Patents by Inventor Shin Sugimura

Shin Sugimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Production method for poly(vinyl alcohol)
    Patent number: 11161943
    Abstract: Disclosed is a production method for a poly(vinyl alcohol) having a degree of saponification of 97.0 mol % or more, comprising: a pulverization step of pulverizing a first poly(vinyl alcohol) having a particulate form to obtain a second poly(vinyl alcohol) having an adjusted particle size, and a heating step of heating the second poly(vinyl alcohol).
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: November 2, 2021
    Assignee: Denka Company Limited
    Inventors: Shin Sugimura, Takayuki Oshima
  • PRODUCTION METHOD FOR POLY(VINYL ALCOHOL)
    Publication number: 20200157289
    Abstract: Disclosed is a production method for a poly(vinyl alcohol) having a degree of saponification of 97.0 mol % or more, comprising: a pulverization step of pulverizing a first poly(vinyl alcohol) having a particulate form to obtain a second poly(vinyl alcohol) having an adjusted particle size, and a heating step of heating the second poly(vinyl alcohol).
    Type: Application
    Filed: July 10, 2017
    Publication date: May 21, 2020
    Applicant: DENKA COMPANY LIMITED
    Inventors: Shin SUGIMURA, Takayuki OSHIMA
  • METHOD FOR PURIFYING CHLOROSILANE
    Publication number: 20120148471
    Abstract: A method for purifying a crude chlorosilane containing a boron compound, which is characterized by comprising a step wherein a chlorosilane containing a boron compound is brought into contact with an ion-exchange resin, and a step wherein the chlorosilane containing a boron compound is brought into contact with a silica adsorbent. It is preferable that the crude chlorosilane is brought into contact with the ion-exchange resin first, and then brought into contact with the silica adsorbent. In this connection, a silica gel is preferable as the silica absorbent, and a resin having a functional group represented by the following general formula: —CH2NR1R2 (wherein R1 and the like are as defined in the description) is preferable as the ion-exchange resin.
    Type: Application
    Filed: August 27, 2009
    Publication date: June 14, 2012
    Applicant: Denki Kagaku Kogyo Kabushiki Kaisha
    Inventors: Shin Sugimura, Kazumasa Matsuoto, Yukiko Matsuoto, Mineto Kobayashi, Hidehiro Matsuda, Takashi Matsuzawa
  • METHOD FOR COLLECTION OF HEXACHLORODISILANE AND PLANT FOR THE METHOD
    Publication number: 20120070361
    Abstract: Disclosed is a method for collecting hexachlorodisilane which is produced as a by-product in the production of trichlorosilane from tetrachlorosilane and hydrogen. The method has the steps of: reacting a source gas composed of vaporized trichlorosilane and hydrogen at a temperature ranging from 700 to 1400° C. to yield a reaction product gas; cooling the reaction product gas to a temperature ranging from 30 to 60° C. to yield a cooled condensate liquid containing hexachlorodisilane; and concentrating and collecting a high boiling material containing hexachlorodisilane from the cooled condensate liquid.
    Type: Application
    Filed: March 30, 2009
    Publication date: March 22, 2012
    Applicant: DENKI KAGAKU KOGYO KABUSHIKI KAISHA
    Inventors: Yasufumi Matsuo, Kouichi Takemura, Shin Sugimura