Abstract: A device includes a semiconductor chip and a redistribution layer (RDL) structure connected to the semiconductor chip. The redistribution layer structure comprises a first region including: a first bump connected to the semiconductor chip; a second bump; and a plurality of first redistribution layers connected between the first bump and the second bump. The RDL structure includes a second region laterally surrounding the first region, the second region including a plurality of second redistribution layers. The RDL structure includes an isolation region laterally separating the plurality of first redistribution layers from the plurality of second redistribution layer. The isolation region includes at least one region that is straight, continuous, extends from an upper surface of the redistribution layer structure to a lower surface of the first redistribution layer structure, and has at least a selected width.

Abstract: A semiconductor package, which may correspond to a high-performance computing package, includes an interposer, a substrate, and an integrated circuit device between the interposer and the substrate. The integrated circuit device, which may correspond to an integrated passive device, is attached to the interposer within a cavity of the interposer. Attaching the integrated circuit device within the cavity of the interposer creates a clearance between the integrated circuit device and the substrate. In this way, a likelihood of the integrated circuit device contacting the substrate during a bending and/or a deformation of the semiconductor package is reduced. By reducing the likelihood of such contact, damage to the integrated circuit device and/or the substrate may be avoided to increase a reliability and/or yield of the semiconductor package.

Abstract: A method includes joining a first wafer to a second wafer, forming a first through-via penetrating through the first wafer and further extending into the second wafer, and forming a redistribution line on the first wafer. The redistribution line and the first through-via electrically connect a first conductive feature in the first wafer to a second conductive feature in the second wafer. An electrical connector is formed over the first wafer.

Abstract: A package is provided in accordance with some embodiments. The package includes a substrate including a first conductive via embedded in a first substrate core; a conductive pattern disposed on the first substrate core, wherein the conductive pattern includes a first conductive pad and a second conductive pad; a second substrate core disposed on the first substrate core and the conductive pattern; and a second conductive via disposed in the second substrate core and on the second conductive pad. The package also includes an encapsulant embedded in the second substrate core and in physical contact with the first conductive pad; a first die, including die connectors, embedded in the encapsulant and disposed on the first conductive pad; a redistribution structure disposed on the second conductive via, the die connectors and the encapsulant; and a second die disposed on the redistribution structure.

Abstract: Some implementations described herein provide techniques and apparatuses for a semiconductor package. The semiconductor package, which may correspond to a high performance computing package, includes a reinforcement structure that is embedded in a substrate of the semiconductor package. The reinforcement structure may increase a rigidity of the semiconductor package so that a warpage is reduced and a coplanarity between the substrate and a printed circuit board is maintained during a surface mount process. Reducing the warpage may increase a robustness of connection structures between an interposer and the substrate. Additionally, maintaining the coplanarity reduces a likelihood that connection structures at a bottom surface of the substrate will fail to adequately solder or attach to lands of the printed circuit board during the surface mount process.

Abstract: A semiconductor structure includes an assembly including an interposer, at least one semiconductor die attached to the interposer including interposer bonding pads, and a die-side underfill material portion located between the interposer and the at least one semiconductor die, a packaging substrate including substrate bonding pads, an array of solder material portions bonded to the interposer bonding pads and the substrate bonding pads, a central underfill material portion laterally surrounding a first subset of the solder material portions, and at least one peripheral underfill material portion contacting corner regions of the interposer and a respective surface segment of the central underfill material portion and having a different material composition than the central underfill material portion.

Abstract: A multi-die package includes a plurality of non-active dies among the IC dies included in the multi-die package. The non-active dies may be included to reduce the amount of encapsulant material and/or an underfill material that is used in the multi-die package, which reduces the amount of CTE mismatch in the multi-die package. Moreover, a plurality of non-active dies may be positioned in an adjacent manner between two or more active IC dies. The use of a plurality of non-active dies in a particular area of the multi-die package increases the quantity of gaps in the multi-die package. The increased quantity of gaps in the multi-die package provides an increased amount of area in the multi-die package for stress and strain absorption, and enables more even distribution of stresses and strains in the multi-die package.

Abstract: An interposer for a semiconductor package and a method of fabricating an interposer including a peripheral metal pad surrounding an alignment mark. The alignment mark and the surrounding peripheral metal pad are formed on a first dielectric material layer of the interposer. A second dielectric material layer is located over the first dielectric material layer and at least partially over the peripheral metal pad structure and includes an recess extending around a periphery of the alignment mark. A third dielectric material layer is located over the second dielectric material layer and extends into the recess and contacts the alignment mark, the first dielectric material layer, and optionally a portion of the peripheral metal pad. The peripheral metal pad may enhance the adhesion between the first, second and third dielectric material layers near the alignment mark structure and thereby reduce the likelihood of crack formation.

Abstract: Methods and devices include a chip package structure, including a first semiconductor die, a second semiconductor die, a redistribution structure, and a first underfill material portion located between the redistribution structure and the first semiconductor die and the second semiconductor die. The redistribution structure includes a first redistribution structure portion physically and electrically connected to the first semiconductor die, a second redistribution structure portion physically and electrically connected to the second semiconductor die, and a dummy bump region positioned between and electrically isolated from the first redistribution structure portion and the second redistribution structure portion.

Abstract: A package structure includes an interposer, a die, a conductive terminal and an interconnection structure that is disposed on a first side of the interposer. The die is electrically bonded to the interposer and disposed over the interconnection structure. The conductive terminal is connected to the interposer and the die via a conductive bump. In order to effectively avoid cold joint issues, round or rectangular polyimide structures are first disposed under the bumps to structurally support the bump and sufficiently increase bump height for improved electrical connection and long term reliability of the package structure.

Abstract: A disclosed semiconductor structure may include an interposer, a first semiconductor die electrically coupled to the interposer, a packaging substrate electrically coupled to the interposer, and a capping layer covering one or more of a first surface of the first semiconductor die and a second surface of the packaging substrate. The capping layer may be formed over respective surfaces of each of the first semiconductor die and the packaging substrate. In certain embodiments, the capping layer may be formed only on the first surface of the first semiconductor die and not formed over the package substrate. In further embodiments, the semiconductor structure may include a second semiconductor die, such that the capping layer covers a surface of only one of the first semiconductor die and the second semiconductor die. The semiconductor structure may include a molding compound die frame that is partially or completely covered by the capping layer.

Abstract: A package includes a first package component, which includes a bottom dielectric layer, a micro-bump protruding below the bottom dielectric layer, and a metal pillar protruding below the bottom dielectric layer. The metal pillar has a top width and a bottom width greater than the top width. The package further includes a die underlying and bonding to the micro-bump, a solder region underlying and joining to a bottom surface of the metal pillar, and a second package component underlying the first package component. The second package component includes a conductive feature underlying and joining to the solder region.

Abstract: Semiconductor devices and methods of manufactured are presented in which a first redistribution structure is formed, semiconductor devices are bonded to the first redistribution structure, and the semiconductor devices are encapsulated in an encapsulant. First openings are formed within the encapsulant, such as along corners of the encapsulant, in order to help relieve stress and reduce cracks.

Abstract: A semiconductor package including a lid having one or more heat pipes located on and/or within the lid to provide improved thermal management. A lid for a semiconductor package having one or more heat pipes thermally integrated with the lid may provide more uniform heat loss from the semiconductor package, reduce the risk of damage to the package due to excessive heat accumulation, and may enable the lid to be fabricated using less expensive materials, thereby reducing the costs of a semiconductor package.

Abstract: A package includes a package substrate, the package substrate having a first side and a second side opposite to the first side, a package component bonded to the first side of the package substrate, a front-side warpage control structure attached to the first side of the package substrate, and a backside warpage control structure embedded in the package substrate from the second side of the package substrate. The front-side warpage control structure includes a first disconnected structure and a second disconnected structure laterally separated from each other by a gap. The backside warpage control structure includes a third disconnected structure and a fourth disconnected structure laterally separated from each other.

Abstract: First redistribution interconnect structures having a respective uniform thickness throughout are formed on a top surface of a first adhesive layer over a first carrier wafer. Redistribution dielectric layers and additional redistribution interconnect structures are formed over the first redistribution interconnect structures to provide at least one redistribution structure. A respective set of one or more semiconductor dies is attached to each of the at least one redistribution structure. The first redistribution interconnect structures are physically exposed by removing the first carrier wafer and the first adhesive layer. Fan-out bump structures are formed on the physically exposed first planar surfaces of the first redistribution interconnect structures.

Abstract: In an embodiment, a package including: a redistribution structure including a first dielectric layer and a first conductive element disposed in the first dielectric layer; a first semiconductor device bonded to the redistribution structure, wherein the first semiconductor device includes a first corner; and an underfill disposed over the redistribution structure and including a first protrusion extending into the first dielectric layer of the redistribution structure, wherein the first protrusion of the underfill overlaps the first corner of the first semiconductor device in a plan view.

Abstract: A semiconductor package is fabricated by attaching a first component to a second component. The first component is assembled by forming a first redistribution structure over a substrate. A through via is then formed over the first redistribution structure, and a die is attached to the first redistribution structure active-side down. The second component includes a second redistribution structure, which is then attached to the through via. A molding compound is deposited between the first redistribution structure and the second redistribution structure and further around the sides of the second component.

Abstract: A method includes forming a redistribution structure including metallization patterns; attaching a semiconductor device to a first side of the redistribution structure; encapsulating the semiconductor device with a first encapsulant; forming openings in the first encapsulant, the openings exposing a metallization pattern of the redistribution structure; forming a conductive material in the openings, comprising at least partially filling the openings with a conductive paste; after forming the conductive material, attaching integrated devices to a second side of the redistribution structure; encapsulating the integrated devices with a second encapsulant; and after encapsulating the integrated devices, forming a pre-solder material on the conductive material.

Abstract: A semiconductor structure includes a packaging substrate containing at least one trench located between a first region and a second region, a first chip module bonded to the first region of the packaging substrate through first solder material portions, and a second chip module bonded to the second region of the packaging substrate through second solder material portions. A first underfill material portion laterally surrounds the first solder material portions and extends into a first portion of the at least one trench. A second underfill material portion laterally surrounds the second solder material portions and extends into a second portion of the at least one trench. The at least one trench is used to absorb stress to the underfill material portions.