Patents by Inventor Shingo Kawamura

Shingo Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240160344
    Abstract: A lighting device for a vehicle includes a light device disposed in an interior of an automobile, and a touch panel for controlling the light device. The light device is configured such that a light intensity and a chromaticity of the light device is changed according to contact of a detection object with the touch panel or according to action of a detection object on the touch panel.
    Type: Application
    Filed: January 8, 2024
    Publication date: May 16, 2024
    Inventors: Makoto ABE, Satoshi SUZUKI, Kenji KAWAMURA, Shingo TSUJI
  • Publication number: 20240113589
    Abstract: A drive unit is equipped with a rotating electric machine, a transmission, and a cooling structure. The cooling structure includes a first cooling passage configured to cool the rotating electric machine and a second cooling passage configured to cool the transmission. A first cooling passage and a second cooling passage communicate with each other, and a common coolant flows through the first cooling passage and the second cooling passage.
    Type: Application
    Filed: September 25, 2023
    Publication date: April 4, 2024
    Inventors: Yasuhiro Kawamura, Shingo Tanaka
  • Patent number: 9282657
    Abstract: A terminal device is provided that includes a first case; a second case disposed in the terminal device with a gap with respect to the first case; and a transparent member that includes a transparent front-surface-side member bonded to a transparent rear-surface-side member and is disposed in the gap to connect the first case and the second case.
    Type: Grant
    Filed: December 6, 2012
    Date of Patent: March 8, 2016
    Assignees: Sony Corporation, Sony Mobile Communications AB
    Inventors: Hidekazu Miyaoka, Nobuaki Hayashi, Ken Imai, Shingo Kawamura, Takefumi Masuda
  • Publication number: 20110074608
    Abstract: A button-key device includes a casing having an opening extending from a position near one end to a position near another end of the casing, and a pair of strength-maintaining projections projecting in opposite directions from the ends, respectively; a first key-top unit including a projecting section, an extended portion provided at an end of the projecting section facing one of the strength-maintaining projections, and flanges; a second key-top unit including a projecting section, an extended portion provided at an end of the projecting section facing the other strength-maintaining projection, and flanges; a first water-blocking sheet provided on a bottom of the first key-top unit; a second water-blocking sheet provided on a bottom of the second key-top unit and having an overlapping portion overlapping the first water-blocking sheet; and a pressing portion provided on the casing and pressed against the overlapping portion.
    Type: Application
    Filed: September 21, 2010
    Publication date: March 31, 2011
    Inventor: Shingo Kawamura
  • Patent number: 5663000
    Abstract: A hard multilayer film structure comprises a titanium-containing compound layer possessing high wear resistance deposited on a substrate and a silicon-containing hard carbon layer possessing self-lubricating properties, high wear resistance and high resistance to heat. Deposition of these layers is effected by the plasma-enhanced chemical vapor deposition technique. As a raw gas for the deposition of silicon-containing hard carbon layer, the gas containing tetramethyl silane or tetraethyl silane is used. Deposition of the silicon-containing hard carbon layer is carried out at a temperature of not more than 550.degree. C. and a pressure in the range of 0.05 to 0.5 Torr.
    Type: Grant
    Filed: July 14, 1993
    Date of Patent: September 2, 1997
    Assignee: YKK Corporation
    Inventors: Minoru Yamada, Shingo Kawamura
  • Patent number: 5462775
    Abstract: A hard multilayer film structure comprises a titanium-containing compound layer possessing high wear resistance deposited on a substrate and a silicon-containing hard carbon layer possessing self-lubricating properties, high wear resistance and high resistance to heat. Deposition of these layers is effected by the plasma-enhanced chemical vapor deposition technique. As a raw gas for the deposition of silicon-containing hard carbon-layer, the gas containing tetramethyl silane or tetraethyl silane is used. Deposition of the silicon-containing hard carbon layer is carried out at a temperature of not more than 550.degree. C. and a pressure in the range of 0.05 to 0.5 Torr.
    Type: Grant
    Filed: March 7, 1995
    Date of Patent: October 31, 1995
    Assignee: Yoshida Kogyo K.K.
    Inventors: Minoru Yamada, Shingo Kawamura
  • Patent number: 5368939
    Abstract: This present invention provides a hard multilayer coated product comprising a hard wear-resistant titanium compound coating layer, a titanium compound layer having a compositional gradient and a self-lubricating coating layer comprising hard amorphous carbon as the principal component successively formed on the surface of a substrate, the first layer being formed at about 500.degree. C. by the plasma CVD method in a vacuum followed by the formation of the second and third layers at 250.degree. to 400.degree. C. in a vacuum maintained at the same level as above. The hard multilayer coated product is improved in wear-resistance and self-lubricity.
    Type: Grant
    Filed: July 6, 1993
    Date of Patent: November 29, 1994
    Assignee: Yoshida Kogyo K.K.
    Inventors: Shingo Kawamura, Minoru Yamada
  • Patent number: 5260107
    Abstract: This present invention provides a hard multilayer coated product comprising a hard wear-resistant titanium compound coating layer, a titanium compound layer having a compositional gradient and a self-lubricating coating layer comprising hard amorphous carbon as the principal component successively formed on the surface of a substrate, the first layer being formed at about 500.degree. C. by the plasma CVD method in a vacuum followed by the formation of the second and third layers at 250.degree. to 400.degree. C. in a vacuum maintained at the same level as above. The hard multilayer coated product is improved in wear-resistance and self-lubricity.
    Type: Grant
    Filed: March 31, 1992
    Date of Patent: November 9, 1993
    Assignee: Yoshida Kogyo K.K.
    Inventors: Shingo Kawamura, Minoru Yamada
  • Patent number: 5127988
    Abstract: Disclosed is a process for the surface treatment of a conductive material which comprises the steps of disposing a DC electrode having a base material of the conductive material thereon and an RF electrode in a reaction vessel so that the electrodes are parallel to each other; forming a reduced pressure space of a predetermined gas in the vessel; and applying simultaneously a direct current voltage to the DC electrode and a radio-frequency power to the RF electrode so that a surface of the base material is subjected to bombardment treatment under DC discharge and RF discharge. Since the surface treatment of the present invention is effected while causing DC discharge and RF discharge simultaneously, film formation can be made on the thus surface-treated base material with a good adhesion. Further, an abnormal surface layer formed by electric discharge machining can be readily removed without leaving its corner portion and residual tensile stress introduced by electric discharge machining can also be relieved.
    Type: Grant
    Filed: November 30, 1990
    Date of Patent: July 7, 1992
    Assignee: Yoshida Kogyo K.K.
    Inventors: Shingo Kawamura, Minoru Yamada, Mioko Ito, Akira Ohmura, Yoshimasa Yagi