern film formation for a mask, which is significantly increased in weight according to the demand for increasing the size of an object to be processed, whereby leading to a possibility of reduction in the alignment accuracy of a pattern. The processing apparatus 1 which fixes and processes an object to be processed 300 and a mask 200 includes a base 400 on which the object to be processed 300 and the mask 200 are placed. The processing apparatus 1 further includes second fixing means 101 and first fixing means 102. The second fixing means 101 includes a permanent magnet for use in fixing a mask frame 200a of the mask 200 on the base 400. The first fixing means 102 includes a permanent magnet for use in fixing a mask membranous plane 200b of the Mask 200 on the base 400. The second fixing means 101 and the first fixing means 102a, 102b are mechanisms in which each permanent magnet can move the base 400 in a vertical direction.

Abstract: A vacuum processing apparatus which processes an object to be processed with the use of a mask membrane plane of magnetic material and a mask frame of the magnetic material is characterized in that the mask of the magnetic material is attracted by an electro-permanent magnet that is disposed in an opposite side of the mask with respect to the surface having the object to be processed mounted thereon.

Abstract: The present invention provides a holding mechanism which holds a processing object and a mask including a mask pattern located on the processing object, and a mask frame which supports the mask pattern in a periphery thereof, the mechanism including a base configured to hold, on a holding surface thereof, the processing object and the mask frame, a permanent magnet, arranged along the holding surface of the base, configured to fix the processing object and the mask on the base by magnetically attracting the mask, and a pressing unit which is located on a peripheral portion of the mask pattern, includes a to-be-attracted portion magnetically attracted by the permanent magnet, and is configured to press the peripheral portion of the mask pattern toward the base as the permanent magnet magnetically attracts the to-be-attracted portion.

Abstract: An apparatus comprises a carrier configured to hold a mask containing a magnetic material and a substrate by magnetically attracting the mask via the substrate, and a controller configured to control the carrier, the carrier including a permanent electromagnet and a first contact, the permanent electromagnet including a variable-polarity magnet, a coil electrically connected to the first contact and generates a magnetic field for changing the polarity of the variable-polarity magnet by an electric current supplied via the first contact, and a fixed-polarity magnet. The controller includes a second contact which is in contact with the first contact and supplies an electric current to the coil via the first contact, a sensor unit which senses a contact state between the first contact and the second contact, and a current supply unit which supplies an electric current to the coil via the first contact and the second contact.

Abstract: The present invention provides a processing apparatus including a processing unit configured to process a processing object in a processing chamber by bringing a mask into contact with the processing object at a predetermined position, a base configured to hold the processing object on a holding surface, a structure configured to connect the base in a portion opposite to the holding surface of the base, and a driving unit configured to change a processing position of the processing object by pivoting the structure about a rotation shaft parallel to the holding surface of the base, the processing unit including an operation unit configured to perform, at an identical position, a fixing process and a release process, and a deposition processing unit configured to perform a deposition process on the processing object while the mask is in contact with the processing object.

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: A display substrate manufacturing method includes a placing step of placing a dummy substrate on a clamping surface, an evacuating step of evacuating the interior of a space formed between the clamping surface and dummy substrate, in order to bring the dummy substrate into tight contact with the clamping surface, a heating step of heating a base in order to facilitate removing, from the clamping surface, foreign particles sticking to the clamping surface, a transferring step of transferring the foreign particles sticking to the clamping surface from the clamping surface to the dummy substrate in tight contact with the clamping surface, and a removing step of removing, from the clamping surface, the dummy substrate to which the foreign particles are transferred in the transferring step.

Abstract: A holding system, provided on a movable stage, for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.

Abstract: Disclosed is a holding system for holding an object from the above, against gravity, and it includes at least one holding portion adapted to be in contact with the object, to hold the object from the above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.

Abstract: A holding system for holding an object from above, against gravity. The holding system includes at least one holding portion adapted to be in contact with the object, to hold the object from above, at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto, and a gap measuring unit for measuring a gap between the object and the at least one attracting portion. The attraction force of the attracting portion is controlled on the basis of the measurement made by the gap measuring unit.

Abstract: A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

Abstract: In a method of manufacturing a hermetically sealed container with a pair of substrates caused to undergo joining in an atmosphere of reduced pressure, one side of one substrate is introduced into the atmosphere of reduced pressure in a state of having undergone joining to the other substrate, and spacing between the other side of that one substrate and the other substrate is widened in the atmosphere of reduced pressure and thereby spacing between the both substrates are released in the atmosphere of reduced pressure so as to thereby make it easy to form a vacuum container between the both substrate.

Abstract: A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate, and a sensor that identifies an identification sign provided on the plate.

Abstract: A processing apparatus includes a sealed vacuum chamber which contains a processing portion; a pressure controlling system which keeps the internal pressure of the sealed vacuum chamber constant at a predetermined level by exhausting the ambient gas in the sealed vacuum chamber; and an ambient gas recirculating system which recirculates the ambient gas exhausted from the sealed vacuum chamber back into the sealed vacuum chamber; wherein the ambient as recirculated by the ambient gas recirculating system is blown into the sealed vacuum chamber so that a gas flow is generated in a predetermined direction along the processing portion.

Abstract: An electron beam exposure apparatus which exposes a substrate with a predetermined pattern using one or a plurality of electron beams. The apparatus includes a substrate stage on which a substrate is mounted, a transfer stage which drives the substrate stage on an X-Y plane, an electromagnetic actuator which drives the substrate stage in a rotation direction about a Z-axis with respect to the transfer stage, and a measuring system which measures a position of the substrate stage in the rotation direction about the Z-axis using a measuring beam along a direction perpendicular to the plurality of electron beams.

Abstract: Disclosed is a holding system for holding an object from the above, against gravity, and it includes at least one holding portion adapted to be in contact with the object, to hold the object from the above, and at least one attracting portion for attracting a limited portion of the object upwardly, without contact thereto.

Abstract: A substrate holding device includes a base member capable of removably holding a plate having a contact member to come into contact with a substrate. The base member flatten-corrects the plate by suctioning the plate. The substrate holding device further includes a first attracting mechanism that attracts the substrate onto the plate in a status such that the plate is held on the base member, and a second attraction mechanism that attracts the plate onto the base member.

Abstract: A substrate holding device has a base member which removably holds a plate having a contact member to come into contact with a substrate, a first attraction mechanism which attracts the substrate onto the plate, and a second attraction mechanism which attracts the plate onto the base member. In this arrangement, as the plate can be removed, time to remove contaminants is not required, and productivity can be improved. Further, as the plate on a flat plate can be attached/removed, plate exchange can be easily made.