Patents by Inventor Shinichi Li

Shinichi Li has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240079607
    Abstract: A fuel cell includes a gas diffusion layer (GM) situated between a catalyst layer of the fuel cell and a flow field plate of the fuel cell. The GM has a first region and a second region along a thickness direction of the fuel cell. The first region is adjacent to the catalyst layer and has a first thermal conductivity. The second region is adjacent to the flow field plate and has a second thermal conductivity lower than the first thermal conductivity.
    Type: Application
    Filed: January 22, 2021
    Publication date: March 7, 2024
    Inventors: Lei Cheng, Xiaobai Li, Christina Johnston, Bicheng Chen, Rikiya Yoshida, Shinichi Makino, Xu Zhang, John F. Christensen
  • Publication number: 20180005960
    Abstract: Disclosed herein are methods for making a thin film device and/or for reducing warp in a thin film device, the methods comprising applying at least one metal film to a convex surface of a glass substrate, wherein the glass substrate is substantially dome-shaped. Other methods disclosed include methods of determining the concavity of a glass sheet. The method includes determining the orientation of the concavity and measuring a magnitude of the edge lift of the sheet when the sheet is supported by a flat surface and acted upon by gravity. Thin film devices made according to these methods and display devices comprising such thin film devices are also disclosed herein.
    Type: Application
    Filed: January 14, 2016
    Publication date: January 4, 2018
    Inventors: John Steele Abbott, III, Takashi Atsumi, Ahdi El-Kahlout, Yoshiki Goto, Steven Francis Hoysan, Chien Yu Hsu, Shinichi Li, Kiat Chyai Kang, Yoskiaki Kato, Shawn Rachelle Markham, Timothy John O'Driscoll, Christian Lucien Stauter
  • Publication number: 20020022364
    Abstract: The invention provides a method for forming a metal film for a thin film device so as to have certain gentle taper angles. The method is an improved fine work method to produce metal films such as light shutter films for thin film devices through the combined production method of a wet-etching step and a dry-etching step. Preliminarily, the cross sectional shape of the resist film is formed so as to have certain taper angles at both end portions. Accordingly, during the dry-etching step, an etchant gas can smoothly flow through along the sidewall of the resist and accordingly the metal film can be formed so as to have gentle taper angles along the flow line of the etchant gas. Thus, it is possible in accordance with the invention to significantly improve the production efficiency and the quality of such thin film devices as the TFTs to be used for the LCDs.
    Type: Application
    Filed: August 14, 2001
    Publication date: February 21, 2002
    Inventors: Yoshihisa Hatta, Akinori Matsumoto, Shinichi Li