Patents by Inventor Shinichi Yano
Shinichi Yano has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11960719Abstract: A semiconductor storage device includes a first memory area configured in a volatile semiconductor memory, second and third memory areas configured in a nonvolatile semiconductor memory, and a controller which executes following processing. The controller executes a first processing for storing a plurality of data by the first unit in the first memory area, a second processing for storing data outputted from the first memory area by a first management unit in the second memory area, and a third processing for storing data outputted from the first memory area by a second management unit in the third memory area.Type: GrantFiled: October 27, 2022Date of Patent: April 16, 2024Assignee: Kioxia CorporationInventors: Hirokuni Yano, Shinichi Kanno, Toshikatsu Hida, Hidenori Matsuzaki, Kazuya Kitsunai, Shigehiro Asano
-
Publication number: 20240111416Abstract: A memory system includes a nonvolatile memory including a plurality of blocks as data erase units, a measuring unit which measures an erase time at which data of each block is erased, and a block controller which writes data supplied from at least an exterior into a first block which is set in a free state and whose erase time is oldest.Type: ApplicationFiled: December 7, 2023Publication date: April 4, 2024Applicant: Kioxia CorporationInventors: Kazuya KITSUNAI, Shinichi KANNO, Hirokuni YANO, Toshikatsu HIDA, Junji YANO
-
Publication number: 20210107734Abstract: A member which contacts liquid, gas, or powder insulating material when the insulating material is caused to flow and which is less susceptible to dielectric breakdown; a distribution mechanism, tank, and device using a sheet for lining the member or the inside of a pipe or a tank containing the member; a storage tank in which a portion of the surface of a liquid-contact portion thereof includes the member a storage method for storing organic solvent, ultrapure water, and hydrogen peroxide water, using the storage tanks; and a method for manufacturing a semiconductor product using the organic solvent stored in the storage tank. A resin composition containing a matrix resin and an electro-conductive material dispersed in the matrix resin is used for the member which contacts liquid, gas, or powder insulating material when the insulating material is caused to flow.Type: ApplicationFiled: November 30, 2017Publication date: April 15, 2021Inventors: Shinichi YANO, Mitsuyoshi KAWAGUCHI, Toshiyuki KATSUBE
-
Patent number: 9343487Abstract: A TFT substrate includes a TFT including a source electrode having a lower source electrode and an upper source electrode, which are electrically connected to each other, and a drain electrode having a lower drain electrode and an upper drain electrode, which are electrically connected to each other. The lower source electrode and the lower drain electrode are in contact with a lower surface of the semiconductor film, and the upper source electrode and the upper drain electrode are in contact with an upper surface of the semiconductor film.Type: GrantFiled: August 28, 2015Date of Patent: May 17, 2016Assignee: MITSUBISHI ELECTRIC CORPORATIONInventors: Kensuke Nagayama, Kazunori Inoue, Yasuyoshi Ito, Nobuaki Ishiga, Naoki Tsumura, Shinichi Yano
-
Publication number: 20160022264Abstract: The problem that a metal wire joined integrally to a hole formed in a proximal end face of a medical suture needle is susceptible to bending damage is reduced. A suture needle A has a blind hole 5 which is formed in a proximal end face 3, inserts the end of a wire 10 thereinto, and joins the wire 10 thereto by caulking, and a counterbore 6 which is formed on the proximal end face 3 side of the blind hole 5 and has a dimension D at least in the proximal end face 3 larger than a dimension d of the blind hole 5 and a depth L smaller than a depth of a caulked portion with respect to the blind hole 5. A suture needle with wire inserts the end of the wire 10 into the blind hole 5 to caulk the outer circumference of the suture needle corresponding to the blind hole 5, thereby integrally joins the wire 10 thereto.Type: ApplicationFiled: December 24, 2008Publication date: January 28, 2016Applicant: MANI, INC.Inventors: Masaaki Matsutani, Shouichi Fukuda, Masatoshi Fukuda, Shinichi Akutsu, Kazuaki Kato, Shinichi Yano
-
Publication number: 20150372027Abstract: A TFT substrate includes a TFT including a source electrode having a lower source electrode and an upper source electrode, which are electrically connected to each other, and a drain electrode having a lower drain electrode and an upper drain electrode, which are electrically connected to each other. The lower source electrode and the lower drain electrode are in contact with a lower surface of the semiconductor film, and the upper source electrode and the upper drain electrode are in contact with an upper surface of the semiconductor film.Type: ApplicationFiled: August 28, 2015Publication date: December 24, 2015Applicant: Mitsubishi Electric CorporationInventors: Kensuke NAGAYAMA, Kazunori INOUE, Yasuyoshi ITO, Nobuaki ISHIGA, Naoki TSUMURA, Shinichi YANO
-
Patent number: 9190420Abstract: A TFT substrate includes a TFT including a source electrode having a lower source electrode and an upper source electrode, which are electrically connected to each other, and a drain electrode having a lower drain electrode and an upper drain electrode, which are electrically connected to each other. The lower source electrode and the lower drain electrode are in contact with a lower surface of the semiconductor film, and the upper source electrode and the upper drain electrode are in contact with an upper surface of the semiconductor film.Type: GrantFiled: April 17, 2014Date of Patent: November 17, 2015Assignee: Mitsubishi Electric CorporationInventors: Kensuke Nagayama, Kazunori Inoue, Yasuyoshi Ito, Nobuaki Ishiga, Naoki Tsumura, Shinichi Yano
-
Patent number: 8908117Abstract: A thin film transistor array substrate of the present invention having an array area, and a frame area, the thin film transistor array substrate includes: a thin film transistor; an upper metal pattern formed by the same material as source and drain electrodes at the same layer; a transparent conductive film pattern; and an upper layer insulation film, wherein the transparent conductive film pattern has: a first-type transparent conductive film pattern provided to located within one of a pattern of the electrode pattern and a pattern of the metal pattern, as viewed from the top side, and to not cover pattern end faces of the electrode pattern or the metal pattern; and a second-type transparent conductive film pattern provided to stick out from an inside of at least a portion of one of the patterns, as viewed from the top side and to cover the pattern end faces.Type: GrantFiled: October 26, 2011Date of Patent: December 9, 2014Assignee: Mitsubishi Electric CorporationInventors: Masami Hayashi, Osamu Miyagawa, Toru Takeguchi, Shinichi Yano, Yasuyoshi Itoh, Shingo Nagano
-
Publication number: 20140319515Abstract: A TFT substrate includes a TFT including a source electrode having a lower source electrode and an upper source electrode, which are electrically connected to each other, and a drain electrode having a lower drain electrode and an upper drain electrode, which are electrically connected to each other. The lower source electrode and the lower drain electrode are in contact with a lower surface of the semiconductor film, and the upper source electrode and the upper drain electrode are in contact with an upper surface of the semiconductor film.Type: ApplicationFiled: April 17, 2014Publication date: October 30, 2014Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Kensuke NAGAYAMA, Kazunori INOUE, Yasuyoshi ITO, Nobuaki ISHIGA, Naoki TSUMURA, Shinichi YANO
-
Publication number: 20140290320Abstract: Provided is an innovative belt-shaped lubricating material for dry wiredrawing which not only can be used under severe wiredrawing processing conditions such as those of high temperature/high pressure/high speed as well as conventional powdered or granular lubricants for dry wiredrawing but also can cope with diameter reduction to a wide range of wire diameters ranging from a small diameter to a large diameter and a wide range of linear speeds ranging from a low speed to a high speed, has excellent functionalities such as lubricity, followability, spreadability, adhesiveness, heat resistance, processability, workability, safety, durability and productivity irrespective of a processed shape, is effective in improving work environments and is friendly to the global environment. The belt-shaped lubricating material for dry wiredrawing includes a film containing 10 to 90% by weight of a metal salt of a saturated fatty acid and 10 to 90% by weight of a thermoplastic resin.Type: ApplicationFiled: July 10, 2012Publication date: October 2, 2014Applicant: KYOEISHA CHEMICAL CO., LTD.Inventors: Kazuki Maeda, Hideki Tezuka, Yoshitsugu Okuyama, Atsuchi Maekawa, Shinichi Yano
-
Publication number: 20120113376Abstract: A thin film transistor array substrate of the present invention having an array area, and a frame area, the thin film transistor array substrate includes: a thin film transistor; an upper metal pattern formed by the same material as source and drain electrodes at the same layer; a transparent conductive film pattern; and an upper layer insulation film, wherein the transparent conductive film pattern has: a first-type transparent conductive film pattern provided to located within one of a pattern of the electrode pattern and a pattern of the metal pattern, as viewed from the top side, and to not cover pattern end faces of the electrode pattern or the metal pattern; and a second-type transparent conductive film pattern provided to stick out from an inside of at least a portion of one of the patterns, as viewed from the top side and to cover the pattern end faces.Type: ApplicationFiled: October 26, 2011Publication date: May 10, 2012Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Masami HAYASHI, Osamu Miyagawa, Toru Takeguchi, Shinichi Yano, Yasuyoshi Itoh, Shingo Nagano
-
Patent number: 8034596Abstract: The present invention provides a novel cellulase-producing fungus, i.e. Acremonium cellulolyticus CF-2612 strain or a mutant thereof, which has an ability to produce cellulase so highly, a method for producing cellulase and/or hemicellulase by culturing said fungus, and a method for degrading or saccharifying biomass using the cellulase and/or hemicellulase.Type: GrantFiled: July 31, 2007Date of Patent: October 11, 2011Assignee: National Institute of Advanced Industrial Science and TechnologyInventors: Xu Fang, Shinichi Yano, Hiroyuki Inoue, Shigeki Sawayama, Naoyuki Okuda, Masanori Sato, Masashi Kuroda
-
Patent number: 7915062Abstract: A TFT array substrate includes a TFT having an ohmic contact film and a source electrode and a drain electrode formed on the ohmic contact film. It also includes a pixel electrode electrically connected with the drain electrode. The source electrode and the drain electrode are made of an Al alloy containing Ni as an additive.Type: GrantFiled: June 13, 2007Date of Patent: March 29, 2011Assignee: Mitsubishi Electric CorporationInventors: Shinichi Yano, Tadaki Nakahori, Nobuaki Ishiga
-
Publication number: 20100304455Abstract: The present invention relates to a process for producing ethanol by carrying out the following steps: performing enzymatic saccharification of pre-treated lignocellulosic biomass in a reaction system; performing ethanol fermentation of fermentable sugars obtained from the saccharified pre-treated lignocellulosic biomass in the same reaction zone as the enzymatic saccharification; distilling ethanol directly off from a reaction treatment liquid in the reaction zone, so as to recover the ethanol.Type: ApplicationFiled: October 11, 2007Publication date: December 2, 2010Applicants: National Institute of Advanced Industrial Science and Technology, Juon Co., Ltd.Inventors: Hiroyuki Inoue, Chiaki Kitao, Shinichi Yano, Shigeki Sawayama, Takashi Endo, Tetsuro Nishimoto, Naohiro Fujikawa
-
Publication number: 20100136618Abstract: The present invention provides a novel cellulase-producing fungus, i.e. Acremonium cellulolyticus CF-2612 strain or a mutant thereof, which has an ability to produce cellulase so highly, a method for producing cellulase and/or hemicellulase by culturing said fungus, and a method for degrading or saccharifying biomass using the cellulase and/or hemicellulase.Type: ApplicationFiled: July 31, 2007Publication date: June 3, 2010Inventors: Xu Fang, Shinichi Yano, Hiroyuki Inoue, Shigeki Sawayama, Naoyuki Okuda, Masanori Sato, Masashi Kuroda
-
Patent number: 7528221Abstract: It is an object of the present invention to obtain a PTFE molding excellent in flexing resistance without decreasing the tensile strength and tensile elongation. The present invention is a modified polytetrafluoroethylene molded article obtained by molding a modified polytetrafluoroethylene molding powder, wherein the modified polytetrafluoroethylene molding powder is not melt-moldable, the modified polytetrafluoroethylene constituting the modified polytetrafluoroethylene molding powder contains 0.01 to 1% by mass of a perfluorovinyl ether unit represented by the formula (I): (wherein X is a perfluoroalkyl group containing 1 to 6 carbon atoms or a perfluoroalkoxyalkyl group containing 4 to 9 carbon atoms) and the heat of crystallization thereof is 18.0 to 25.0 J/g as measured using a differential scanning calorimeter, and the modified polytetrafluoroethylene molded article has a heat of fusion of not more than 28 J/g and a flex life of at least 200×104 cycles.Type: GrantFiled: November 30, 2005Date of Patent: May 5, 2009Assignee: Daikin Industries, Ltd.Inventors: Tomihiko Yanagiguchi, Shinichi Yano, Masamichi Sukegawa, Hirokazu Yukawa
-
Publication number: 20080191211Abstract: A thin film transistor array substrate includes a gate electrode formed on a substrate, a gate insulating film formed over the gate electrode, a source electrode and a drain electrode that are formed on the gate insulating film and include a transparent conductive film and a metal film formed on the transparent conductive film, a semiconductor film formed over the source electrode and the drain electrode to be electrically connected to the source electrode and the drain electrode, and a pixel electrode formed extending from the drain electrode.Type: ApplicationFiled: February 12, 2008Publication date: August 14, 2008Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Shinichi Yano, Kazunori Inoue, Nobuaki Ishiga
-
Patent number: 7387834Abstract: The present invention provides a polytetrafluoroethylene molded article, particularly a PTFE molded article for high-frequency insulation, which is excellent in various electric properties and mechanical properties in a high frequency range of 3 to 30 GHz. The present invention also provides PTFE fine powder, which is excellent in extrusion moldability and capable of providing the molded article, and a process for preparing the same. More specifically, the present invention relates to a polytetrafluoroethylene fine powder having a standard specific gravity of 2.180 to 2.225, which is obtained by contacting polytetrafluoroethylene fine powder having a standard specific gravity of 2.180 to 2.225 with a fluorine radical source, wherein tan? at 12 GHz of a film comprising the powder, which is obtained by cooling at 5 to 50° C./second after baking, is at most 2.0×10?4.Type: GrantFiled: August 1, 2002Date of Patent: June 17, 2008Assignee: Daikin Industries, Ltd.Inventors: Tetsuo Shimizu, Michio Asano, Makoto Ono, Yoshinori Nanba, Shunji Kasai, Shinichi Yano, Hiroyuki Yoshimoto
-
Publication number: 20080125548Abstract: It is an object of the present invention to obtain a PTFE molding excellent in flexing resistance without decreasing the tensile strength and tensile elongation. The present invention is a modified polytetrafluoroethylene molded article obtained by molding a modified polytetrafluoroethylene molding powder, wherein the modified polytetrafluoroethylene molding powder is not melt-moldable, the modified polytetrafluoroethylene constituting the modified polytetrafluoroethylene molding powder contains 0.01 to 1% by mass of a perfluorovinyl ether unit represented by the formula (I): (wherein X is a perfluoroalkyl group containing 1 to 6 carbon atoms or a perfluoroalkoxyalkyl group containing 4 to 9 carbon atoms) and the heat of crystallization thereof is 18.0 to 25.0 J/g as measured using a differential scanning calorimeter, and the modified polytetrafluoroethylene molded article has a heat of fusion of not more than 28 J/g and a flex life of at least 200×104 cycles.Type: ApplicationFiled: November 30, 2005Publication date: May 29, 2008Applicant: DAIKIN INDUSTRIES, LTD.Inventors: Tomihiko Yanagiguchi, Shinichi Yano, Masamichi Sukegawa, Hirokazu Yukawa
-
Publication number: 20070295963Abstract: A TFT array substrate includes a TFT having an ohmic contact film and a source electrode and a drain electrode formed on the ohmic contact film. It also includes a pixel electrode electrically connected with the drain electrode. The source electrode and the drain electrode are made of an Al alloy containing Ni as an additive.Type: ApplicationFiled: June 13, 2007Publication date: December 27, 2007Applicant: MITSUBISHI ELECTRIC CORPORATIONInventors: Shinichi YANO, Tadaki Nakahori, Nobuaki Ishiga