Patents by Inventor Shinichi Kawasaki

Shinichi Kawasaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6174982
    Abstract: A method for producing polysilanes comprising subjecting a dihalosilane of the general formula (wherein m is 1 to 3; R represents hydrogen atom, alkyl group, aryl group, alkoxy group, amino group or silyl group and two Rs are the same or different in case of m=1, four Rs are the same or at least two of them are different in case of m=2 and six Rs are the same or at least two of them are different in case of m=3; X represents halogen atom) to the action of Mg or Mg alloy in an aprotic solvent in the presence of Li salt and metal halide, thereby producing polysilane represented by the general formula (wherein R is as defined above corresponding to the starting material; n is 2 to 1000).
    Type: Grant
    Filed: June 22, 1999
    Date of Patent: January 16, 2001
    Assignee: Osaka Gas Company Limited
    Inventors: Ryoichi Nishida, Shinichi Kawasaki, Hiroaki Murase
  • Patent number: 5641849
    Abstract: The present invention provides a method for producing polysilane characterized in that starting halosilane is subjected to electrochemical reaction using Mg or Mg alloy as anode, lithium salt as supporting electrolyte and aprotic solvent as solvent, thereby producing polysilane. The present invention affords polysilane in a high yield, whose molecular weight is uniform and high enough to be cast into an excellent thin film, with an ease of handling, safety and a low cost ensured.
    Type: Grant
    Filed: March 20, 1995
    Date of Patent: June 24, 1997
    Assignee: Osaka Gas Company Limited
    Inventors: Ryoichi Nishida, Shinichi Kawasaki, Hiroaki Murase
  • Patent number: 5540830
    Abstract: A method for producing disilane characterized in that halosilane is subjected to electrochemical reaction using Al, Al alloy, Mg, Mg alloy, Cu, Cu alloy, Zn or Zn alloy as anode, lithium salt as supporting electrolyte, Al salt, Fe salt, Mg salt, Zn salt, Sn salt, Co salt, Pd salt, V salt, Cu salt, Ca salt, Na salt or K salt as current carrying aid, and aprotic solvent as solvent, thereby producing disilane.
    Type: Grant
    Filed: March 8, 1995
    Date of Patent: July 30, 1996
    Assignee: Osaka Gas Company Limited
    Inventors: Ryoichi Nishida, Shinichi Kawasaki, Hiroaki Murase
  • Patent number: 5416182
    Abstract: This invention provides(1) a method for producing a silicon network polymer which comprises subjecting a trihalosilane to the electrode reaction using a perchlorate as the electrolyte, an aprotic solvent as the reaction solvent, Mg, Cu or Al as one electrode material and an electronically conductive material which is the same as or different from said one electrode as a counter electrode material with the polarity of electrodes being switched from time to time, and(2) a method for producing a silicon network polymer which comprises subjecting a trihalosilane to concurrent sonication and electrode reaction using a perchlorate as the electrolyte, an aprotic solvent as the reaction solvent, Mg, Cu or Al as one electrode material and an electronically conductive material which is the same as or different from said one electrode as a counter electrode material with the polarity of electrodes being switched from time to time.
    Type: Grant
    Filed: May 18, 1993
    Date of Patent: May 16, 1995
    Assignee: Osaka Gas Company Ltd.
    Inventors: Tatsuya Shono, Shigenori Kashimura, Ryoichi Nishida, Shinichi Kawasaki
  • Patent number: 5120406
    Abstract: The invention provides:(1) a process for preparing a polysilane, comprising subjecting a halosilane to an electrochemical reaction using an anode of magnesium, copper or aluminum;(2) a process for preparing a polysilane, comprising subjecting a halosilane to an electrochemical reaction under sonication using an anode of magnesium, copper or aluminum;(3) a process for preparing a polysilane, comprising subjecting a halosilane to an electrochemical reaction using one electrode of magnesium, copper or aluminum and the other electrode of an electroconductive material which is the same as or different from magnesium, copper or aluminum while changing over the electrode polarity at a specific time interval; and(4) a process for preparing a polysilane, comprising subjecting a halosilane to an electrochemical reaction under sonication using one electrode of magnesium, copper or aluminum and the other electrode of an electroconductive material which is the same as or different from magnesium, copper or aluminum while
    Type: Grant
    Filed: January 18, 1991
    Date of Patent: June 9, 1992
    Assignee: Osaka Gas Company Limited
    Inventors: Tatsuya Shono, Shigenori Kashimura, Ryoichi Nishida, Shinichi Kawasaki