Patents by Inventor Shingo TAKASUGI

Shingo TAKASUGI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Composition for film formation, resist underlayer film and forming method thereof, pattern-forming method and compound
    Patent number: 9581905
    Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.
    Type: Grant
    Filed: December 4, 2015
    Date of Patent: February 28, 2017
    Assignee: JSR CORPORATION
    Inventors: Shin-ya Nakafuji, Fumihiro Toyokawa, Goji Wakamatsu, Shingo Takasugi, Tooru Kimura
  • COMPOSITION FOR FILM FORMATION, RESIST UNDERLAYER FILM AND FORMING METHOD THEREOF, PATTERN-FORMING METHOD AND COMPOUND
    Publication number: 20160085152
    Abstract: A composition for film formation includes a compound represented by formula (1) and a solvent. In the formula (1), R1, R2 and R3 each independently represent a group represented by the formula (a). In the formula (a), RA represents a hydrogen atom, an aryl group, or an alkyl group unsubstituted or substituted with at least one of a hydroxy group and an aryl group. RB represents a single bond or an arylene group. A part or all of hydrogen atoms on an aromatic ring of the aryl group and the arylene group may be substituted with a halogen atom, a hydroxy group, an amino group, a sulfanyl group, or a monovalent organic group having 1 to 20 carbon atoms and not including an aromatic ring.
    Type: Application
    Filed: December 4, 2015
    Publication date: March 24, 2016
    Applicant: JSR CORPORATION
    Inventors: Shin-ya NAKAFUJI, Fumihiro TOYOKAWA, Goji WAKAMATSU, Shingo TAKASUGI, Tooru KIMURA